Abstract: Coating compositions comprise: a curable compound comprising: a core chosen from a C6 carbocyclic aromatic ring, a C2-5 heterocyclic aromatic ring, a C9-30 fused carbocyclic aromatic ring system, a C4-30 fused heterocyclic aromatic ring system, C1-20 aliphatic, and C3-20 cycloaliphatic, and three or more substituents of formula (1) wherein at least two substituents of formula (1) are attached to the aromatic core; provided that no substituents of formula (1) are in an ortho position to each other on the same aromatic ring of the core; a polymer; and one or more solvents, wherein the total solvent content is from 50 to 99 wt % based on the coating composition.

Abstract: A molecular resist composition and a pattern forming process. A molecular resist composition comprising a sulfonium salt having a cation of specific structure and an organic solvent has a high sensitivity and forms a resist film with improved resolution and LWR, when processed by EB or EUV lithography. The molecular resist composition does not contain a base polymer. The molecular resist composition comprising a sulfonium salt having a cation of specific partial structure has a high sensitivity and forms a resist film with improved resolution and LWR, so that the resist composition is quite useful for precise micropatterning.

Abstract: The photosensitive resin composition includes an alkali-soluble resin (A), an ethylenically-unsaturated monomer (B), a photopolymerization initiator (C), a solvent (D), and a pigment (E). The alkali- soluble resin (A) includes an alkali-soluble resin (A-1), wherein the alkali-soluble resin (A-1) includes a structural unit represented by formula (I-1) and a structural unit represented by formula (I-2). The photopolymerization initiator (C) includes an acylphosphine oxide compound represented by formula (III-1).

Abstract: A cover film for dry film resist, includes a polyethylene film including a first mixture of high pressure low density polyethylene (LDPE) and linear low density polyethylene (LLDPE). The first mixture has an LDPE to LLDPE ratio by mass of from 90:10 to 60:40. The polyethylene film is free of a plasticizer, anti-blocking agent, slipping agent, and anti-static agent. The number of fish eyes having a minimum diameter of 0.2 mm or greater present in 100 m2 of the 19 ?m thick cover film in plan view is at most two. The polyethylene film has a thickness of from 10 to 20 ?m and a haze value of from 12 to 25%.

Abstract: Isothiocyanato tolane derivatives of formula I-1 and liquid-crystalline media comprising same are suitable for use in high-frequency components, especially microwave components for high-frequency devices, such as devices for shifting the phase of microwaves, in particular for microwave phased-array antennas.

Abstract: Compounds of the formula I in which R1 is alkyl or alkoxy in which CH2 groups are optionally replaced, and X1 is alkyl OCF3, CF3, CHF2, OCF2CF3, CCF2CHFCF3, OCF?CF2, OCH?CF2 or F, a liquid-crystalline medium containing a compound of formula I, and use thereof in electro-optical liquid-crystal displays, in particular in TN, STN, TN-TFT, OCB, IPS, PS-IPS, FFS, HB-FFS or PS-FFS-, positive VA displays and in shutter spectacles for 3D effects and LC lenses.

Abstract: New Te-salt compounds, including photoactive tellurium compounds useful for Extreme Ultraviolet Lithography.

Abstract: A resist composition that generates an acid upon exposure and whose solubility in a developing solution is changed by action of an acid, the resist composition containing a base material component whose solubility in a developing solution is changed by action of an acid, and a compound represented by General Formula (e1) in which Rd01 represents a monovalent organic group and Rd02 represents a single bond or a divalent linking group

Abstract: A polymerisable LC material comprising at least one di- or multireactive mesogenic compound and at least one compound of formula CO-1, wherein R1, R2, L1, L2, L3, and n have the meanings as given in claim 1. Furthermore, a method for preparation of the LC material, a polymer film with improved thermal durability obtainable from the corresponding polymerisable LC material, a method of preparation of such polymer film, and the use of such polymer film and said polymerisable LC material for optical, electro-optical, decorative or security devices.

Abstract: A photoresist composition comprises a first polymer formed by free radical polymerization. The first polymer comprises polymerized units formed from a monomer that comprises an ethylenically unsaturated double bond and an acid-labile group; a photoacid generator; a quencher of formula (1): and a solvent.

Abstract: A liquid crystal composition with which a light absorption anisotropic film having a high alignment degree can be formed. The light absorption anisotropic film is used with the liquid crystal composition, a laminate, and an image display device. The liquid crystal composition contains a linear polymer liquid crystalline compound having a repeating unit; a low-molecular-weight liquid crystalline compound having a maximum absorption wavelength of 390 nm or less in a solution; and a dichroic substance.

