Abstract: Systems and methods for characterizing and compensating non-cyclic errors in interferometers and interferometer components are disclosed.

Abstract: The invention features a method for determining non-linear cyclic errors in a metrology system that positions a measurement object under servo-control based on an interferometrically derived position signal. The method includes: translating the measurement object under servo-control at a fixed speed; identifying frequencies of any oscillations in the position of measurement object as it is translated at the fixed speed; and determining amplitude and phase coefficients for sinusoidal components at the identified frequencies which when combined with the position signal suppress the oscillations. The invention also features a method for positioning a measurement object under servo-control based on an interferometrically derived position signal indicative of a position for the measurement object.

Abstract: The invention features a method including: (i) providing an interference signal S(t) from two beams derived from a common source and directed along different paths, wherein the signal S(t) is indicative of changes in an optical path difference n{tilde over (L)}(t) between the different paths, where n is an average refractive index along the different paths, {tilde over (L)}(t) is a total physical path difference between the different paths, and t is time; (ii) providing coefficients representative of one or more errors that cause the signal S(t) to deviate from an ideal expression of the form A1 cos(?Rt+?(t)+?1), where A1 and ?1 are constants, ?R is an angular frequency difference between the two beams, and ?(t)=nk{tilde over (L)}(t), with k=2?/? and ? equal to a wavelength for the beams; (iii) calculating a quadrature signal {tilde over (S)}(t) based on the signal S(t); and (iv) reducing the deviation of S(t) from the ideal expression using an error signal S?(t) generated from the coefficients and error basi

Abstract: Interferometric apparatus and method for measuring changes in distance to an object are compensated for the presence of undesirable phase shifts in measurement beams that result from their interacting with non-polarization preserving optical elements in at least one interferometer measurement leg. Compensation is provided by phase plates, multi-order phase plates set at a predetermined angle with respect to beam components, coatings on reflecting surfaces, or a segmented phase plate at least part of which is rotated with respect to polarized beam components, and combinations thereof. Compensation is provided in interferometers having measurement legs folded with reflecting surfaces that cause relative phase shifts in propagating polarized beams because of non-normal incidence. Compensation is also provided in upward and downward looking interferometers for measuring altitude and changes in altitude to a surface such as a translating wafer stage of a photolithographic exposure apparatus.

Abstract: Interferometric apparatus and methodology for precisely measuring the shape of rotationally and non-rotationally symmetric optical surfaces comprising an illumination source with two wavelengths, a transmission flat with a reference surface, a basic optical system for producing a wavefront of predetermined shape, a compensation component having an aspheric wavefront shaping surface and an aspheric reference surface. The aspheric shaping surface modifies the predetermined wavefront so that it impinges on the aspheric reference surface with a shape substantially that same as that of aspheric reference surface. For a given aspheric reference surface, the radius or curvature and spacing of the aspheric shaping surface are optimized so that its aspheric departure is no larger than that of the aspheric reference surface. Precise alignment in six degrees of freedom is provided via feedback control.

Abstract: An interferometry method including: i) forming an optical interference image by combining different portions of an optical wave front reflected from multiple surfaces; ii) recording an interference signal at different locations of the optical interference image in response to varying a property of the optical wave front that causes pairs of the multiple surfaces that have different optical path separations to contribute differently to the interference signal; iii) transforming the interference signal for at least one of the locations to produce a spectrum having a peak at a spectral coordinate corresponding to each pair of the multiple surfaces; and iv) identifying the spectral coordinate of the peak corresponding to a selected pair of the multiple surfaces.

Abstract: Techniques for monitoring the position of a stage in a twin stage lithography tool are disclosed.

Abstract: In general, in a first aspect, the invention features a method for determining the location of an alignment mark on a stage, which includes directing a measurement beam along a path between an interferometer and a mirror, wherein at least the interferometer or the mirror is mounted on the stage, combining the measurement beam with another beam to produce an output beam comprising information about the location of the stage, measuring from the output beam a location, x1, of the stage along a first measurement axis, measuring a location, x2, of the stage along a second measurement axis substantially parallel to the first measurement axis, calculating a correction term, ?3, from predetermined information characterizing surface variations of the mirror for different spatial frequencies, wherein contributions to the correction term from different spatial frequencies are weighted differently, and determining a location of the alignment mark along a third axis parallel to the first measurement axis based on x1, x2,

Abstract: In general, in a first aspect, the invention features a lithography system that includes a stage for supporting a wafer, an illumination system including a radiation source and a lens assembly, wherein the illumination system is configured to direct radiation through a mask to produce spatially patterned radiation, and the lens assembly is configured to image the spatially patterned radiation onto the wafer, a first interferometry system configured to monitor a location of the stage within the lithography system as the stage moves relative to the illumination system, a second interferometry system configured to identify an alignment feature on a surface associated with the stage, and an electronic controller coupled to the interferometry systems, wherein the electronic controller is configured to determine information about a location of the stage when the alignment feature is identified.

