Patents Examined by Anna Verderame
  • Patent number: 8518633
    Abstract: Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a rotatable mask is used to image a radiation-sensitive material. Typically the rotatable mask comprises a cylinder. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the substrate is in contact or close proximity with the substrate. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a rotating cylinder surface comprises metal nano holes or nanoparticles.
    Type: Grant
    Filed: April 1, 2009
    Date of Patent: August 27, 2013
    Assignee: Rolith Inc.
    Inventors: Boris Kobrin, Boris Volf, Igor Landau
  • Patent number: 8472020
    Abstract: A method for enhancing recording yields by monitoring dye polymer formation on a glass substrate is provided. After the glass substrate is coated with a dye polymer layer and before pits are formed on the dye-polymer coated glass, the dye polymer coated glass substrate is scanned to detect defects. The dye-polymer coated glass is discarded on the one hand if the defects detected through the scanning are at or above an unacceptable threshold level, and on the other hand data is written on the dye-polymer coated glass if the defects detected through the scanning are below the unacceptable threshold level.
    Type: Grant
    Filed: February 15, 2005
    Date of Patent: June 25, 2013
    Assignee: Cinram Group, Inc.
    Inventor: Thomas I. Sweeney
  • Patent number: 8383327
    Abstract: An electro-optical printed circuit board contains electrical conductor tracks on the one hand and optical waveguide structures on the other hand. The optical waveguide structures comprise a bottom layer, a core layer and a cladding layer. Visible areas are applied to the printed circuit board, and the core layer is applied later both to the bottom layer as well as the visible areas and structured both on the bottom layer as well as the visible areas. This structure is then transferred to the visible areas, e.g. by etching. Reference marks are thus produced which contain the information on the actual position of the optical waveguide structures.
    Type: Grant
    Filed: February 16, 2010
    Date of Patent: February 26, 2013
    Assignee: vario-optics ag
    Inventors: Felix Betschon, Markus Halter
  • Patent number: 8357477
    Abstract: A method of manufacturing a color filter substrate is provided. The color filter substrate includes a substrate, a light-shielding layer, and a plurality of color filter patterns. The substrate has a plurality of annular trough areas, a plurality of central areas, and a light-shielding area positioned among the annular trough areas. Each of the annular trough areas has an inner edge connected to the central area and an outer edge connected to the light-shielding area. The light-shielding layer is disposed on the light-shielding area and extends from the outer edges of the annular trough areas to the top of the annular trough areas. The color filter patterns are disposed on the annular trough areas and the central areas, and the color filter patterns are in contact with a side surface and a part of the bottom surface of the light-shielding layer.
    Type: Grant
    Filed: April 2, 2012
    Date of Patent: January 22, 2013
    Assignee: Au Optronics Corporation
    Inventors: Chun-Chieh Tsao, Han-Tu Lin
  • Patent number: 8349548
    Abstract: Compounds of the formula (I), wherein A1 is formula (II); A2 is formula (III); A3 is formula (IV); A4 is formula (V); w, x, y and z independently of each other are an integer from 0-4, provided that the sum of x+y+z is an integer from 2-4, corresponding to the valency of Q; M1, M2, M3 and M4 for example are a direct bond, CO or O; Y for example is a direct bond or S; Q is a (x+y)-valent linking group; R1 is for example hydrogen, C1-C20alkyl or phenyl or naphthyl; R2 and R?2 for example are is hydrogen or C1-C20alkyl; R3, R4, R?3, R?4, R?3 and R?4 for example are hydrogen, halogen, phenyl, or C1-C20alkyl; and R24 is for example a direct bond; exhibit an unexpectedly good performance in photopolymerization reactions.
    Type: Grant
    Filed: April 28, 2008
    Date of Patent: January 8, 2013
    Assignee: BASF SE
    Inventors: Akira Matsumoto, Junichi Tanabe, Hisatoshi Kura, Masaki Ohwa
  • Patent number: 8334217
    Abstract: Embodiments of the invention relate to a method of functional materials deposition using a polymer template fabricated on a substrate. Such template forms an exposed and masked areas of the substrate material, and can be fabricated using polymer resists or Self-assembled monolayers. Deposition is performed using an applicator, which is fabricated in the shape of cylinder or cone made of soft elastomeric materials or laminated with soft elastomeric film. Functional materials, for example, metals, semiconductors, sol-gels, colloids of particles are deposited on the surface of applicator using liquid immersion, soaking, contact with wetted surfaces, vapor deposition or other techniques. Then wetted applicator is contacted the surface of the polymer template and rolled over it's surface. During this dynamic contact functional material is transferred selectively to the areas of the template. Patterning of functional material is achieved by lift-off of polymeric template after deposition.
    Type: Grant
    Filed: June 8, 2009
    Date of Patent: December 18, 2012
    Assignee: Rolith Inc.
