Patents Examined by Bijan Ahvazi
  • Patent number: 9623398
    Abstract: Provided herein are synthetic porous electron-rich covalent organonitridic frameworks (PECONFs). The PECONFs are useful as an adsorbent class of materials. In the PECONFs, inorganic nitridic building units are interconnected via electron-rich aromatic units to form porous covalent frameworks. The frameworks include tunable porous, electron-rich organonitridic frameworks, which are determined based upon synthetic methods as exemplified herein.
    Type: Grant
    Filed: April 11, 2011
    Date of Patent: April 18, 2017
    Assignee: Lehigh University
    Inventors: Kai Landskron, Mohanty Paritosh
  • Patent number: 9625629
    Abstract: A process for producing an optically anisotropic film having a high ?n and superior optical performance is provided. The process includes the following steps (A) and (B) carried out in order: (A) a step of applying a composition for forming an optically anisotropic film to a substrate, the composition containing a photopolymerization initiator, a solvent and a polymerizable liquid crystal compound having a maximum absorption wavelength in a range of 250 nm to 370 nm, and (B) a step of applying light with wavelengths in the range of 200 nm to 500 nm that has an allowable variation range of less than 250 nm in wavelength.
    Type: Grant
    Filed: December 4, 2014
    Date of Patent: April 18, 2017
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Tadahiro Kobayashi
  • Patent number: 9620721
    Abstract: An OLED device comprises a cathode, an anode, and has therebetween a light-emitting layer wherein the light-emitting layer comprises (a) a 2-arylanthracene compound and (b) a light-emitting second anthracene compound having amino substitution at a minimum of two positions, wherein at least one amine is substituted at the 2 position of the second anthracene compound.
    Type: Grant
    Filed: February 7, 2014
    Date of Patent: April 11, 2017
    Assignee: Global OLED Technology LLC
    Inventors: Kevin P. Klubek, Liang-Sheng Liao, Viktor V. Jarikov, Denis Y. Kondakov, William J. Begley, Michele L. Ricks
  • Patent number: 9617389
    Abstract: An stable ethylsilicate polymer having a dynamic viscosity of 10 centipoises (cps) to 1,000 cps at 25° C. and 50 wt % to 60 wt % silica (SiO2). The stable ethylsilicate polymer includes not greater than 1 wt % of TEOS monomer. The process of forming the ethylsilicate polymer includes a two step addition of catalysts. A hydrolysis catalyst is added initially, for example hydrochloric acid, and a second catalyst is added subsequently, such as phosphonitrilic chloride trimer. The ethylsilicate polymer is used to form MQ resins.
    Type: Grant
    Filed: January 3, 2011
    Date of Patent: April 11, 2017
    Assignee: Silbond Corporation
    Inventors: Walter L. Magee, Adam W. Emerson, Wallace G. Joslyn, Richard S. Odneal
  • Patent number: 9616712
    Abstract: Provided are a process for efficiently producing a rubber wet master batch in which a dispersibility of carbon black in the rubber is improved, in which a reinforcing property and an abrasion resistance of the rubber can be enhanced by using carbon black having a high surface activity, in which a yield of the carbon black in the wet master batch obtained is not reduced and in which a handling property of the carbon black is good as compared with master batches prepared by using a granulated and dried substance of carbon black prepared by a conventional wet method and non-granulated carbon black, a carbon black-containing rubber wet master batch obtained by the above process and a rubber composition and a tire prepared by using the master batch.
    Type: Grant
    Filed: March 16, 2010
    Date of Patent: April 11, 2017
    Assignee: BRIDGESTONE CORPORATION
    Inventors: Atsushi Nakayama, Masaaki Izuchi, Fumiteru Nishiura, Takeshi Kasai, Kenji Hara, Takashi Yagi
  • Patent number: 9605101
    Abstract: Provided is a pigment multimer whereby a pattern can be appropriately formed during formation of a pattern. Further, provided are a coloring composition using the pigment multimer; and a cured film, a color filter, a method for manufacturing a color filter, a solid-state imaging element, and an image display device, each of which uses the coloring composition. The pigment multimer (A) has a non-nucleophilic counter anion.
    Type: Grant
    Filed: December 22, 2015
    Date of Patent: March 28, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Yuushi Kaneko, Tetsuya Watanabe, Suguru Samejima, Junichi Ito, Naotsugu Muro, Yoshinori Taguchi, Kazuya Oota
  • Patent number: 9601647
    Abstract: The present invention includes upconversion materials such as lanthanide-sensitized oxides that are useful for converting low-energy photons into high-energy photons. Because silicon-based solar cells have an intrinsic optical band-gap of 1.1 eV, low-energy photons having a wavelength longer than 1100 nm, e.g., infrared photons, cannot be absorbed by the solar cell and used for photovoltaic energy conversion. Only those photons that have an energy equal to or greater than the solar cell's band gap, e.g., visible photons, can be absorbed and used for photovoltaic energy conversion. The oxides described herein transform photons having an energy less than the energy of a solar cell's band gap into photons having an energy equal to or greater than the energy of the band gap. When these oxides are incorporated into a solar cell, they provide more photons for photovoltaic energy conversion than otherwise would be available in their absence.
