Abstract: A suspension array includes a support rod, an elastic member wound around the support rod, a housing supported by the elastic member and including a compartment surrounding the support rod, the support rod being coupled to the housing while penetrating the housing in the longitudinal direction, a friction member installed inside the housing to cause friction with the support rod when the friction member in the compartment is displaced, and a cap penetrated in the longitudinal direction by the support rod and coupled with the housing to cover the compartment, wherein the support rod penetrates the cap along the longitudinal direction and wherein the housing includes one or more first holes configured to discharge, to the outside, condensate generated in an inner space defined by the coupling between the cap and the housing.

Abstract: The present specification relates to a clothes treatment apparatus and a control method therefor, the apparatus comprising, in order to improve an air flow mechanism for circulating air to a drum, the drum for accommodating objects to be treated, an air circulation path connected to the drum, a circulation fan, which is provided on the downstream side of a heat exchanger inside the air circulation path and generates suction force so as to suction the air of the air circulation path and supply same to the drum, a water collection part formed at the lower side of the drum so as to collect condensate water, and a trap having a bottom surface that is lower than a peripheral area in the water collection part so as to allow the condensate water to gather therein.

Abstract: A substrate cleaning apparatus includes: a support part configured to support a substrate by bring into contact with a rear surface of the substrate; an annular member disposed to surround a periphery of the substrate supported on the support part and including an inclined surface that is inclined with respect to a horizontal plane in a diametrical direction of the annular member; a rotation part configured to rotate the support part and the annular member; a first supply part configured to supply a cleaning liquid toward the rear surface of the substrate supported on the support part; and a second supply part configured to supply the cleaning liquid toward the inclined surface.

Abstract: A clothes treatment apparatus includes a cabinet that defines a treatment chamber, equipment configured to release at least one of hot air, steam, or cooled air into the treatment chamber, and a door that opens and closes the treatment chamber. A wrinkle removal module is pivotally mounted on a backside of the door. The wrinkle removal module applies a tension force to a first article of clothing in a first configuration and a compression force to a second article of clothing in a second configuration. The wrinkle removal module includes a base plate supported in a fixed position on the door, and a bi-fold panel assembly pivotally supported on the door. Panels of the bi-fold panel assembly include clips for clamping on portions of the first article of clothing to apply the tension force to the first article of clothing when the panels are pivoted relative to each other.

Abstract: A spray device includes a spray assembly. The spray assembly is configured to spray cleaning liquid towards a to-be-cleaned surface of a to-be-processed workpiece. The spray assembly includes a spray head and multiple liquid inlet pipelines. The spray assembly is configured to spray cleaning liquids with different concentrations, temperatures, and/or flow rates corresponding to different positions in a radial direction of the to-be-cleaned surface to cause a cleaning rate of the cleaning liquids at the different positions in the radial direction of the to-be-cleaned surface to be consistent.

Abstract: An apparatus for treating a substrate includes a process chamber having a treatment space for treating the substrate; a fluid supply unit for supplying fluid to the treatment space, wherein the fluid supply unit includes: a supply pipe connected to the treatment space to supply the fluid to the treatment space; a pump installed in the supply pipe to provide flow pressure to the fluid; a vent line installed between the pump and the process chamber to discharge pressure in the fluid to an outside; a relief valve installed in the vent line to open and close the vent line; and a reservoir installed between the pump and a branch point wherein the vent line branches from the supply pipe, wherein the reservoir has a cross-sectional area larger than a cross-sectional area of a portion of the supply pipe located between the pump and the branch point.

Abstract: A processing liquid ejection nozzle ejects a processing liquid used for a substrate processing. The processing liquid ejection nozzle includes a nozzle main body and an angle changing mechanism. The nozzle main body includes a first main body formed with a first flow path therein which communicates with a processing liquid supply path, and a second main body bent from the first main body and formed with a second flow path therein which communicates with the first flow path. The angle changing mechanism changes an angle of the nozzle main body in a horizontal direction with respect to a fixing member to which the nozzle main body is fixed.

Abstract: A washing machine and a method for controlling the same are provided. The washing machine includes a first rotary tub, a first driver configured to rotate the first rotary tub, a second rotary tub, a second driver configured to rotate the second rotary tub, and at least one processor configured to control the first driver and the second driver in a manner that the first rotary tub and the second rotary tub rotate. If a rotation speed of the first rotary tub is equal to or higher than a first reference speed, the at least one processor controls the second driver such that a rotation speed of the second rotary tub increases to a target speed and then decreases.

Abstract: A system for removing flux from openings formed in a substrate that has openings (e.g., sized 20 microns or less) formed therein includes a spay nozzle device that has a spray nozzle arm that is formed at an angle of about 45 degrees or less for discharging fluid towards the openings in the substrate for flux removal. The angle is between about 30 degrees and 45 degrees.

Abstract: The present disclosure provides a device (300) for degumming and inserting silicon wafers and method for processing silicon wafers. The device (300) for degumming and inserting silicon wafers includes a material frame (1), a grabbing mechanism (2), a degumming mechanism (3), an unlocking mechanism (8) and an inserting mechanism (4). The material frame (1) is configured for placing and clamping a plurality of silicon wafers (100) bonded with a support (200), the grabbing mechanism (2) is configured for grabbing and transferring the material frame (1) or the support (200), the degumming mechanism (3) is configured for degumming the plurality of silicon wafers (100) from the support (200), the unlocking mechanism (8) is configured for releasing clamping and fixing of the material frame (1) on the plurality of silicon wafers (100), and the inserting mechanism (4) is configured for splitting the degummed plurality of silicon wafers (100).

