Abstract: An applicator for the deposition of sealant onto a surface of a workpiece is disclosed including at least one inlet for depositing sealant on to a surface or a nozzle-receiving space for receiving a nozzle comprising at least one inlet for depositing sealant on to a surface; at least one sealant-contacting surface for contacting sealant deposited onto the surface through the inlet as the applicator is moved across said surface, thereby forming a film of sealant on the surface; at least one spacer for contacting a surface onto which sealant is to be deposited and for maintaining the sealant-contacting surface in spaced relationship with the surface; the applicator being configured to facilitate the formation of films of different widths.

Abstract: A coating device includes a backup roll configured to transport a workpiece; a coating die configured to discharge a coating liquid onto the workpiece; a drive section capable configured to drive the backup roll; and a heat dissipation section configured to dissipate heat generated in the drive section.

Abstract: A substrate handling system comprising a substrate holder comprising a main body with a main body surface, and a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface, clamping means, the clamping means being configured to clamp and/or unclamp the substrate onto the substrate holder, and conveying means, the conveying means being configured to load and/or unload the substrate onto the substrate holder, wherein the conveying means is further configured to physically contact the substrate during the clamping and/or unclamping to the substrate holder. It is also described methods for clamping and unclamping a substrate, a computer program, a computer-readable medium and a lithography apparatus.

Abstract: A robot for coating a vehicle body includes a coating head, a reservoir for storing coating material, a supply device capable of controlling the pressure of coating material flowing through a circulation path provided between the coating head and the reservoir, and an arm having a coating head and a supply device. The arm is a multi-axis arm having multiple arm members and a movable shaft connecting each arm member to each other, and it has a posture control means that controls the posture of the multiple arm members during coating of the vehicle body by the coating head to maintain the relative position of the coating head and the supply device at a constant level or to suppress fluctuations in the relative position within a predetermined allowable range.

Abstract: A substrate processing apparatus may include a chamber having a working space, maintaining a vacuum state, and including an upper wall positioned on the working space, a nozzle assembly positioned in the working space, and including nozzles, and a lifting module including a frame positioned outside of the chamber, a lifting part that lifts the frame, and at least one shaft passing through the upper wall, connected to each of the frame and the nozzle assembly, and extending in a direction of gravity.

Abstract: A device for manufacturing a semiconductor device is provided. The device for manufacturing a semiconductor device includes a tube extending in a first direction, and defining a reaction space therein and configured to accommodate a boat that is configured to receive a plurality of substrates therein, and first and second nozzles each extending in the first direction inside the tube, and being apart from each other on a plane that is perpendicular to the first direction and parallel to upper surfaces of the substrates, wherein the first and second nozzles include a plurality of first injection ports and a plurality of first second injection ports that are configured inject different gases toward a center of the reaction space, respectively, and a plurality of second injection ports are placed in a region between a corresponding pair of adjacent ones of the plurality of first injection ports along the first direction.

Abstract: In some examples, a flat Bottom Shadow Ring (fBSR) is provided for processing a substrate in a processing chamber. An example fBSR comprises an overhang for covering an edge of the substrate in the processing chamber. The overhang includes a fiat zone that extends radially outward over the outer edge of the substrate.

Abstract: A device and method for coating and curing a protective layer on large format graphics comprises a roll-to-roll machine having a coat stage and a cure stage. A roll of printed web material turns about a load reel, passing through the coat stage and cure stage, and is wound around a finish reel. The load and finish reels may be driven by servo-motors. The coat stage comprises a coat pan which is partially filled with coating liquid and a Mayer bar for removing excess coating liquid. The cure stage comprises a light source and a plate. One or more devices, such as idler rollers, dancer rollers, stationary rollers, or load cells, are placed between the load and finish reels to control the path, tension, and speed of the web material.

Abstract: A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from at least one metal inside a Vacuum deposition facility including a vacuum chamber, a coated substrate coated with at least one metal on both sides of the substrate and a coated metallic substrate.

Abstract: An apparatus for preventing blockage of a floating stage includes a moving member moving between a floating stage for lifting a substrate and a nozzle disposed above the floating stage, and a cover installed on the moving member and moving between the floating stage and the nozzle by the moving member to cover the floating stage.

Abstract: A processing chamber is disclosed and includes a chamber body. The chamber body has a first side, a second side opposite the first side, a window assembly, and a base. The first and second side, the window assembly and the base define a thermal processing region. A flow assembly is disposed adjacent the first side and configured to introduce a processing gas into the thermal processing region. An exhaust slit assembly is disposed adjacent the second side. The exhaust slit assembly has an opening exposed to the thermal processing region. The opening having a center and an outer edge of the opening. The center of the opening and edge of the opening vertically defined between the window assembly and the base. Wherein an outer height at the edge of the opening is at least 30% larger in a vertical direction than a center height at the center of the opening.

