Abstract: Patterned photoresist layers formed on substrates have features with high aspect ratios. The photoresist layers can be formed as single layers with aspect ratios as high as about 4:1. In addition, the features in the photoresist layers can have a wide range of aspect ratios in a given single layer. The photoresist layers can be used in ink jet print heads and other devices to provide controlled fluid flow. The photoresist layers are formed using a contrast enhancement material that enables features having substantially vertical side walls and high aspect ratios to be formed.

Abstract: A photomask (1) comprises a transmissive base plate (2) a first side of which is provided with a layer of a metallic mask material (4). In this layer, a mask pattern (5) is formed which is enclosed by an inner region (6) and an outer region (7) of mask material, the inner region and the outer region being separated by a ring-shaped protection area (8). In this protection area, a protection pattern (9) is formed having tracks (10) with end portions (11) situated near the inner and outer regions and at a distance (12) therefrom, which distance is small compared to the smallest distance between pattern parts in the mask pattern (5). The photomask is thus protected against electrostatic discharges, which could damage the mask pattern.

Abstract: A method for forming a plated layer. There is first provided a substrate. There is then formed over the substrate a masking frame employed for masking frame plating a masking frame plated layer within the masking frame, where the masking frame is fabricated to provide an overhang of an upper portion of the masking frame spaced further from the substrate with respect to a lower portion of the masking frame spaced closer to the substrate. Finally, there is then plated the masking frame plated layer within the masking frame. The method is useful for forming masking frame plated magnetic pole tip stack layers with enhanced planarity dimensional control within magnetic transducer elements.

Abstract: Thermally imageable lithographic printing plate precursors and heat-sensitive compositions for use in these printing plate precursors are disclosed. The compositions contain an aqueous developer soluble polymer, such as a phenolic resin; a compound that reduces the aqueous developer solubility of the polymer; and optionally, and infrared absorber. Examples of compounds that reduce the aqueous developer solubility of the polymer are those that contain at least one quarternized nitrogen atom, such as quinolinium compounds, benzothiazolium compounds, pyridinium compounds, and imidazoline compounds. On thermal imaging, the irradiated areas become more soluble in the aqueous developer and can be removed to form a positive image.

Abstract: The invention provides near infrared absorbers showing high light-to-heat conversion efficiency and high sensitivity to laser beams whose emission region is within the range of 750 nm to 900 nm, plates for direct printing plate making, and novel compounds which can be used in such absorbers or plates. The compounds are polymethine compounds of the general formula (I) shown below and the near infrared absorbers comprise the polymethine compounds.

Abstract: A lithographic printing surface is prepared using a thermal lithographic printing plate which requires no chemical development to remove areas of the imaged plate. The processless thermal lithographic printing plate has a sheet substrate; a hydrophilic layer on the sheet substrate; and a thermally sensitive imaging layer on the hydrophilic layer. The hydrophilic layer contains about 30 weight % of an aluminosilicate or clay, and preferably has an exterior surface which is micro-porous. The imaging layer preferably is micro-porous. The imaging layer is exposed imagewise using infrared laser radiation to produce an imaged layer. The imaged layer is treated with a conditioner liquid to produce a lithographic printing surface.

Abstract: In a film or panel having excellent near-infrared absorbability and excellent near-infrared shieldability, and having a high degree of visible ray transmittance and good color tone, in order to produce the near-infrared-absorbing film or panel having good color tone while the near-infrared-absorbing dye disposed therein is kept stable, the dye and the binder resin for the dye are specifically selected, and the production method is also specifically selected. In addition, for the purpose of producing the film or panel while the dye disposed therein is kept stable and for the purpose of making the film or panel have additional functions such as electromagnetic radiation absorbability, the film or panel is made to have a multi-layered structure.

Abstract: Imagable articles comprising positive working polymeric resins coating onto substrates are given a heat treatment comprising their controlled slow cooling from an elevated temperature. The imagable articles include precursors for lithographic printing plates and for printed circuits. The controlled slow cooling improves the development characteristics of the coatings after an imaging step.

Abstract: According to the present invention there is provided a method for making a lithographic printing plate comprising the steps of a) exposing imagewise to IR-radiation a heat mode imaging element having on a lithographic base with a hydrophilic surface a first layer including a polymer, soluble in an aqueous alkaline solution and a top layer on the same side of the lithographic base as the first layer which top layer is unpenetrable by an alkaline developer and contains a compound capable of converting light into heat, wherein said first layer and said top layer may be one and the same layer; and b) developing said imagewise exposed heat mode imaging element with said alkaline developer whereby the exposed areas of the first and the top layer, which may be the same, are dissolved and the unexposed areas of the first layer remain undissolved characterized in that said alkaline developer has a pH of at least 12 and a surface tension of at least 30 mN/m.

Abstract: This patent describes on-press process of a lithographic plate comprising on a substrate a photosensitive layer and a top laser sensitive mask layer. The plate is exposed by first digitally exposing the plate with an infrared radiation to selectively remove or render transparent to an actinic radiation exposed areas of the mask layer and then overall exposing the plate with the actinic radiation to cause hardening or solubilization of the photosensitive layer in the infrared laser exposed areas. The exposed plate is processed on a printing press by contacting the plate with ink and/or fountain solution during initial press operation to remove the mask layer and develop the photosensitive layer. Optionally, an ink and/or fountain solution soluble or dispersible interlayer may be interposed between the mask layer and the photosensitive layer.

Abstract: Heat-imagable negative working lithographic printing forms employ negative working heat sensitive compositions comprising a water soluble binder and particles of pigment in association with a thermoplastic resin. Heat causes fusion of the particles to the binder. Heated regions are thereby rendered insoluble to aqueous developers. Unheated areas are soluble in developer or fount solutions, so development may take place “on-press” during the initial phase of a print run.

