Patents Examined by Amanada C. Walke
  • Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
    Patent number: 8828643
    Abstract: A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (D) a solvent.
    Type: Grant
    Filed: March 1, 2013
    Date of Patent: September 9, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Hiromi Kobayashi, Haruki Inabe