Abstract: A pretreatment device includes a platen, guide that guide a conveyance of the platen from a set position at which a recorded medium is set on an upper surface, a spray that sprays a pretreatment agent onto the recording medium set on an upper surface of the platen, an input portion into which is input at least one of an application range of the pretreatment agent onto the recording medium or an application amount of the pretreatment agent, a processor; and a memory storing computer-readable instructions. The computer-readable instructions also includes setting, on the basis of at least one of the application range or the application amount input into the input portion, at least one of a conveyance speed of the platen or a spray duty ratio that is a ratio of a spray time during a spray period of the pretreatment agent.

Abstract: A liquid discharge apparatus to discharge liquid to apply the liquid to an object includes a head, a mover, a rotator, and processing circuitry. The head has a nozzle surface in which a plurality of nozzle rows each including a plurality of nozzles to discharge the liquid are arranged. The mover relatively moves the head and the object in each of a first direction and a second direction orthogonal to each other along the nozzle surface. The rotator rotates the head along the nozzle surface. The processing circuitry controls the relative movement to correct unevenness of a nozzle interval between the plurality of nozzles along the second direction caused by an inclination between the first direction and a third direction when the head is rotated. The third direction is a direction in which the plurality of nozzles are arranged in each of the plurality of nozzle rows.

Abstract: A microdroplet-based three-dimensional (3D) laser printing system, which includes a laser beam subsystem, a transparent donor substrate, voxel arrays, and the receiver substrate. By irradiating the voxel array with a pulsed laser beam deriving from the laser beam subsystem through the transparent donor substrate, the voxel array is melted and driven away from the transparent donor substrate to generate the ejecting microdroplet array and then deposited onto the receiver substrate. The 3D microstructure is printed in parallel by sequentially irradiating the voxel array and controlling the depositing locations of microdroplet arrays onto the receiver substrate. The system can avoid the satellite microdroplets generating, improve the printing efficiency and resolution, and obtain a wide process window.

Abstract: A dispensing device for decorating ceramic tiles with granular or powdered materials that includes a main body and a dispensing channel arranged in the main body and provided with a longitudinal axis. The channel has an inlet and an outlet opening along with a suction means, provided to retain a part of granular or powdered material inside the dispensing channel to form an accumulation that obstructs the dispensing channel and prevents the flow of material. A suction opening is arranged in communication with the dispensing channel and with the suction means and has a filter, interposed between the suction opening and the dispensing channel. A ventilation portion, associated with the main body and connected to the inlet opening of the dispensing device has an outer surface that communicates with the environment as a determined pressure.

Abstract: A degassing chamber for degassing a material located on a workpiece, comprises a vacuum source and a vacuum reservoir in fluid communication with the vacuum source, a secondary chamber, a port valve which is movable between an open position to allow passage of a workpiece therethrough between the exterior of the degassing chamber and the secondary chamber and a closed position in which the port valve is fluidly sealed, and a reservoir valve which is movable between an open position to provide fluid communication between the secondary chamber and the vacuum reservoir and a closed position in which the reservoir valve is fluidly sealed. The degassing chamber may be provided subsequent to a printing machine in a production line, and has particular application for degassing silicone material when producing fuel cells.

Abstract: A substrate treating apparatus includes: a chill plate; a first support part installed on the chill plate and including a first tip having a first height; and a second support part installed on the chill plate and having a height changed according to a temperature, wherein at a first temperature, a maximum height of the second support part becomes equal to or lower than a height of the first tip, such that the substrate is supported by the first tip of the first support part, and at a second temperature lower than the first temperature, the second support part becomes higher than the first tip, such that the substrate is supported by the second support part.

Abstract: The glue-applicating apparatus for hair tracks is configured for use with a hair track. The hair track is an example of a hair extension. The glue-applicating apparatus for hair tracks applies an adhesive to the hair extension. The adhesive adheres the hair extension to the skin of a client. The glue-applicating apparatus for hair tracks comprises a housing structure, a fluidic structure, and an application structure. The housing structure contains the fluidic structure and the application structure. The application structure forms a fluidic connection with the fluidic structure. The fluidic connection transports the adhesive to the application structure. The application structure applies the adhesive to the hair extension.

Abstract: In a substrate holder, a gas supply part sends out a gas to the space between the lower surface of a substrate and a base surface of a base part to form a radially outward airflow. A division plate is arranged radially outward of the outer peripheral edge of the substrate on the base surface of the base part to surround the substrate. The inner peripheral edge of the division plate and the outer peripheral edge of the substrate face each other in the radial direction with a space in between. The upper surface of the division plate is located below or at the same position in the up-down direction as the upper surface of the substrate. An annular passage is provided between the lower surface of the division plate and the base surface of the base part.

Abstract: Apparatuses for controlling fluid flow are important components for delivering process fluids for semiconductor fabrication. These apparatuses for controlling fluid flow frequently rely on large numbers of fitting assemblies. Fitting assemblies often require tight tolerances, requiring expensive manufacturing processes. Fitting assemblies formed as multiple components can reduce manufacturing costs. Fitting assemblies may be formed of a housing having an insert receiving cavity and an insert having a port, a seal cavity, and a tube stub. A flow path extends from the port to the tube stub to enable flow of fluid therebetween.