    Type: Grant
    Filed: May 15, 2014
    Date of Patent: March 21, 2017
    Assignee: The Chinese University of Hong Kong
    Inventors: Jianfang Wang, Junxin Wang, Tian Ming
  • Patent number: 9588257
    Abstract: A photochromic curable composition comprising, as radically polymerizable component (A), a silsesquioxane component (A1) having a radically polymerizable group and a bifunctional radically polymerizable monomer (A2) represented by the following general formula (1), wherein a is a number of 0 to 30, and b is a number of 0 to 30 on condition that an average value of a+b is 2 to 30, R1, R2, R3 and R4 are each a hydrogen atom or a methyl group, and A is a divalent organic group on condition that the number of carbon atoms is 1 to 20, and a photochromic compound (B).
    Type: Grant
    Filed: July 10, 2012
    Date of Patent: March 7, 2017
    Assignee: Tokuyama Corporation
    Inventors: Toshiaki Otani, Junji Takenaka, Junji Momoda, Shinobu Izumi
  • Patent number: 9581729
    Abstract: A compound represented by Chemical Formula 1, wherein in Chemical Formula 1, each substituent is the same as defined in the detailed description, a photosensitive resin composition including the same, and a color filter manufactured using the photosensitive resin composition are provided.
    Type: Grant
    Filed: February 25, 2016
    Date of Patent: February 28, 2017
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Hye-Won Seo, Eui-Soo Jeong, Kyu-Young Kim, Chae-Won Pak, Myoung-Youp Shin, Young Lee
  • Patent number: 9580533
    Abstract: The present invention relates to a branched modifier and a composition comprising more than 25 wt % (based on the weight of the composition) of one or more linear ethylene polymers having a g?vis of 0.97 or more and an Mw of 20,000 g/mol or more and at least 0.1 wt % of a branched modifier where the modifier has a g?vis of less than 0.97, wherein the ethylene polymer has a g?vis of at least 0.01 units higher than the g?vis of the branched modifier.
    Type: Grant
    Filed: September 20, 2012
    Date of Patent: February 28, 2017
    Assignee: ExxonMobil Chemical Patents Inc.
    Inventors: Peijun Jiang, Kevin R. Squire, Jianya Cheng, Pradeep P. Shirodkar, Johannes M. Soulages, Keith E. Jolibois, Ronald R. Thackston, Andrew G. Narvaez, Jr.
  • Patent number: 9580519
    Abstract: The purpose of the present invention is to provide a method for producing a water absorbent resin in which a water absorbent resin having excellent properties can be obtained effectively.
    Type: Grant
    Filed: April 20, 2012
    Date of Patent: February 28, 2017
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Kozo Nogi, Syuji Kanzaki, Kunihiko Ishizaki, Shinichi Fujino, Satoshi Matsumoto
  • Patent number: 9577109
    Abstract: There are provided a transparent conductive film and a method for preparing the same. The transparent conductive film of the present application comprises a compound having a crystalline structure and represented by Chemical Formula 1 and thus can be applied as a technology substituting for conventional ITO conductive films.
    Type: Grant
    Filed: September 17, 2013
    Date of Patent: February 21, 2017
    Assignee: LG CHEM, LTD.
    Inventors: Dongmyung Shin, Dong-Ryul Kim, Chanyeup Chung
  • Patent number: 9575213
    Abstract: The problem of the present invention is to overcome drawbacks of conventional optical filters such as near-infrared cut filters and to provide an optical filter which generates little scatted light even during light absorption and has excellent transmittance property. The optical filter of the present invention is characterized by containing a squarylium-based compound and a compound which absorbs or quenches fluorescence of the squarylium-based compound. The optical filter of the present invention preferably contains a near-infrared absorbing dye containing a squarylium compound (A) and at least one compound (B) selected from the group consisting of a phthalocyanine-based compound (B-1) and a cyanine-based compound (B-2).
    Type: Grant
    Filed: October 12, 2012
    Date of Patent: February 21, 2017
    Assignee: JSR CORPORATION
    Inventors: Katsuya Nagaya, Hiroyuki Kishida, Takashi Tsubouchi, Mitsuru Nakajima, Ran Mitsuboshi, Yukie Tanaka
  • Patent number: 9568763
    Abstract: The invention relates to a photosensitive resin composition that has the advantages of high developability, good hardness, and good sputtered resistance. The invention also provides a method for manufacturing a color filter, color filter and a liquid crystal display device. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound containing an ethylenically unsaturated group (B), a photoinitiator (C), an organic solvent (D), a pigment (E), and a compound (F).
