Abstract: Electrospray systems, electrospray structures, removable electrospray structures, methods of operating electrospray systems, and methods of fabricating electrospray systems, are disclosed.

Abstract: In a charged-particle beam exposure device, an electrostatic lens (ML) comprises several (at least three) electrodes with rotational symmetry (EFR, EM, EFN) surrounding a particle beam path; the electrodes are arranged coaxially on a common optical axis representing the center of said particle beam path and are fed different electrostatic potentials through electric supplies. At least a subset of the electrodes (EM) form an electrode column realized as a series of electrodes of substantially equal shape arranged in consecutive order along the optical axis, wherein outer portions of said electrodes (EM) of the electrode column have outer portions (OR) of corresponding opposing surfaces (f1, f2) facing toward the next and previous electrodes, respectively. Preferably, the length of the electrode column is at least 4.1 times (3 times) the inner radius (ri1) of said surfaces (f1, f2).

Abstract: An apparatus for an ion trap includes an electrically conductive substrate having top and bottom surfaces and having vias that cross from the top surface to the bottom surface. The apparatus includes a pair of planar first electrodes supported over said top surface and second electrodes having planar surfaces. The planar surfaces are located over said top surface, and portions of the planar surfaces are located laterally adjacent to said planar first electrodes. One of the second electrodes includes a portion that is located in one of the vias and traverses the substrate.

Abstract: In an image noise prevention method in a composite system of a scanning electron microscope (SEM) and a focused ion beam apparatus (FIB), noise generated during a blanking period of the FIB is prevented from entering an image generated by the SEM by adjustment of scanning cycles of the FIB and the SEM.

Abstract: A method for determining a depression/protrusion, especially of a line and space pattern formed on a sample, and an apparatus therefor. A charged particle beam is scanned with its direction being inclined to the original optical axis of the charged particle beam or a sample stage is inclined, broadening of a detected signal in a line scanning direction of the charged particle beam is measured, the broadening is compared with that when the charged particle beam is scanned with its direction being parallel to the original optical axis of the charged particle beam, and a depression/protrusion of the scanned portion is determined on the basis of increase/decrease of the broadening.

Abstract: One embodiment disclosed relates to a Wien filter for a charged-particle beam apparatus. The charged-particle beam is transmitted through the Wien filter in a first direction. A magnetic field generation mechanism is configured to generate a magnetic field in a second direction which is perpendicular to the first direction, and an electrostatic field generation mechanism is configured to generate an electrostatic field in a third direction which is perpendicular to the first and second directions. The field generation mechanisms are further configured so as to have an offset between the positions of the magnetic and electrostatic fields along the first direction. Another embodiment disclosed relates to a Wien filter type device wherein the magnetic force is approximately twice in strength compared to the electrostatic force. Other embodiments are also disclosed.

Abstract: The present invention relates to a CDSEM (scanning electron microscope) capable of evaluating and presenting the measurement repeatability as a tool with a high degree of accuracy without being influenced by fluctuations in micro-minute shape that tend to increase with the microminiaturization of semiconductor patterns, and to a method for evaluating accuracy of repeated measurement using the scanning electron microscope. There is provided a function whereby when measuring a plurality of times the same part to be measured, by making use of a micro-minute pattern shape such as the roughness included in the pattern, pattern matching with a roughness template image is performed to correct two-dimensional deviation in position of the part to be measured on an enlarged measurement image acquired, and then an enlarged measurement area image is extracted and acquired. This makes it possible to eliminate variation in measurements caused by the micro-minute pattern shape.

Abstract: The invention is directed to a method and an arrangement for plasma-based generation of soft x-radiation, particularly for the generation of extreme ultraviolet (EUV) radiation. The object of the invention, to find a novel possibility for providing a target for a plasma-based radiation source which permits a reduction in the heating and erosion of the nozzle and therefore permits an improved temperature control at the injection device, is met according to the invention in that a closure device is arranged between the target nozzle and the interaction region which interrupts an opening for temporarily passing the target flow by mechanically moving elements, wherein at least a portion of the target flow that is provided in a reproducible manner is separated in order to interact with the energy beam only during those time intervals in which an optical transmission from the interaction region to the target nozzle is prevented by the closure device.

Abstract: A method of operating a corona discharge device includes producing a high-intensity electric field in an immediate vicinity of at least one corona electrode and continuously or periodically heating the corona electrode to a temperature sufficient to mitigate an undesirable effect of an impurity, such as an oxide layer, formed on the corona electrode.

Abstract: A particle therapy system capable of measuring energy of a charged particle beam even during irradiation of the charged particle beam is provided. A beam delivery (irradiation) system comprises a block collimator constituted by a pair of collimator members, and an energy detector mounted to one of the collimator members to be disposed on the upstream side thereof. When the pair of collimator members are moved in directions away from each other, a beam passage is formed between them. The energy detector constitutes an energy measuring device together with a signal processing unit. A part of the ion beam having reached the interior of the irradiation nozzle is irradiated to a patient through the beam passage. When a part of the remaining ion beam enters the energy detector, electric charges generate in the energy detector. The signal processing unit determines energy of the ion beam based on a position within the energy detector at which electric charges have generated in maximum amount.

