Patents Examined by Binu Thomas
  • Patent number: 11981299
    Abstract: A tire shine application system includes a computer having at least one sensor interfaced thereto that detects and measures sizes of a tire of a vehicle as the vehicle enters a car wash. A tire shine applicator is interfaced to a three-directional movement device that is controlled by the computer. When the tire approaches the tire shine applicator, the computer controls the three-directional movement device to position the tire shine applicator to an outwardly facing wall of the tire and controls the three-directional movement device so that the tire shine applicator traverses the outwardly facing wall of the tire while tracking the tire as the tire shine applicator deposits tire shine liquid on the outwardly facing wall of the tire.
    Type: Grant
    Filed: September 17, 2021
    Date of Patent: May 14, 2024
    Inventor: Edward O'Hanrahan, Jr.
  • Patent number: 11975350
    Abstract: An adhesive dispensing system for applying liquid adhesive to a substrate using different nozzles with the same manifold is disclosed. The adhesive dispensing system includes a manifold having a body, a first clamp configured to engage the body of the manifold, a second clamp configured to engage the body of the manifold, and a nozzle. The first and second clamps secure the nozzle to the body of the manifold. The body of the manifold has a first contact surface that engages the first clamp and a second contact surface that engages the second clamp and the nozzle, where the second contact surface is angularly offset from the first contact surface.
    Type: Grant
    Filed: March 14, 2023
    Date of Patent: May 7, 2024
    Assignee: Nordson Corporation
    Inventor: Joel E. Saine
  • Patent number: 11978646
    Abstract: Embodiments of the disclosure generally relate to a semiconductor processing chamber. In one embodiment, semiconductor processing chamber is disclosed and includes a chamber body having a bottom and a sidewall defining an interior volume, the sidewall having a substrate transfer port formed therein, and one or more absorber bodies positioned in the interior volume in a position opposite of the substrate transfer port.
    Type: Grant
    Filed: May 17, 2018
    Date of Patent: May 7, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Dongming Iu, Kartik Shah, Norman L. Tam, Matthew Spuller, Jau-Jiun Chen, Kong Lung Samuel Chan, Elizabeth Neville, Preetham Rao, Abhilash J. Mayur, Gia Pham
  • Patent number: 11972957
    Abstract: A gas flow accelerator may include a body portion, and a tapered body portion including a first end integrally formed with the body portion. The gas flow accelerator may include an inlet port connected to the body portion and to receive a process gas to be removed from a semiconductor processing tool by a main pumping line. The semiconductor processing tool may include a chuck and a chuck vacuum line to apply a vacuum to the chuck to retain a semiconductor device. The tapered body portion may be configured to generate a rotational flow of the process gas to prevent buildup of processing byproduct on interior walls of the main pumping line. The gas flow accelerator may include an outlet port integrally formed with a second end of the tapered body portion. An end portion of the chuck vacuum line may be provided through the outlet port.
    Type: Grant
    Filed: July 31, 2020
    Date of Patent: April 30, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Sheng-chun Yang, Chih-Lung Cheng, Yi-Ming Lin, Po-Chih Huang, Yu-Hsiang Juan, Xuan-Yang Zheng
  • Patent number: 11965237
    Abstract: A system and a method for detecting abnormality of a thin-film deposition process are provided. In the method, a thin-film is deposited on a substrate in a thin-film deposition chamber by using a target, a dimension of a collimator mounted between the target and the substrate is scanned by using at least one sensor disposed in the thin-film deposition chamber to derive an erosion profile of the target, and abnormality of the thin-film deposition process is detected by analyzing the erosion profile with an analysis model trained with data of a plurality of erosion profiles derived under a plurality of deposition conditions.