    Type: Grant
    Filed: July 29, 2014
    Date of Patent: February 14, 2017
    Assignee: CHI MEI CORPORATION
    Inventors: Duan-Chih Wang, Jung-Pin Hsu
  • Patent number: 9567470
    Abstract: This disclosure is directed to functionalized carbon black material that may be particularly usable for as a filler material to a number of beneficial uses, particularly in image forming devices. The disclosed functionalized carbon black material compositions include hydrophobic carbon black particles surface passivated via the use of an NB-block copolymer where the NB block contains a pentafluorostyrene-maleimide alternating polymer and the B block contains pure pentafluorostyrene. The A/B portion allows for the polymer to adsorb onto the carbon black while the b-block acts as the stabilizer in fluorinated systems. Fine dispersions result from the addition of poly (pentafluorostyrene/Maleimide-b-pentafluorostyrene) or P(PFS/MI-b-PFS) passivated carbon black to fluorinated polymers, enhancing the physical and mechanical properties.
    Type: Grant
    Filed: October 24, 2015
    Date of Patent: February 14, 2017
    Assignee: Xerox Corporation
    Inventors: Barkev Keoshkerian, Carolyn Moorlag
  • Patent number: 9566750
    Abstract: A compound lens produced by heating and pressing a semi-cured product of a curable resin composition containing a (meth)acrylate monomer, a non-conjugated vinylidene group-containing compound, and a photo-radical initiator and a transparent substrate arranged so as to be in contact with the semi-cured product in a state in which a molding die is filled with the semi-cured product and the transparent substrate, and obtaining a cured product by allowing the semi-cured product to be thermally polymerized, exhibits an excellent transfer property, a small number of bubble mixtures, and excellent heat resistance and crack resistance.
    Type: Grant
    Filed: September 26, 2014
    Date of Patent: February 14, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Takayasu Nagai, Naoyuki Morooka, Tatsuhiko Obayashi
  • Patent number: 9568823
    Abstract: The present invention relates to a photosensitive resin composition for a color filter and uses thereof. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C), a pigment (D) and an organic solvent (E). The photosensitive resin composition according to the present invention can improve linearity of pattern with high finesse and developing-resistance of the color filter.
    Type: Grant
    Filed: September 9, 2015
    Date of Patent: February 14, 2017
    Assignee: CHI MEI CORPORATION
    Inventors: Yu-Ju Wu, Bar-Yuan Hsieh, Jung-Pin Hsu
  • Patent number: 9562144
    Abstract: Provided are a xylylenediamine composition containing xylylenediamine and bis(methylbenzyl)amine, a content of the bis(methylbenzyl)amine being 0.0005 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine; and a method for producing a polyamide resin including the steps of introducing a diamine containing xylylenediamine, a dicarboxylic acid, and bis(methylbenzyl)amine in an amount of 0.0005 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine into a reaction system and performing a polycondensation reaction.
    Type: Grant
    Filed: April 9, 2014
    Date of Patent: February 7, 2017
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Tatsuya Tochihara, Katsumi Shinohara, Takashi Nakamura, Hajime Yamada, Jun Mitadera
  • Patent number: 9557443
    Abstract: A photosensitive resin composition, a black matrix, a color filter, and a liquid crystal display device including the resin composition are provided. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photo initiator (C), a solvent (D), and a black pigment (E). The compound (B) containing an ethylenically unsaturated group includes a compound (B-1) represented by the following formula (1). In formula (1), a represents an integer of 1 to 20; each of Ra and Rb independently represents an acryloyloxy phenyl group, an acryloyloxy alkyl group having 4 to 20 carbons, a methacryloyloxy phenyl group, a methacryloyloxy alkyl group having 5 to 20 carbons, an alkenyl group having 3 to 20 carbons, or an alkenyl aryl group having 8 to 30 carbons; when a is 2 or more, a plurality of Ra and Rb are the same or different.
    Type: Grant
    Filed: June 12, 2014
    Date of Patent: January 31, 2017
    Assignee: Chi Mei Corporation
    Inventor: Ching-Yuan Tseng
  • Patent number: 9557444
    Abstract: An alkali-soluble resin, a photosensitive resin composition, a color filter, and a method for manufacturing the same, and a liquid crystal display apparatus are provided. The photosensitive resin composition includes a specific alkali-soluble resin, a compound containing ethylenic unsaturated group, a photoinitiator, and an organic solvent. The photosensitive resin composition is excellent in developability and high precision pattern linearity and contour angle since the photosensitive resin composition contains a specific alkali-soluble resin.
    Type: Grant
    Filed: August 21, 2014
    Date of Patent: January 31, 2017
    Assignee: Chi Mei Corporation
    Inventor: Bar-Yuan Hsieh