Abstract: A salt represented by the formula (I):

Abstract: An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits dissolution contrast, acid diffusion suppressing effect, and excellent lithography performance factors such as CDU, LWR and sensitivity.

Abstract: The compound is represented by general formula (i). In the compound, in a group Ki1, at least two secondary carbon atoms in an alkyl group (a linear alkyl, halogenated alkyl, or cyanogenated alkyl group having 3 to 40 carbon atoms) are replaced with —C(?Xi1)— and/or —CH(—CN)—, where Xi1 is an oxygen atom, a sulfur atom, NH, or NR13; in addition, a group Ai2, a group Ai3, or the group Ki1 includes, as a substituent, at least one Pi1-Spi1- group, where Pi1 is a polymerizable group, and SPi1 is a spacer group or a single bond. The liquid crystal composition including the compound represented by general formula (i) can be adsorbed onto substrates between which a liquid crystal layer is held, and, consequently, without the use of an alignment film, liquid crystal molecules can be maintained in a state in which the liquid crystal molecules are aligned in a vertical direction.

Abstract: A resist composition that generates an acid upon exposure and whose solubility in a developing solution is changed by action of an acid.

Abstract: A liquid crystal composition contains a side chain type polymer liquid crystalline compound which can form a light absorption anisotropic film having a high alignment degree and has excellent solubility in a general-purpose solvent, a light absorption anisotropic film obtained using the composition, a laminate, and an image display device. The composition includes: a side chain type polymer liquid crystalline compound; and a dichroic substance, in which the compound is a copolymer having a repeating unit (1) containing a mesogenic group with a molecular weight of greater than 280 and a repeating unit (2) with a molecular weight of 280 or less, a content of the repeating unit (2) is less than 14% by mass with respect to a total mass of the compound, and a content of the dichroic substance is greater than 2% by mass with respect to a total solid content of the composition.

Abstract: A polymerizable composition containing: a) a polymerizable compound having one or two or more polymerizable groups and satisfying formula (I): Re(450 nm)/Re(550 nm)<1.0 (I); b) at least one photopolymerization initiator selected from the group consisting of alkylphenone-based compounds, acylphosphine oxide-based compounds, and oxime ester-based compounds; and c) a polymerization inhibitor. An optically anisotropic body, a retardation film, an antireflective film, and a liquid crystal display device that are produced using the polymerizable liquid crystal composition. The polymerizable composition is excellent in solubility and has high storage stability, so that no precipitation of crystals etc. occurs. When a film-shaped polymer is produced by polymerizing the above composition, the unevenness of the surface of the coating film is small while the alignment of the liquid crystal is maintained, and high durability is obtained. Therefore, the polymerizable composition is useful.

Abstract: A negative working, aqueous base developable, photosensitive photoresist composition and a process of using this composition to produce lithographic images, where this composition is one comprising: a) a polymer containing the four repeat units of structures (1), (2), (3), and (4), but no other types of repeat units; wherein v, x, y and z, respectively, represent the mole % of each repeat units of structures (1), (2), (3) and (4); b) a radical photo-initiator component, which is comprised of at least one radical photo initiator which is activated by a broad absorption of radiation from about 360 nm to about 440 nm; c) a crosslinker component which is either a mixture consisting of crosslinkers of structure (5), (6) and (7), or a single crosslinker of structure (8); d) a radical inhibitor component; e) an optional surfactant component; f) an optional dissolution promoter component; and g) a solvent. The invention also relates to the process of using this negative resist to produce lithographic images.

Abstract: A blue curable resin composition includes a colorant (A), a resin (B), a polymerizable compound (C) and a polymerization initiator (D). The colorant (A) includes two or more pigments each having a phthalocyanine backbone. The blue curable resin composition has relatively low in Bx and is high in intensity in an xy chromaticity diagram of an XYZ color system. A color filter may be formed from the blue curable resin composition. The blue curable composition may be also used in a display device.

Abstract: Mesogenic compounds having a structure of Formula (I), (II) or (III): where A, B, X1, L, TG, m, and n are defined as in claim 1. Compositions containing these compounds, articles made from these polymerized and prepolymerized compositions, and methods of estimating the elastic constants and anchoring constants of a liquid crystal materials and mapping topological defect structures in liquid crystals using these compounds.