    Inventor: Boris Kobrin
  • Patent number: 8318386
    Abstract: Embodiments of the invention relate to methods useful in the fabrication of nanostructured devices for optics, energy generation, displays, consumer electronics, life sciences and medicine, construction and decoration. Instead of nanostructuring using colloids of particles, special vacuum deposition methods, laser interference systems (holography), and other low-throughput limited surface area techniques, we suggest to use nanotemplate created by novel nanolithography method, “Rolling mask” lithography. This method allows fast and inexpensive fabrication of nanostructures on large areas of substrate materials in conveyor-type continuous process. Such nanotemplate is then used for selective deposition of functional materials. One of embodiments explains deposition of functional materials in the exposed and developed areas of the substrate. Another embodiment uses selective deposition of the functional material on top of such template.
    Type: Grant
    Filed: August 6, 2009
    Date of Patent: November 27, 2012
    Assignee: Rolith Inc.
    Inventor: Boris Kobrin
  • Patent number: 8298755
    Abstract: Methods for producing small crystals on islands formed on specialized substrates by, inter alia, subjecting the substrate to a hydrophilic SAMs solution for self-assembling hydrophilic SAMs on certain portions of the substrate surface and subjecting the substrate to a hydrophobic SAMs solution for self-assembling hydrophobic SAMs on certain other portions of the substrate surface.
    Type: Grant
    Filed: July 28, 2008
    Date of Patent: October 30, 2012
    Assignee: Illinois Institute of Technology
    Inventors: Allan S. Myerson, In Sung Lee
  • Patent number: 8278029
    Abstract: A stamper production method includes: a stamper forming step of producing, by electroplating processing using a matrix in which a pit string constituted of a concave pit is formed on an inorganic resist layer based on recording information, a stamper on which a convex pit corresponding to the concave pit is formed; and an etching step of carrying out etching processing on the stamper so that a reduction ratio of a pit height of a short pit becomes larger than that of a long pit regarding the convex pit of the stamper.
    Type: Grant
    Filed: January 19, 2010
    Date of Patent: October 2, 2012
    Assignee: Sony Corporation
    Inventor: Kensaku Takahashi
  • Patent number: 8263293
    Abstract: In a monolithic ink jet printhead, a structural layer is made comprising cavities, obtained from the polymerization of a solution of a monomer, or an oligomer, and a photointiator; during the polymerization by radiation, acid species are unduly generated in zones protected by a mask, due to reflection of the radiation on reflecting surfaces of the support of the sructural layer; these acid species cause undue polymerization of the solution on the inside of the cavities to oppose the formation of these acid species, a polymerzation inhibitor basic compound is used.
    Type: Grant
    Filed: December 22, 2004
    Date of Patent: September 11, 2012
    Assignee: Telecom Italia S.p.A.
    Inventors: Fulvio Cominetti, Luigina Gino
  • Patent number: 8221964
    Abstract: The invention relates to a process for forming a structure comprising providing a support, coating one side of said support with a colored mask, coating a layer photopatternable by visible light, and exposing the layer through the colored mask with visible light to photopattern the layer.
    Type: Grant
    Filed: November 20, 2007
    Date of Patent: July 17, 2012
    Assignee: Eastman Kodak Company
    Inventors: Lyn M. Irving, David H. Levy, Mark E. Irving, Carolyn R. Ellinger
  • Patent number: 8211596
    Abstract: A method of forming a security device comprises: a) providing an undeveloped photoresist layer on an electrically conductive layer; b) forming a first diffractive pattern in the undeveloped photoresist layer using optical-interferometry; c) forming a second diffractive pattern in the undeveloped photoresist layer using electron beam lithography; and d) thereafter developing the photoresist layer.
    Type: Grant
    Filed: January 19, 2007
    Date of Patent: July 3, 2012
    Assignee: De La Rue International Ltd.
    Inventor: Brian William Holmes
  • Patent number: 8211597
    Abstract: A color photoresist with gold nanoparticles and color filters made therefrom are provided. The color photoresist with gold nanoparticles includes substituted acrylate monomers, gold nanoparticles (or clusters), surfactants and a photo-polymerization initiator. The color filter includes a polyacrylate, gold nanoparticles (or clusters) and surfactants. The gold nanoparticles (or clusters) can be dispersed in the color photoresist or the color filter by the surfactants.
    Type: Grant
    Filed: June 12, 2008
    Date of Patent: July 3, 2012
    Assignee: Chimei Innolux Corporation
    Inventors: Wei-Fang Su, Chien-Chih Lin, I-Shuo Liu
  • Patent number: 8187776
    Abstract: A color filter substrate is provided. The color filter substrate includes a substrate, a light-shielding layer, and a plurality of color filter patterns. The substrate has a plurality of annular trough areas, a plurality of central areas, and a light-shielding area positioned among the annular trough areas. Each of the annular trough areas has an inner edge connected to the central area and an outer edge connected to the light-shielding area. The light-shielding layer is disposed on the light-shielding area and extends from the outer edges of the annular trough areas to the top of the annular trough areas. The color filter patterns are disposed on the annular trough areas and the central areas, and the color filter patterns are in contact with a side surface and a part of the bottom surface of the light-shielding layer.