    Type: Grant
    Filed: November 13, 2020
    Date of Patent: April 23, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wen-Hao Cheng, Hsuan-Chih Chu, Yen-Yu Chen
  • Patent number: 11944996
    Abstract: A system for coating of a donor material onto a laser radiation transparent substrate, the system including a donor material applicator, applying donor material to the laser radiation transparent substrate, a multi-pass precise donor material thickness determiner for providing a desired thickness of the donor material on the laser radiation transparent substrate and including a linearly displaceable blade support, a layer thickness uniformizing blade lockably pivotably mounted onto the linearly displaceable blade support about a pivot axis, the blade having a straight edge and a blade position maintainer operative for maintaining the straight edge at a desired separation distance from the laser radiation transparent substrate, the separation distance being uniform along the straight edge of the layer thickness uniformizing blade.
    Type: Grant
    Filed: January 6, 2020
    Date of Patent: April 2, 2024
    Assignee: Orbotech Ltd.
    Inventors: Tal Goichman, Ashkan Aghajani
  • Patent number: 11939656
    Abstract: A continuous coating line includes a snout assembly exposed to molten metal. The snout assembly includes a snout tip positioned about a steel strip that is immersible in the molten metal to provide a seal around the steel strip during entry into the molten metal. The snout tip includes a refractory material that is resistant to wear, abrasion, and corrosion when the snout tip is exposed to the molten metal.
    Type: Grant
    Filed: May 20, 2021
    Date of Patent: March 26, 2024
    Assignee: Cleveland-Cliffs Steel Properties Inc.
    Inventors: Daniel J. Cadotte, Russell Dejarnatt
  • Patent number: 11923216
    Abstract: An apparatus and method for treating a substrate are provided. The apparatus includes at least one first process chamber configured to supply a developer onto the substrate; at least one second process chamber configured to treat the substrate using a supercritical fluid; a transfer chamber configured to transfer the substrate from the at least one first process chamber to the at least one second process chamber, while the developer supplied in the at least one first process chamber remains on the substrate; and a temperature and humidity control system configured to manage temperature and humidity of the transfer chamber by supplying a first gas of constant temperature and humidity into the transfer chamber.
    Type: Grant
    Filed: August 22, 2022
    Date of Patent: March 5, 2024
    Assignees: SAMSUNG ELECTRONICS CO., LTD., SEMES CO., LTD.
    Inventors: Seung Min Shin, Sang Jin Park, Hae Won Choi, Jang Jin Lee, Ji Hwan Park, Kun Tack Lee, Koriakin Anton, Joon Ho Won, Jin Yeong Sung, Pil Kyun Heo
  • Patent number: 11923181
    Abstract: A substrate processing apparatus capable of minimizing the effect of a filling gas in a lower space on the processing of a substrate includes: a substrate supporting unit; at least one ring surrounding the substrate supporting unit; a processing unit on the substrate supporting unit; and an exhaust unit connected to a reaction space between the substrate supporting unit and the processing unit, wherein a first gas in the reaction space is transmitted to the exhaust unit through a first channel, a second gas in a lower space below the substrate supporting unit is transmitted to the exhaust unit through a second channel, and the first channel and the second channel are separated by the at least one ring.
    Type: Grant
    Filed: November 23, 2020
    Date of Patent: March 5, 2024
    Assignee: ASM IP Holding B.V.
    Inventors: HyungChul Moon, WonKi Jeong
  • Patent number: 11911790
    Abstract: A central tubular defines a central flow passage and spray nozzles along an outer circumference of the central tubular. A first brush pig supports a first end of the central tubular. A second brush pig supports a second end of the tubular. An inflatable balloon is at the second end of the tubular. The inflatable balloon is encircled by the second brush pig. The inflatable balloon is configured to cause a first pressure drop across the balloon when in an inflated state and cause a second pressure drop, less than the first pressure drop, across the balloon when in a deflated state. A flow control system is at the first end of the tubular and is configured to regulate fluid exchange with the tubular and fluid exchange with the inflatable balloon.
