Abstract: A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane that applies a load to a substrate. A central portion of the flexible membrane is formed of a first material with a different rigidity than a second material that forms the annular portion of the flexible membrane.
Type:
Application
Filed:
March 27, 2000
Publication date:
July 18, 2002
Applicant:
zuniga
Inventors:
Steven M. Zuniga, Hung Chih Chen, Ming Kuie Tseng
Abstract: A carrier head for a chemical mechanical polishing apparatus a flexible membrane that applies a load to a substrate in a loading area with a controllable size. One pressurizable chamber in the carrier head controls the size of the loading area, and another chamber controls the pressure applied to the substrate in the loading area.
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