    Type: Grant
    Filed: October 1, 2008
    Date of Patent: May 29, 2012
    Assignee: Au Optronics Corporation
    Inventors: Chun-Chieh Tsao, Han-Tu Lin
  • Patent number: 8188525
    Abstract: An image sensor includes a substrate, transparent layers covering the substrate and delimiting an exposition surface exposed to light, separate photosensitive areas at the substrate level and, for each photosensitive area, a first optical means capable of deviating towards the photosensitive area light reaching a central region of a portion of the exposition surface. The sensor further includes, for each photosensitive area, a second optical means, separate from the first optical means, capable of deviating towards the photosensitive area light reaching a peripheral region of the portion of the exposition surface surrounding the central region.
    Type: Grant
    Filed: May 17, 2006
    Date of Patent: May 29, 2012
    Assignee: STMicroelectronics S.A.
    Inventor: Jerome Vaillant
  • Patent number: 8182982
    Abstract: Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of rotationally symmetric disk materials, like magnetic and optical disks, where a rotatable mask is used to image a radiation-sensitive material. Typically the rotatable mask comprises a cone. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the disk is in contact or close proximity with the disk. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a rotating cone surface comprises metal nano holes or nanoparticles.
    Type: Grant
    Filed: April 1, 2009
    Date of Patent: May 22, 2012
    Assignee: Rolith Inc
    Inventor: Boris Kobrin
  • Patent number: 8173355
    Abstract: The invention relates to a process for forming a structure comprising: (a) providing a transparent support; (b) forming a color mask having a selected absorption spectral range wherein the color mask has an effectively transparent portion and a partially absorptive portion, wherein the partially absorptive portion includes at least two portions having different optical densities within the absorption spectral range; (c) coating a layer of a photopatternable material sensitive to visible light in the absorption spectral range; (d) exposing and developing the photopatternable material to form a photopattern corresponding to at least one of said two portions of the partially absorptive portion; and (e) depositing and patterning a layer of functional material such that a pattern of functional material results corresponding to the at least one of said two portions of the partially absorptive portion.
    Type: Grant
    Filed: November 20, 2007
    Date of Patent: May 8, 2012
    Assignee: Eastman Kodak Company
    Inventors: Lyn M. Irving, Mark E. Irving, Lan B. Thai
  • Patent number: 8148049
    Abstract: A manufacturing method of an ink jet recording head includes steps of forming a liquid flow path mold material of a soluble resin on a substrate on which an energy generating element is formed, the energy generating element being configured to generate energy for use in discharging ink; forming a coating resin layer of a negative photosensitive resin on the substrate on which the mold material is formed; exposing and developing the coating resin layer to form an ink discharge port in the coating resin layer; and dissolving and removing the mold material to form a liquid flow path. During the exposing of the coating resin layer, a total amount of exposure energy per unit area applied to an exposure region other than a region of the coating resin layer positioned above the mold material is greater than that of exposure energy per unit area applied to the region of the coating resin layer positioned above the mold material.
    Type: Grant
    Filed: March 1, 2007
    Date of Patent: April 3, 2012
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hiroyuki Murayama, Junichi Kobayashi, Yoshinori Tagawa, Kenji Fujii, Hideo Tamura, Taichi Yonemoto, Keiji Watanabe
  • Patent number: 8148046
    Abstract: The surface of a transparent layer provided on the uppermost layer of the label side of an optical disk is subjected to pearskin finish. As a result, a light from a reflection layer is prevented from directly entering a user who has viewed an image on the label side, and an antiglare phenomenon is prevented from occurring. This configuration enables good viewing.
    Type: Grant
    Filed: March 30, 2006
    Date of Patent: April 3, 2012
    Assignee: Yamaha Corporation
    Inventor: Tamotsu Homma
  • Patent number: 8137894
    Abstract: According to an embodiment, a storage medium includes a transparent resin substrate having a concentric or spiral groove and a recording film formed on the groove on the transparent resin substrate, a recording mark being formed by irradiation of a laser beam, wherein a reproduction durability count in a case where reproduction is continuously carried out by a laser beam is 1,000,000 or more.
    Type: Grant
    Filed: February 22, 2006
    Date of Patent: March 20, 2012
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Seiji Morita, Koji Takazawa, Kazuyo Umezawa, Hideo Ando, Yasuaki Ootera, Naoki Morishita, Naomasa Nakamura