    Type: Grant
    Filed: February 25, 2022
    Date of Patent: February 27, 2024
    Assignee: Saudi Arabian Oil Company
    Inventor: Qais Mohammad Al Hennawi
  • Patent number: 11904336
    Abstract: An atomizer having an atomizer head configured to atomize a first fluid. The atomizer includes, in addition, a measurement module including at least one sensor configured to measure the values of at least one parameter of the atomizer, an electronic control module configured to receive the measured values, and a power supply configured to electrically supply the control module with a power supply voltage.
    Type: Grant
    Filed: March 7, 2021
    Date of Patent: February 20, 2024
    Assignee: EXEL INDUSTRIES
    Inventors: Camilien Beaudoin, Michel Colrat, Didier Faure, Guillaume Foubert, Philippe Provenaz
  • Patent number: 11910726
    Abstract: A vapor deposition reactor apparatus, systems and methods for deposition of thin films, particularly high-temperature superconducting (HTS) coated conductors, utilize multi-sided susceptors and susceptor pairs for increased production throughput. The reactors may also be configured in multi-stack arrangements of the susceptors within a single reactor chamber for additional throughput gains.
    Type: Grant
    Filed: February 25, 2022
    Date of Patent: February 20, 2024
    Assignee: MetOx International, Inc.
    Inventors: Shahab Khandan, Nagaraja Shashidhar, Mikhail Novozhilov
  • Patent number: 11904332
    Abstract: A flame coating machine for coating field joints of a pipeline has a flame spray system having two flame spray units configured for heating and/or coating with a thermoplastic polymer an annular junction portion and two annular end portions of an existing coating delimiting the annular junction portion; a control system having two temperature sensors configured for acquiring temperature values along the surface collectively defined by the annular junction portion and the annular end portions, and a control unit configured for actuating the flame spray unit in a polymer flame spraying mode or in a flame heating mode as a function of the detected temperature values and at least one threshold value.
    Type: Grant
    Filed: October 23, 2019
    Date of Patent: February 20, 2024
    Assignee: SAIPEM S.P.A.
    Inventors: Francesco Simone, Catalin Petrache
  • Patent number: 11898251
    Abstract: A continuous coating line includes a snout assembly exposed to molten metal. The snout assembly includes a snout tip positioned about a steel strip that is immersible in the molten metal to provide a seal around the steel strip during entry into the molten metal. The snout tip includes a refractory material that is resistant to wear, abrasion, and corrosion when the snout tip is exposed to the molten metal.
    Type: Grant
    Filed: September 8, 2021
    Date of Patent: February 13, 2024
    Assignee: Cleveland-Cliffs Steel Properties Inc.
    Inventors: Daniel J. Cadotte, Russell Dejarnatt
  • Patent number: 11878317
    Abstract: The disclosure concerns a coating device and a corresponding coating process for coating components, in particular motor vehicle body components, with a coating agent (e.g. paint), with a coating robot with a first printhead which is mounted on the coating robot. The disclosure provides that the first printhead is exchangeably mounted on the coating robot and can be exchanged for a second printhead during a color change. Another variant of the disclosure, on the other hand, provides for a second printhead to be mounted on the coating robot in addition to the first printhead, the two printheads each applying a specific coating agent in order to enable a color change without changing the printhead.
    Type: Grant
    Filed: October 13, 2022
    Date of Patent: January 23, 2024
    Assignee: Dürr Systems AG
    Inventors: Hans-Georg Fritz, Benjamin Wöhr, Marcus Kleiner, Moritz Bubek, Timo Beyl, Frank Herre, Steffen Sotzny
  • Patent number: 11872580
    Abstract: A method of controlling application of at least one material onto a substrate includes configuring a material applicator having an array plate with an applicator array. The applicator array has a plurality of micro-applicators with a first subset of micro-applicators and a second subset of micro-applicators. Each of the plurality of micro-applicators has a plurality of apertures through which fluid is ejected. The first subset of micro-applicators and the second subset of micro-applicators are individually addressable, and a liquid flows through the first subset of micro-applicators and a shaping gas, e.g., air, flows through the second subset of micro-applicators. The flow of shaping gas shapes the flow of the liquid from the first subset of micro-applicators to the substrate.