Abstract: A system and an apparatus for positioning a plurality of flexible cleaning lances through tubes penetrating a tube sheet of a heat exchanger tube sheet, includes a smart lance tractor drive, a controller, and a tumble box connected to the controller operable to generate and/or distribute electrical power to the AC induction sensor from an air pressure source, supply electrical power to the controller and distribute pneumatic power to pneumatic motors for positioning the tractor drive on the positioner frame. The smart tractor drive includes sensors for detection of mismatch between expected and actual lance positions, sense lance insertion distance and lance removal and provide automated drive reversal operation to remove blockages within tubes being cleaned.

Abstract: Disclosed is a multifunctional storage system including a machine chamber and a compartment, in which clothes are received, the multifunctional storage system including: a heat pump unit located in the machine chamber and including an evaporator, a condenser, a compressor, and a pressure controller; a moisture supply unit coupled to the heat pump unit and including a humidification filter; and a fan unit configured to circulate air in the machine chamber from the evaporator toward the condenser, wherein the moisture supply unit is coupled to a front end of the evaporator with reference to a circulation direction of the air, and wherein moisture is supplied to the humidification filter according to a preset condition, and loads of the evaporator and the condenser are increased as the moisture is supplied to the air when the air passes through the humidification filter.

Abstract: A laundry treating appliance includes a cabinet defining an interior and having an access opening to the interior, a treating chamber located within the interior and accessible through the access opening, a dispenser having a drawer with at least one chemistry container and a faucet, and a water supply fluidly coupled to the faucet.

Abstract: A laundry treatment apparatus includes a tub body for receiving water, a tub cover that covers an upper surface of the tub body and that defines an introduction aperture, a drum located inside the tub body for receiving laundry, a door for opening and closing the introduction aperture, a hinge that rotatably couples the door to the tub cover, a fixing unit that releasably couples a portion of the door to the tub cover, and a sealing unit on the door or the introduction aperture that is configured to seal the introduction aperture based on the introduction aperture being closed by the door. A portion of the sealing unit located in a direction in which the fixing unit is provided has a different diameter from a diameter of a portion of the sealing unit that is located in a direction in which the hinge is provided.

Abstract: An exhaust system includes an exhaust line configured to receive an exhaust mixture. The exhaust system further includes an oscillating assembly connected to the exhaust line. The exhaust system further includes a feedback path extending from an external gas source to the oscillating assembly, wherein the feedback path is separate from the exhaust line.

Abstract: The present disclosure relates to a method and apparatus for cleaning a substrate. The method includes rotating a substrate disposed on a substrate support and spraying a front side of the substrate using steam through a front side nozzle assembly. A back side of the substrate is sprayed using steam through a back side dispenser assembly. A heated chemical is dispensed over the front side of the substrate.

Abstract: A washing machine includes: a tub; a drum; an induction heater disposed in a position spaced apart from the drum and configured to heat the drum; an input power source; a relay configured to interrupt a current applied to the coil of the induction heater from the input power source; a first processor configured to control the relay; and a safety device connected to a circuit connecting the first processor and the relay. The safety device includes: a first thermostat configured to operate according to a temperature of a first air between the drum and the tub, and open the circuit when the temperature of the first air is a first safety control temperature; and a thermal fuse configured to operate according to a temperature of a second air outside the tub, and open the circuit when the temperature of the second air is a second safety control temperature.

Abstract: A laundry treating appliance with a first clothes mover and a removable basket assembly coupled to the first clothes mover. The removable basket assembly has a second wash basket and a second clothes mover. A first blocker is positioned between the second wash basket and the second clothes mover for stabilizing the second clothes mover relative to the second wash basket. A second blocker is positioned between the first clothes mover and the second wash basket for stabilizing the removable basket assembly relative to the first clothes mover.

Abstract: According to one embodiment, a semiconductor manufacturing device includes a chemical solution preparation tank configured to prepare a solution; a chamber configured to discharge the chemical solution prepared at the chemical solution preparation tank to a substrate; a pressure sensor configured to measure a pressure inside the chemical solution preparation tank; and a variable opening valve arranged between the chemical solution preparation tank and an exhaust pipe.

Abstract: A drying module 300 according to the present disclosure includes a drying tank 320 having a wall 322, a liquid supply port 334 for supplying liquid to an inner surface of the wall 322 and an outlet 336, a plurality of nozzles 340 for spraying a gas to a substrate holder 200, a liquid supply system 312 which supplies the liquid from the liquid supply port 334 to the inside of the drying tank 320, a gas supply system 310 which supplies the gas to the plurality of nozzles 340, and a control module 380. The control module 380 controls the liquid supply system 312 and the gas supply system 310 such that the plurality of nozzles 340 sprays the gas to the substrate holder 200 or a substrate W while the liquid supply port 334 supplies the liquid to the inner surface of the wall 322.