Abstract: A reflectron lens and method are provided. The reflectron lens comprises a tube having a continuous conductive surface along the length of the tube for providing an electric field interior to the tube that varies in strength along the length of the tube. The tube may comprise glass, and in particular, a glass comprising metal ions, such as lead, which may be reduced to form the conductive surface. The method includes a step of introducing a beam of ions into a first end of a dielectric tube having a continuous conductive surface along the length of the tube. The method further includes a step of applying an electric potential across the tube to create an electric field gradient that varies in strength along the length of the tube so the electric field deflects the ions to cause the ions to exit the tube through the first end of the tube.

Abstract: A nebulizer adapted for adjusting a position of a capillary tube contained within the nebulizer is provided. The nebulizer includes an elongated tubular shell having a gas input port and a gas output port, a capillary adjustment adapter for displacing the capillary tube in a lateral direction via a rotational force, and a connector for connecting the elongated tubular shell, the capillary adjustment adapter and the capillary tube.

Abstract: A kinematic electrode mount is provided for an ion implanter in which an electrode insert member having an electrode body portion which defines an aperture, is inserted into an electrode support frame. In one embodiment, a first kinematic alignment pin of the insert member engages a first, groove-shaped kinematic alignment surface of the electrode support frame to align the first alignment pin in two orthogonal directions relative to the electrode support frame. In addition, a second kinematic alignment pin of the insert member engages a second kinematic alignment surface of the electrode support frame to align the insert member in a rotational orientation relative to the electrode support frame. A plurality of flanges of the insert member engage the electrode support frame to retain the insert member in the aligned position and to electrically couple the electrode insert member to the electrode support frame.

Abstract: A detection scheme for time-of-flight mass spectrometers is described that extends the dynamic range of spectrometers that use counting techniques while avoiding the problems of crosstalk. It is well known that a multiple anode detector capable of detecting different fractions of the incoming particles may be used to increase the dynamic range of a TOFMS system. However, crosstalk between the anodes limits the amount by which the dynamic range may be increased. The present invention overcomes limitations imposed by crosstalk by using either a secondary amplification stage or by using different primary amplification stages.

Abstract: One embodiment disclosed pertains to an inspection system for inspecting a specimen. The system includes a plurality of columns for directing a plurality of multi-pixel incident beams onto a plurality of multiple-pixel regions of the specimen. Impingement of said incident beams causes emission of electrons from the regions. The system further includes a plurality of multiple-pixel electron detectors, each said detector configured to detect in parallel electrons emitted from a plurality of pixels in one of the regions, and a plurality of processing sub-systems. Each said sub-system is configured to process data from one of said detectors. Advantageously, throughput for an inspection system in accordance with an embodiment of the invention may be increased by approximately a factor of N, where N is the number of columns in the system.

Abstract: A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The illumination system includes a radiation-production system that produces extreme ultra-violet radiation, and a radiation-collection system that collects extreme ultra-violet radiation. Particles that are produced as a by-product of extreme ultra-violet radiation production move substantially in a particle-movement direction. The radiation-collection system is arranged to collect extreme ultra-violet radiation which radiates in a collection-direction, which is substantially different from the particle-movement direction.

Abstract: The invention relates to a method for creating the image of a sample surface to be analyzed, with a resolution which is better than 1 ?m laterally in relation to the sample surface and better than 100 nm vertically in relation to said surface. According to the invention, the surface is scanned on a point-by-point basis by a scanning probe, the distance between the scanning probe and the sample surface at each scanning point being periodically modulated, in such a way that a force-time curve of the probe is produced for this point. The force-time curve is recorded at each scanning point, digitized using an A/D converter, evaluated online in real-time and stored, together with the entire data stream, in a first area of a memory device.

Abstract: The present invention provides a nanospray means and method for use in mass analysis instruments. Specifically, a nanospray assembly is composed in part of a base, union, retainer, and nanospray needle, and an entrance cap, first capillary section, and union. Adjustments to the position of the nanospray needle within this assembly are made independent of the remainder of the ion source. The nanospray assembly is integrated with the remainder of the source by joining the first capillary section (of the nanospray assembly) with a second capillary section which is fixed in the body of the source.

Abstract: A compact vacuum chamber gives electric and optical access to a microchip, which is part of the chamber. The main use of the microchip is to confine, cool and manipulate cold atoms (atom chip). The main new feature is that the microchip forms one wall of a vacuum cell. This makes the chamber compact and lightweight, provides large optical access combined with small overall size, eliminates in-vacuum cabling, and makes the back surface of the chip accessible from the outside (e.g., for cooling and/or additional field-producing elements).

Abstract: An emitting source capable of radiating substantial energy in the near infrared spectrum and suitable for use in non-dispersive infrared gas analyzers or other devices is described. Operation can be steady state (DC) or pulsed at high frequency with excellent modulation characteristics. The device consists of a tungsten filament mounted across the pins of a small transistor outline header and centered at the focal point of a parabolic or other shaped reflector. The header assembly is enclosed by a resistance-welded cap and window assembly having a specially sealed sapphire or other suitable IR transmissive window. Fundamental to the operation of the inventive IR emitter is the incorporation of a getter within the header package configured to prevent oxidation degradation of the tungsten filament. An inert gas backfill limits filament evaporation and further extends apparatus lifetime.