Abstract: Embodiments of the invention provide methods and apparatuses for efficient and cost-effective imaging of alignment marks. For one embodiment, alignment mark imaging is accomplished separately from, and independent of product imaging through use of a relatively low cost, low resolution, imaging tool. For one embodiment a wafer is exposed to low-resolution light source through a reticle having a number of alignment patterns corresponding to desired alignment marks. For one embodiment, global alignment marks are imaged on a backside of a wafer. Various embodiments of the invention obviate the need for a highly accurate stage and a high-resolution imaging device, and therefore reduce processing costs and processing time.

Abstract: An exposure apparatus includes a projection optical system for projecting a pattern of a reticle onto an object to be exposed, via a liquid that is filled in a space between said projection optical system and the object, and a removing part for removing an air bubble and/or a foreign particle mixed in the liquid by forming a predetermined flow velocity distribution in the liquid.

Abstract: According to one embodiment, a method of calibrating level sensors of at least two lithographic projection apparatus to correct machine to machine level sensor process dependency includes using a first lithographic projection apparatus to measure a first set of leveling data for a reference substrate and a second set of leveling data for a substrate processed according to a selected process, and using a second lithographic projection apparatus to measure a third set of leveling data for the reference substrate and a fourth set of leveling data for the processed substrate. The method also includes calculating, based on the first, second, third and fourth sets of leveling data, a set of level sensor parameters corresponding to machine to machine level sensor differences for the selected process, wherein the machine to machine level sensor differences are measured and stored as intrafield values.

Abstract: The present invention relates to a barrier member slidably movable along the surface of a camera to a closing position for covering a lens barrel of a camera body and to an opening position for letting the lens barrel be exposed. The camera includes a pressing member for pressing the barrier member from the side of the camera body, and regulating the slide movement of the barrier member in the closing and opening positions. In the camera of the present invention, the barrier member is provided with a guide member abutting on the pressing member at a plurality of points with the center of the pressing member being interposed therebetween in a direction along the surface of the camera and in a direction orthogonal to a slide moving direction of the barrier member, thereby eliminating a backlash of the barrier member.

Abstract: A processor for use in processing sheets of photosensitive material has a plurality of processing stations. A plurality of drive rollers define a sheet processing path through the processing stations and are driven to transport a sheet of photosensitive material along that path. The drive rollers at the processing station at the end of the path are driven at a faster rate of rotation than the drive rollers at previous processing stations along the path. The drive rollers of those previous processing stations, however, are mounted to permit said rollers to overrun their driven slower rate of rotation and permit those rollers to rotate at the faster rate of rotation.

Abstract: An illumination optical apparatus for illuminating an object to be illuminated in an arcuate or rectangular shape. A first optical integrator forms a plurality of light source images in a substantially linear arrangement, based on a beam of parallel rays. Then a second optical integrator forms a plurality of light source images in a substantially square arrangement, based on the beam from the first optical integrator. A relay optical system is disposed between the first and second optical integrator, and makes a position of the light source images formed by the first optical cintegrator conjugate with a position of the light source images formed by the second optical integrator.