Abstract: Apparatus for measuring angular changes in the direction of travel of a light beam comprising at least one beam shearing assembly for separating, preferably orthogonally polarized, components of the light beam and introducing a lateral shear between them. An analyzer operates on the components to provide them with a common polarization state. A lens focuses the commonly polarized components of the light beam to a spot in a detector plane, and a detector operates to generate an electrical signal having a phase that varies in accordance with the angular change of the light beam in at least one plane. Electronic means receive the electrical signal, determines the phase therefrom, and converts the phase to the angular change in the direction of travel of the light beam.

Abstract: An apparatus for aligning a lens with an array package holding an optical fiber includes a stage assembly configured to adjustably position the lens relative to the array package. An interferometer has a measurement port in optical communication with the fiber and an output port configured to provide an output signal indicative of a position of the lens relative to the fiber.

Abstract: an apparatus including: a support structure; a stage configured to move relative to the support structure; a first reflection surface carried by one of the support structure and the stage; and a first interferometry system. The first interferometry system is configured to direct a first measurement beam to contact the first reflection surface and monitor changes in the position and orientation of the stage relative to the support structure along multiple degrees of freedom using the first measurement beam and no other measurement beam that contacts the first reflection surface. For example, the first measurement beam can define a first measurement axis and the multiple degrees of freedom can include at least two of: distance along the first measurement axis, pitch about the first measurement axis, and yaw about the first measurement axis.

Abstract: An interferometric surface profiler implements a lenslet array to accommodate a large field of view (FOV) without a corresponding loss in light efficiency. Using the lenslet array, the optical surface profiler multiplexes the measurement of an interference phase over multiple spots on a measurement surface, with each spot corresponding to an element of the lenslet array. The FOV of the profiler corresponds to the area of the measurement surface spanned by the spots, and each lenslet element provides a large numerical aperture for each spot, thereby improving light efficiency. The large FOV and increased light efficiency are useful in scanning white light interferometry, as well as other types of interferometric analysis of surface form and roughness such as phase shifting interferometry.

Abstract: Spatial filtering of beams in interferometry systems is used to reduce a displacement of the beams from an optical path corresponding to the path of the beams in an optimally-aligned system. By reducing beam displacement from the optical path, the system reduces the magnitude of beam shears and associated non-cyclic errors in linear and angular displacements measured by the interferometry systems.

Abstract: An interferometric system for measuring the radius of curvature of a measurement object that includes a tunable coherent radiation source capable of emitting a radiant energy beam having a characteristic wavelength and of scanning the characteristic wavelength over a range of wavelengths; an unequal path interferometer which during operation includes a reference object and the measurement object and which receives a portion of the radiant energy beam from the tunable radiant energy source and generates an optical interference pattern; a detecting system including a detector for receiving the optical interference pattern; and a system controller connected to the tunable radiant energy source and the detecting system.

Abstract: The invention features a system and method for reducing the contribution of cyclic errors to an interferometric position measurement of a movable stage. An initial interferometric position measurement of the stage is averaged with at least one additional measurement corresponding to a displacement(s) of the stage from its initial position. The displacements are selected to reduce the overall cyclic error contribution to an average position measurement. As a result, the average position of the stage can be measured more accurately than any of its individual positions. The average position can be used to more accurately determine the average position of an alignment mark on a wafer carried by the stage. Furthermore, the averaging described above can be applied to additional interferometric measurement axes.

Abstract: In one aspect, the invention features an angle-measuring interferometry system that includes an interferometer which during operation directs a measurement beam to contact a measurement object, the interferometer comprising a beam steering assembly having a beam steering element positioned to contact and direct the measurement beam and an electronic positioning system to selectively orient the beam steering element within the interferometer. The angle-measuring interferometry system also includes an angle measurement system which during operation calculates a change in angular orientation of the measurement object based on a measurement signal derived from the measurement beam, wherein the measurement signal is derived from at least one interferometric signal produced by combining at least a portion of the measurement beam with a second beam after the measurement beam contacts the measurement object.

Abstract: The invention features methods and systems in which wavelength-tune PSI data is analyzed in the frequency domain to produce spectrally separated frequency peaks each corresponding to a particular pair of surfaces in an interferometric cavity defined by multiple pairs of surfaces. Each frequency peak provides optical path length information about a corresponding pair of surfaces in the cavity. As a result, the interferometric data from such cavities provides simultaneous information about multiple surfaces.

Abstract: Spatial filtering of beams in interferometry systems is used to reduce a displacement of the beams from an optical path corresponding to the path of the beams in an optimally-aligned system. By reducing beam displacement from the optical path, the system reduces the magnitude of beam shears and associated non-cyclic errors in linear and angular displacements measured by the interferometry systems.

Abstract: Interferometric scanning method(s) and apparatus for measuring rotationally and non-rotationally symmetric test optics either having aspherical surfaces or that produce aspherical wavefronts. A spherical or partial spherical wavefront is generated from a known origin along an optical axis. The test optic is aligned with respect the optical axis and selectively moved along it relative to the known origin so that the spherical wavefront intersects the test optic at the apex of the aspherical surface and at radial positions where the spherical wavefront and the aspheric surface intersect at points of common tangency.