Abstract: Methods are provided for producing relief images having improved fidelity and resolution. The methods comprise positioning an image-bearing negative transparency closely adjacent and substantially parallel to a layer of a photocurable material; positioning on the other side of the negative from the photocurable material and in substantially parallel relationship thereto; providing a collimator that has first and second opposing major faces and comprises at least one cell that extends from said first collimator face to said second collimator face and is defined by at least one surface that substantially absorbs actinic radiation incident upon said surface; positioning said collimator opposite a photographic negative that is adjacent a layer of photocurable material; and passing actinic radiation through said collimator for a time sufficient to form a latent relief image in the photocurable material.

Abstract: This invention discloses a lithographic plate comprising on a roughened substrate a substantially conformal radiation-sensitive layer. The radiation-sensitive layer can be a photo hardenable or photo solubilizable layer, or can be a laser ablatable layer. The radiation-sensitive layer is substantially conformally coated on the roughened substrate surface in a way so that the surface of the radiation-sensitive layer has peaks and valleys substantially corresponding to the major peaks and valleys of the substrate microscopic surface. The lithographic plate of such a configuration can provide no or low tackiness and excellent block resistance, while allowing excellent press durability. For on-press developable lithographic plate, such a plate configuration also allows excellent on-press developability.

Abstract: A method of making a lithographic printing plate by forming images at the surface of a lithographic printing plate precursor by means of a thermal head, with the lithographic printing plate precursor having on a support a recording layer comprising a polymer having at least either carboxylic acid or carboxylate groups capable of causing thermal decarboxylation; and a photopolymer composition for recording by exposure to infrared laser beams, wherein a thermally decarboxylation-causing polymer and a photothermal converter are comprised.

Abstract: A positive-working, radiation-sensitive mixture which contains an organic, polymeric binder which is insoluble in water but soluble or at least swellable in aqueous alkaline solution and at least one IR-absorbing dye, is described. A daylight-insensitive recording material which can be provided with an image using IR radiation and has a substrate and a layer comprising the mixture is also disclosed. After imagewise exposure, in particular to IR laser beams, and development with an aqueous alkaline solution, an offset printing plate can be formed therefrom.

Abstract: According to the present invention there is provided a method for making lithographic printing plates including the following steps a) preparing a heat mode imaging element having on a lithographic base with a hydrophilic surface a first layer including a polymer, soluble in an aqueous alkaline solution and a top layer on the same side of the lithographic base as the first layer which top layer is sensitive to IR-radiation and is unpenetrable for an alkaline developer containing SiO2 as silicates; b) exposing imagewise said heat mode imaging element to IR-radiation; c) developing said imagewise exposed heat mode imaging element with said alkaline developer so that the exposed areas of the top layer and the underlying areas of the first layer are dissolved and the unexposed areas of the first layer remain undissolved characterized in that said top layer includes an IR-dye in an amount between 1 and 100% by weight of the total amount of said IR-sensitive top layer selected from the group consisting of indoan

Abstract: A lithographic printing plate precursor for ultraviolet ray exposure comprising a support having provided thereon a light-sensitive layer containing fine anatase-type titanium oxide grains and a resin having a siloxane bond represented by the following formula (I): wherein A and B, which may be the same or different, each represents —O—, a hydrogen atom, a hydrocarbon group or a heterocyclic group. The lithographic printing plate precursor can provide a lithographic printing plate only by imagewise exposure to ultraviolet ray without undergoing any wet process, for example, desensitizing treatment, sensitizing treatment or alkaline processing. A method for the preparation of a lithographic printing plate using the lithographic printing plate precursor is also disclosed.

Abstract: A method of making a heat transfer from an image for application to a T-shirt or other piece of cloth is disclosed. An image is scanned to create a computer image represented by a computer readable image file. The image is separated into a plurality of colors using a computer to create a separated image. A plurality of plates is created from the separated image corresponding to each of the colors. The plates are printed on film to create a plurality of color separation films corresponding to one of the plurality of colors. Mesh screens are treated with a photoemulsion. The color separation films are then placed on the mesh screens and light is applied to the mesh screens A portion of the photoemulsion hardens in the light and a second portion of the photemulsion covered by the printed matter on the color separation films remains soft. The mesh screens are washed to remove the second portion of the photoemulsion. Ink is applied to a piece of transfer paper through the mesh screens.

Abstract: A negative working waterless lithographic printing plate precursor excellent in image reproducibility and scratch resistance and writable by laser beams, which comprises a support having thereon a light-sensitive layer and a silicone rubber layer provided on the light-sensitive layer, the light-sensitive layer being reduced in adhesion to the silicone rubber layer by exposure, wherein the light-sensitive layer comprises a polymer having at least one group selected from the group consisting of a siloxane group and an alkyl fluoride group and at least one group selected from the group consisting of an unsaturated double bond group and a hydroxyl group.

Abstract: A method of forming a metal wiring using a dual damascene process is provided. A photosensitive polymer having low permittivity is used as an etch mask. Though the etch mask remains in the final structure, its low permittivity reduces parasitic capacitance effects. In this method, a photosensitive polymer pattern having a first hole with a first width is formed on a first interlayer dielectric film. A second interlayer dielectric film is formed on the photosensitive polymer pattern. A mask pattern, having a second hole, above the first hole, with a second width larger than the first width, is formed on the second interlayer dielectric film. A wiring region is formed by dry-etching the second interlayer dielectric film using the mask pattern as an etch mask. A via hole region is formed by dry-etching the first interlayer dielectric film using the photosensitive polymer pattern as an etch mask.