Abstract: Applications of dielectric barrier discharge (DBD) based atmospheric pressure plasma jets are often limited by the relatively small area of treatment due to their 1D configuration. This system generates 2D plasma jets permitting fast treatment of larger targets. DBD evolution starts with formation of transient anode glow, and continues with development of cathode-directed streamers. The anode glow can propagate as an ionization wave along the dielectric surface through and outside of the discharge gap. Plasma propagation is not limited to 1D geometry such as tubes, and can be organized in a form of a rectangular plasma jet, or other 2D or 3D shapes. Also described are a method for generating 2D plasma jets and use of the 2D plasma jets for cancer therapy.

Abstract: The present invention relates to a dummy load circuit for a single live wire switch. This includes: a switch circuit—at least a first resistor and a switch are connected in the switch circuit, wherein the first resistor is connected to the switch, such that the first resistor is connected to the dummy load circuit through the switch; and a switch control circuit—the switch control circuit at least includes a switch control device, wherein the switch control device is connected to the switch to facilitate power-on/off control. The invention also relates to an electrical load with a dummy load circuit.

Abstract: A lighting apparatus includes a first electrode, a second electrode, a lighting source, a rectifier, a driver and an electric shock prevention circuit. The first electrode and the second electrode receive an external power source. The external power source is either an alternating current or a direct current. The light source has multiple LED modules. The rectifier is used for rectifying the external power source to a rectified power. The driver is used for converting the rectified power to a driving current supplying to the light source.

Abstract: A plasma generation apparatus includes a plasma generation unit. The plasma generation unit has a spherical or elliptical cavity. The plasma generation unit receives radio-frequency (RF) power in such a manner that bounce resonance of electrons is performed to generate plasma in the cavity. The cavity has a plasma extraction hole to communicate with an external space.

Abstract: System controller and method for a lighting system. The system controller includes a first controller terminal configured to receive a first signal, and a second controller terminal configured to output a second signal to a diver component. The driver component is configured to receive a first current and provide one or more drive currents to one or more light emitting diodes in response to the second signal. Additionally, the system controller is configured to process information associated with the first signal, determine a first time period for the first signal to increase from a first threshold to a second threshold, and determine a second time period for the first signal to decrease from the second threshold to the first threshold.

Abstract: A lighting driver is designed for driving an unknown lighting load and is based on a controlled DC driver, with a controlled output current. It is used in a first mode of operation to determine an operating current of the lighting load and in a second mode of operation to deliver a current to the lighting load in dependence the determined operating current, and optionally also in dependence on a dimming setting. In this way, the driver configures its output to the load based on an analysis of the current characteristics of the load, such as the maximum rated current.

Abstract: Methods and systems for color error correction for a segmented LED array are disclosed. A method includes calculating a target luminance for LED segments in a segmented LED array based on an initial luminance pattern, determining a luminance ratio based on the target luminance, the luminance ratio defined as a ratio of a primary luminance value of the primary LED segment to a secondary luminance value of the at least one adjacent LED segment, and comparing the luminance ratio to a predefined threshold ratio. If the luminance ratio is greater than or equal to the predefined ratio, then the secondary luminance value of the at least one adjacent LED segment is maintained. If the luminance ratio is less than the predefined ratio, then the secondary luminance value of the at least one adjacent LED segment is increased.

Abstract: Systems and methods utilizing successive, axially symmetric acceleration and adiabatic compression stages to heat and accelerate two compact tori towards each other and ultimately collide and compress the compact tori within a central chamber. Alternatively, systems and methods utilizing successive, axially asymmetric acceleration and adiabatic compression stages to heat and accelerate a first compact toroid towards and position within a central chamber and to heat and accelerate a second compact toroid towards the central chamber and ultimately collide and merge the first and second compact toroids and compress the compact merge tori within the central chamber.

Abstract: A clock gating cell (CGC) is provided. The clock gating cell includes two latches that can be configured as a flip-flop to use positive/negative edges of a first clock signal to store a value of an input terminal, and the clock gating cell also includes a selector used for the flip-flop to select from values of different input terminals for storing. In addition, in a non-scan testing mode, the clock gating cell can forcefully close an unused latch through an independent signal, and in a scan shift duration and a scan capture duration of a scan testing mode, the clock gating cell can further forcefully output the first clock signal as the gating clock signal according to two independent signals.

Abstract: A plasma processing apparatus includes: a processing container; an electrode that places a substrate thereon within the processing container; a plasma generation source that supplies plasma into the processing container; a bias power supply that supplies bias power to the electrode; a part exposed to the plasma in the processing container; a DC power supply that supplies a DC voltage to the part; a controller that executes a process including a first control procedure in which a first state in which the DC voltage has a first voltage value and a second state in which the DC voltage has a second voltage value higher than the first voltage value are periodically repeated, and the first voltage value is applied in a partial period in each cycle of a potential of the electrode, and the second voltage value is applied such that the first state and the second state are continuous.

