Abstract: Provided is a facile process for preparing certain organotin compounds having alkyl and alkylamino substituents. The process provides organotin precursor compounds, for example tris(dimethylamido)isopropyl tin, in a highly pure form. As such, the products of the process are particularly useful in the deposition of high-purity tin oxide films in, for example, extreme ultraviolet light (EUV) lithography techniques used in microelectronic device manufacturing.

Abstract: The present disclosure provides a preparation method of 4-(heptafluoro-2-propyl)-2-trifluoromethylaniline and an application thereof. The preparation method comprises the following steps: reacting 2-aminobenzotrifluoride and 2-bromoheptafluoropropane in the presence of sodium formate or hydrates thereof and a SO2 reagent, so as to obtain 4-(heptafluoro-2-propyl)-2-trifluoromethylaniline. The present disclosure adds sodium formate or hydrate thereof and the SO2 reagent during the reaction of 2-aminobenzotrifluoride and 2-bromoheptafluoropropane. Under the cooperation of these two compounds, the yield of the reaction is high. And the purity of the product is high, the operation method is simple, the cost is relatively low, and the pH of the reaction doesn't need to be controlled.

Abstract: An aqueous solution composition containing a co-hydrolysate or a co-hydrolytic condensate of an organosilicon compound of formula (1) and an organosilicon compound of formula (2), or both the co-hydrolysate and the co-hydrolytic condensate: wherein R1 and R2 are each independently an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 10 carbon atoms, R3 is an alkyl group having 12 to 24 carbon atoms, R4 and R5 are each independently an alkyl group having 1 to 6 carbon atoms, X is a halogen atom, m is an integer of 1 to 20, and n is an integer of 1 to 3.

Abstract: Provided is a facile methodology for preparing certain organotin compounds having alkyl and alkylamino or alkyl and alkoxy substituents. The process provides the organotin compounds in a highly pure form which are particularly useful as precursors in the deposition of high-purity tin oxide films in, for example, extreme ultraviolet light (EUV) lithography techniques used in the manufacture of certain microelectronic devices.

Abstract: Provided is a compound of Chemical Formula 1: wherein: L11 is a single bond or a substituted or unsubstituted C6-60 arylene; L12 and L13 are each independently a single bond or a substituted or unsubstituted C6-60 arylene; R11 is a substituted or unsubstituted C6-60 aryl; R12 and R13 are each independently any one substituent selected from the group consisting of the following: wherein, each R? is independently a substituted or unsubstituted C6-60 aryl, and R14 and R15 are hydrogen, or are linked to each other, and an organic light emitting device including the same.

Abstract: The present invention is directed to a method for making a di(aminoaryl)fluorene compound that includes the steps of: (a) reacting a fluorenone compound according structure (I) with excess aminobenzene according to structure (II) wherein: each R1, R2, R3, R4, R12, and R13 is independently a group that is inert in the polymerization of epoxy compounds, and R11 is H or (C1-C6)alkyl, in the presence of an acid catalyst, in a liquid medium comprising an aromatic or substituted aromatic solvent having a boiling point of greater than or equal to 150° C. and in the presence of an acid catalyst, in a liquid medium comprising an aromatic or substituted aromatic solvent having a boiling point of greater than or equal to 150° C.

Abstract: A novel organic compound is provided. An organic compound represented by General Formula (G1) is provided. In General Formula (G1), A represents a substituent including a hole-transport skeleton, L1 represents any one of a single bond, a substituted or unsubstituted phenylene group, and a substituted or unsubstituted biphenyldiyl group, R1 and R2 independently represent any one of hydrogen and an alkyl group having 1 to 6 carbon atoms, any one of Ar1 to Ar4 is a group represented by General Formula (g1), and the others independently represent any one of hydrogen and an alkyl group having 1 to 6 carbon atoms. In General Formula (g1), B represents any one of a substituted or unsubstituted carbazolyl group, a substituted or unsubstituted dibenzofuranyl group, a substituted or unsubstituted dibenzothiophenyl group, and a substituted or unsubstituted triphenylenyl group, and L2 represents a substituted or unsubstituted phenylene group or a substituted or unsubstituted biphenyldiyl group.

Abstract: A photosensitive resin composition, a photosensitive resin layer, and a color filter, the composition including a colorant including a first green dye having a core-shell structure and a second green dye in a weight ratio of about 1:9 to about 7:3; a binder resin; a photopolymerizable compound; a photopolymerization initiator; and a solvent.

Abstract: A method for synthesizing Pt(PF3)4 (CAS # 19529-53-4) comprises dissolving a platinum compound having a general formula, Pt(Hal)2(PF3)x, in an anhydrous solvent forming a Pt(Hal)2(PF3)x solution, wherein Hal=F, Cl, Br or I, x=1, 2, adding a metal powder and excess amount of PF3 into the Pt(Hal)2(PF3)x solution, and forming Pt(PF3)4 through a reaction between Pt(Hal)2(PF3)x, PF3 and the metal powder under a reaction condition. The method further comprises synthesizing Pt(Hal)2(PF3)xthrough the steps of dispersing a platinum precursor having a general formula, Pt(Hal)2, into the anhydrous solvent forming a suspension of Pt(Hal)2, wherein Hal=F, Cl, Br or I, introducing PF3 into the suspension of Pt(Hal)2, and forming the solution of the platinum compound Pt(Hal)2(PF3)xin the anhydrous solvent through a reaction of PF3 and Pt(Hal)2.

