Abstract: Methods for forming device structures on a wafer are provided. One method includes transferring approximately an inverse of patterned features formed in a positive resist layer on the wafer to a device material on the wafer to form the device structures in the device material. Another method includes transferring approximately an inverse of patterned features formed in a sacrificial layer on the wafer to a device material on the wafer to form the device structures in the device material.

Abstract: In a silver halide emulsion, a sum of projected areas of tabular silver halide grains, in which an outer shell region which is 40% in volume from a grain surface contains 5 mol % to 20 mol % of iodide ions with respect to a silver halide in the outer shell region, and which have a projected area diameter of 0.08 &mgr;m to 0.5 &mgr;m and an aspect ratio of 2 to 30, accounts for 80% or more of the total projected area of all grains.

Abstract: A sliver halide color photographic light-sensitive material comprising a support having provided thereon at least one silver halide emulsion layer containing at least one cyan dye forming coupler represented by the formula (1) shown below, at least one compound represented by the formula (A) shown below and at least one compound represented by the formula (D) shown below: ##STR1## wherein Z.sup.a and Z.sup.b each represents --C(R.sup.3).dbd. or --N=, provided that one of Z.sup.a and Z.sup.b is --N= and the other is --C(R.sup.3).dbd.; R.sup.1 and R.sup.2 each represents an electron attractive group having a Hammett's substituent constant .sigma..sub.p value of 0.20 or more and the sum of the .sigma..sub.p values of R.sup.1 and R.sup.2 is 0.65 or more; R.sup.3 represents a hydrogen atom or a substituent; X represents a hydrogen atom or a group capable of being released upon a coupling reaction with an oxidation product of an aromatic primary amine color developing agent; and group represented by R.sup.1, R.sup.

Abstract: A silver halide light sensitive photographic material is disclosed, comprising a support having thereon a red-sensitive silver halide emulsion layer, a green-sensitive silver halide emulsion layer and a blue-sensitive silver halide emulsion layer, wherein at least one of the red-sensitive, green-sensitive and blue-sensitive layers comprises a high-speed silver halide emulsion layer, a medium-speed silver halide emulsion layer and a low-speed silver halide emulsion layer, the low-speed layer contains a dye forming coupler having coupling reactivity higher than that of a coupler contained in the mdium speed layer.

Abstract: The present invention relates to a novel copolymer resin of maleimide and alicyclic olefin-based monomers, a photoresist containing the copolymer and a process for the preparation thereof. More specifically, the present invention relates to a novel copolymer resin of maleimide and alicyclic olefin-based monomers useful for a photoresist usable lithography process using ultra-short wavelength light source such as KrF(.lambda.=248 .mu.m), ArF(.lambda.=193 .mu.m), X-ray, ion beam, E-beam and EUV (Extreme Ultra Violet) which is a potentially applicable technology to the fabrication of a fine circuit of a highly integrated semiconductor device.

Abstract: A color negative photographic element is disclosed containing higher levels of oxidized developer agent scavenging compound in the lowest and intermediate sensitivity layers of a triple-coated image recording unit than in the fast layer. Reduced fog and granularity are obtained, and increased speed and latitude are obtained.