Abstract: Systems and methods for achieving a pre-determined factor associated with the edge region within the plasma chamber is described. One of the methods includes providing an RF signal to a main electrode within the plasma chamber. The RF signal is generated based on a frequency of operation of a first RF generator. The method further includes providing another RF signal to an edge electrode within the plasma chamber. The other RF signal is generated based on the frequency of operation of the first RF generator. The method includes receiving a first measurement of a variable, receiving a second measurement of the variable, and modifying a phase of the other RF signal based on the first measurement and the second measurement. The method includes changing a magnitude of a variable associated with a second RF generator to achieve the pre-determined factor.

Abstract: The present disclosure relates to an accelerating apparatus for a radiation device. The accelerating apparatus may include a plurality of acceleration cavity units including a plurality of acceleration cavities. Each of the plurality of acceleration cavity units may be configured to accelerate a radiation beam passing through an acceleration cavity. And the accelerating apparatus may further include a plurality of coupling cavity units each of which may include a coupling cavity. Two adjacent acceleration cavities may be electromagnetically coupled via the coupling cavity. The plurality of acceleration cavity units may have a plurality of holes each of which may be configured to be in fluidic communication with the corresponding coupling cavity. And an edge region of each of at least a portion of the plurality of holes may include continuously varying curvatures.

Abstract: A plasma generating arrangement includes a plurality of plasma sources, each plasma source including a respective antenna coil assembly electrically coupled to a common electrical terminal via a respective transmission line. Each transmission line is configured to communicate a radio frequency electrical power signal from the common electrical terminal to the respective antenna coil assembly, and has a length which is an odd multiple of ¼ of the wavelength of the radio frequency electrical power signal.

Abstract: Plasma processing apparatus and associated methods are provided. In one example, a plasma processing apparatus can include a plasma chamber configured to be able to hold a plasma. The plasma processing apparatus can include a dielectric window forming at least a portion of a wall of the plasma chamber. The plasma processing apparatus can include an inductive coupling element located proximate the dielectric window. The inductive coupling element can be configured to generate a plasma from the process gas in the plasma chamber when energized with radio frequency (RF) energy. The plasma processing apparatus can include a processing chamber having a workpiece support configured to support a workpiece. The plasma processing apparatus can include an electrostatic shield located between the inductive coupling element and the dielectric window. The electrostatic shield can be grounded via a tunable reactive impedance circuit to a ground reference.

Abstract: A vertical farming layer structure comprising: an underlying support for supporting a plurality of farmed plants; a light-reflective upper surface positioned above and facing the underlying support, the light-reflective upper surface being adapted to reflect light by diffuse reflection; and a plurality of light-emitting devices positioned between the underlying support and the light-reflective upper surface, each light-emitting device being positioned to emit light along a respective optical axis oriented towards the light-reflective upper surface such that light emitted from the light-emitting device is at least partially diffusely reflected off of the light-reflective upper surface to reach the plants supported on the underlying support.

Abstract: A charged particle beam treatment apparatus includes an irradiator that irradiates an irradiation target with a charged particle beam by a scanning method, in which the irradiator includes a scanning electromagnet that performs scanning with the charged particle beam, is rotatable around the irradiation target by a rotating gantry, and emits the charged particle beam with a base axis orthogonal to a center line of the rotating gantry and passing through the center line as a reference, and when the scanning electromagnet is not operated, the charged particle beam which is emitted from a tip portion of the irradiator is inclined in one direction with respect to the base axis.

Abstract: A lighting system includes a first light emitter configured to emit light outside a visible-light spectrum. A second light emitter is configured to emit light in a visible-light spectrum. The first and second light emitters are co-located, such as in a stacked arrangement with one light emitted atop the other. The amount of visible illumination of the second light emitter may correspond to a correlated radiant intensity of infrared light emitted by the first light emitter.

Abstract: An antenna module includes: an antenna substrate including an antenna pattern; a semiconductor package disposed on a lower surface of the antenna substrate, electrically connected to the antenna substrate, and having at least one semiconductor chip embedded therein; and an electronic component disposed on the lower surface or a side surface of the antenna substrate, electrically connected to the antenna substrate, and spaced apart from the semiconductor package by a predetermined distance. The electronic component has a thickness greater than that of the semiconductor chip.

Abstract: Embodiments for the present application include methods and apparatus for operating a plasma enhanced substrate processing system using dual level pulsed radio frequency (RF) power. More specifically, embodiments of the present disclosure allow for frequency and power tuning in a process chamber using dual level pulsed power by using a tuning controller coupled to a matching network and/or a RF power generator. In one embodiment, a tuning system includes a tuning controller disposed in a tuning system, the tuning controller configured to tune dual level RF pulsing data from a RF power generator, wherein the tuning system is connectable to a plasma processing chamber, and a memory connecting to the tuning controller, wherein the tuning controller is configured to couple to a RF power generator and a matching network disposed in the plasma processing chamber.

Abstract: A particle acceleration system includes an ion source that generates an ion, an accelerator that accelerates the ion, And a transporting unit that transports the ion from the ion source to the accelerator, in which an attachment angle and an attachment position of the ion source with respect to the transporting unit are able to be adjusted.