Abstract: A photo-decomposable compound, a photoresist composition, and a method of manufacturing an IC device, the compound generating acid upon exposure and acts as a quenching base that neutralizes acid in an unexposed state and being represented by Formula 1: wherein, in Formula 1, Ra is a C5 to C40 substituted or unsubstituted cyclic hydrocarbon group including at least one nitrogen atom, Ya is a C1 to C20 divalent linear or cyclic hydrocarbon group, n is an integer of 1 to 5, and A+ is a counter ion.

Abstract: A process including bringing a solid substrate in contact with a compound of general formula (I), (II), (III), or (IV) in the gaseous state where A is NR2 or OR with R being an alkyl group, an alkenyl group, an aryl group, or a silyl group, E is NR or O, n is 0, 1 or 2, m is 0, 1 or 2, and R? is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group.

Abstract: A compound for an organic optoelectronic device, an organic optoelectronic device, and a display device including the same, the compound being represented by Chemical Formula 1:

Abstract: The present disclosure relates to an organic electroluminescent compound represented by formula 1 and an organic electroluminescent device comprising the same. By comprising the organic electroluminescent compound of the present disclosure, an organic electroluminescent device having improved driving voltage, luminous efficiency, and/or lifespan characteristics can be provided.

Abstract: The invention relates to compounds in accordance with the general formula [Ru(arene)(Ra—N?CR1—CR3?N—Rb)] or [Ru(arene)((Rc,Rd)N—N?CRH1—CRH3?N—N(Re,Rf))]. In this case, arene is selected from the group consisting of mononuclear and polynuclear arenes and heteroarenes. R1, R3, RH1, RH3 and Ra-Rf are independently selected from the group consisting of H, an alkyl radical (C1-C10) and an aryl radical. It further relates to methods for the production of these compounds, compounds obtainable according to these methods, their use and a substrate having on a surface thereof a ruthenium layer or a layer containing ruthenium. In addition, the invention relates to a method for producing compounds [Ru(arene)X2]2, wherein arene is selected from the group consisting of mononuclear and polynuclear arenes and X=halogen, compounds of this type obtainable according to this method, and their use.

Abstract: This invention relates to a method of using MOF adsorbents to remove elemental impurities from feed streams comprising active pharmaceutical ingredients (API). The process involves contacting the feed stream comprising API and elemental impurities with the MOF at purification conditions to obtain a purified stream with provides an API which has a concentration of the elemental impurity below its permitted daily exposure. The process can be carried in a batch mode where the MOF and feed stream are admixed in a vessel for a given amount of time or continuously by flowing the feed stream through a column or adsorbent bed containing the MOF adsorbent.

Abstract: A composition, a film, a display device and article prepared therefrom, and a method of preparing the article, the composition including: a compound having a fluorine-containing (poly)ether group represented by Formula 1; and a heteroatom-containing cyclic silane compound represented by Formula 2 or 3: wherein, in Formulas 1 to 3, Rf is a fluorine-containing (poly)ether group, and L1, Q1, p1, q1, q2, q3, A1, A2, A3, Ra, Rb, Ri, Rj, Rc, Rd, Re, Rf, Rg, Rh, Rk, Rl, Rm, Rn, Ro, Rp, Rq, Rr, Rs, and Rt are as described in the detailed description.

Abstract: To provide an organosilicon compound having a cyclic silazane structure, represented by the following general formula (1): wherein R1 represents a hydrogen atom, an oxy radical, a hydroxyl group, a substituted or unsubstituted alkoxy group having 1 to 10 carbon atoms, or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms, R2 represents a substituted or unsubstituted alkylene group having 3 to 6 carbon atoms, R3 and R each independently represent a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms, and n represents an integer of 0 to 2.

Abstract: The present invention provides a method of forming a crystalline or polycrystalline layer of an organic-inorganic metal halide perovskite material comprising a three-dimensional crystal structure represented by the formula AMX3, in which A represents an organic cation or a mixture of two or more different cations, at least one of which is an organic cation, M represents a divalent metal cation or a mixture of two or more different divalent metal cations, and X represents halide anions which are the same or different, the method comprising the steps of: (i) forming a first layer on the surface of a substrate, the first layer comprising an organic-inorganic metal halide perovskite material having a planar, layered two-dimensional crystal structure (ii) reacting the first layer with one or more organic halides to form the crystalline or polycrystalline layer comprising an organic-inorganic metal halide perovskite material having the formula AMX3.

Abstract: A compound represented by the following formula (1): wherein R1 is a monovalent organic group containing a polyether chain; X1 and X2 are each individually a monovalent group; and the polyether chain is a chain represented by the following formula: —(OC6F12)m11—(OC5F10)m12—(OC4F8)m13—(OC3X106)m14—(OC2F4)m15—(OCF2)m16—, wherein m11, m12, m13, m14, m15, and m16 are each individually an integer of 0 or 1 or greater; X10s are each individually H, F, or Cl; the repeating units are present in any order; and the sum of m11 to m16 is an integer of 10 or greater, R1 being other than those containing a urethane bond.

Abstract: Processes for forming Mo and W containing thin films, such as MoS2, WS2, MoSe2, and WSe2 thin films are provided. Methods are also provided for synthesizing Mo or W beta-diketonate precursors. Additionally, methods are provided for forming 2D materials containing Mo or W.