    Type: Grant
    Filed: July 12, 2022
    Date of Patent: January 16, 2024
    Assignee: Ford Motor Company
    Inventors: Christopher Michael Seubert, Mark Edward Nichols, Kevin Richard John Ellwood, Wanjiao Liu, Aaron M. Fiala
  • Patent number: 11865572
    Abstract: Embodiments relate to surface treating a substrate, spraying precursor onto the substrate using supercritical carrier fluid, and post-treating the substrate sprayed with the precursor to form a layer with nanometer thickness of material on the substrate. A spraying assembly for spraying the precursor includes one or more spraying modules and one or more radical injectors at one or more sides of the spraying module. A differential spread mechanism is provided between the spraying module and the radical injectors to inject spread gas that isolates the sprayed precursor and radicals generated by the radical injectors. As relative movement between the substrate and the spraying assembly is made, portions of the substrate is exposed to first radicals, sprayed with precursors either one of the spraying modules or both spraying modules using supercritical carrier fluid, and then exposed to second radicals again.
    Type: Grant
    Filed: March 4, 2021
    Date of Patent: January 9, 2024
    Assignee: Nova Engineering Films, Inc.
    Inventor: Sang In Lee
  • Patent number: 11859274
    Abstract: A deposition mask includes: a first surface and a second surface, in which a plurality of through-holes are formed; a pair of long side surfaces connected to the first and second surfaces, and defining a profile of the deposition mask in a longitudinal direction of the deposition mask; and a pair of short side surfaces connected to the first and second surfaces, and defining a profile of the deposition mask in a width direction of the deposition mask. The long side surface includes a first portion that is recessed inside and includes a first end portion positioned along the first surface, and a second end portion positioned along the second surface and positioned inside the first end portion. The through-hole includes a first recess formed on the first surface, and a second recess formed on the second surface and connected to the first recess through a hole connection portion.
    Type: Grant
    Filed: February 28, 2023
    Date of Patent: January 2, 2024
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Yasuhiro Uchida, Sachiyo Matsuura, Chikao Ikenaga
  • Patent number: 11860542
    Abstract: A liquid treatment apparatus includes: a substrate holder for holding a substrate; a discharge nozzle for discharging a treatment liquid onto the substrate; a liquid supply pipe for supplying the treatment liquid from a treatment liquid storage source to the discharge nozzle; a gas pipe that encompasses the liquid supply pipe and through which an inert gas for adjusting the temperature of the treatment liquid flows in a space between the gas pipe and the liquid supply pipe; a processing container in which the substrate holder, the discharge nozzle, the liquid supply pipe, and the gas pipe are provided; and an atmosphere gas supply part for supplying an atmosphere gas into the processing container. The gas pipe is provided so that an extension portion between an upstream end inside the processing container and an encompassing portion is folded back inside the processing container in a plan view.
    Type: Grant
    Filed: January 18, 2023
    Date of Patent: January 2, 2024
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Takashi Yamauchi, Daiki Shibata, Kohei Kawakami
  • Patent number: 11850616
    Abstract: A coating device for applying a coating agent to the surface of a workpiece. The coating device includes a frame with a workpiece receptacle, a coating agent source and a rotary unit which is rotatable in relation to the frame. The rotary unit has a pump and a plurality of spray units, with the pump on the suction side being connected to the coating agent source by a fluid-conducting rotary joint connection. The rotary unit has a pneumatic valve device, and the spray units have in each case one compressed air controlled valve for controlling the delivery of coating agent. The inlet side of the valve is connected to the compressed air source by a fluid-conducting rotary feedthrough, which simplifies the overall construction of the coating device by providing a pneumatic connection between the compressed air source and the rotary unit that is independent of the rotation angle.
    Type: Grant
    Filed: August 17, 2022
    Date of Patent: December 26, 2023
    Assignee: Robert Bürkle GmbH
    Inventors: Marcel Scheerer, Michael Hoffer