Abstract: A handheld fluid spraying system includes a pump assembly configured to provide a pressurized liquid and a handheld fluid sprayer. The handheld fluid sprayer comprises a fluid inlet configured to receive the pressurized liquid, a spray tip having an outlet through which the pressurized liquid exits the handheld fluid sprayer to be applied to a surface, a trigger configured to control flow of the liquid through the handheld fluid sprayer, and a sensor configured to detect the liquid and to generate sensor data indicative thereof, the sensor being selected from the group consisting of an infrared (IR) sensor, a thermal imager, and a UV sensor. The handheld fluid spraying system further comprises a controller configured to determine a characteristic of the liquid based on the sensor data and to generate a control output based on the determined characteristic.

Abstract: A method for printing a semiconductor material includes depositing a molten metal onto a substrate in an enclosed chamber to form a trace having a maximum height of 15 micrometers and/or a maximum width of 25 micrometers to 10 millimeters and/or a thin film having a maximum height of 15 micrometers. The method further includes reacting the molten metal with a gas phase species in the enclosed chamber to form the semiconductor material. The depositing the molten metal includes depositing a metal composition including the molten metal and an etchant or depositing the etchant separate from the molten metal in the enclosed chamber.

Abstract: An embodiment provides a deposition mask including an opening area including an opening; a first dummy opening area disposed at a first side of the opening area in a first direction and having a first dummy opening in the first dummy opening area; and a second dummy opening area disposed at a second side of the opening area in the first direction and having a second dummy opening in the second dummy opening area. A first side and a second side of the opening are asymmetrical with respect to a second direction intersecting the first direction, and the first dummy opening and the second dummy opening are symmetrical with the opening with respect to the second direction.

Abstract: The invention provides a deposition machine, which comprises a chamber, a first pipeline and a second pipeline, wherein one end of the first pipeline and one end of the second pipeline are connected to the chamber, and a part of the second pipeline passes through a sidewall of the first pipeline and extends into the interior of the first pipeline. The deposition machine has the advantages of reducing the risk of pipeline blockage.

Abstract: A glue applying machine includes a machine body, a glue applying device, and a control device. The glue applying device is mounted on the working platform of the machine body. The glue applying device includes a track, a movement unit, and a height limit member. The movement unit includes a glue applying member and a glue applying detection member. The glue applying detection member emits a laser beam which defines an effective detection section and a non-effective detection section. The height limit member defines a contact face. The control device controls the laser beam to detect the operating area of the workpiece on the working platform through the effective detection section and to start the glue applying member. Thus, the glue applying detection member exactly detects the operating area on the working platform, and the glue applying member applies the glue on the correct positions.

Abstract: The present invention relates to a dual slot die and a coating method using the same, wherein there is the advantage that electrode slurry coating and insulating solution coating simultaneously proceed through a dual slot die to prevent the occurrence of electrode slurry sliding at the edge of the electrode slurry layer. An electrode slurry layer and an insulating layer can be formed on a current collector sheet in a multi-line manner by including a shim having a structure formed with multiple discharge lines capable of discharging the electrode slurry or insulating solution in multiple lines, thereby increasing process efficiency.

Abstract: An apparatus for coating or encapsulating articles, having a drum with a perforated wall rotatably assembled in a wrap-around chamber and suitable for containing and stirring a batch of articles to be coated; a dispenser group with one or more nozzles for spraying a coating product; a gas inlet to direct clean drying gas against the perforated wall and a gas outlet to extract from the chamber dirty drying gas. An adjustable closure system is interposed between the drum and the gas outlet of the chamber, defining a passage for the dirty drying gas smaller than the passage by the gas outlet and further displaced or concentrated coinciding with the area of the wall of the drum that is effectively covered by the batch of articles. An automated adjustment of the locking system is envisaged, taking into account the position of the nozzles within the drum.

Abstract: An applicator for the deposition of sealant onto a surface of a workpiece is disclosed including at least one inlet for depositing sealant on to a surface or a nozzle-receiving space for receiving a nozzle comprising at least one inlet for depositing sealant on to a surface; at least one sealant-contacting surface for contacting sealant deposited onto the surface through the inlet as the applicator is moved across said surface, thereby forming a film of sealant on the surface; at least one spacer for contacting a surface onto which sealant is to be deposited and for maintaining the sealant-contacting surface in spaced relationship with the surface; the applicator being configured to facilitate the formation of films of different widths.

Abstract: A coating device includes a backup roll configured to transport a workpiece; a coating die configured to discharge a coating liquid onto the workpiece; a drive section capable configured to drive the backup roll; and a heat dissipation section configured to dissipate heat generated in the drive section.

Abstract: A substrate handling system comprising a substrate holder comprising a main body with a main body surface, and a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface, clamping means, the clamping means being configured to clamp and/or unclamp the substrate onto the substrate holder, and conveying means, the conveying means being configured to load and/or unload the substrate onto the substrate holder, wherein the conveying means is further configured to physically contact the substrate during the clamping and/or unclamping to the substrate holder. It is also described methods for clamping and unclamping a substrate, a computer program, a computer-readable medium and a lithography apparatus.

Abstract: A substrate processing apparatus may include a chamber having a working space, maintaining a vacuum state, and including an upper wall positioned on the working space, a nozzle assembly positioned in the working space, and including nozzles, and a lifting module including a frame positioned outside of the chamber, a lifting part that lifts the frame, and at least one shaft passing through the upper wall, connected to each of the frame and the nozzle assembly, and extending in a direction of gravity.

Abstract: A robot for coating a vehicle body includes a coating head, a reservoir for storing coating material, a supply device capable of controlling the pressure of coating material flowing through a circulation path provided between the coating head and the reservoir, and an arm having a coating head and a supply device. The arm is a multi-axis arm having multiple arm members and a movable shaft connecting each arm member to each other, and it has a posture control means that controls the posture of the multiple arm members during coating of the vehicle body by the coating head to maintain the relative position of the coating head and the supply device at a constant level or to suppress fluctuations in the relative position within a predetermined allowable range.

Abstract: In some examples, a flat Bottom Shadow Ring (fBSR) is provided for processing a substrate in a processing chamber. An example fBSR comprises an overhang for covering an edge of the substrate in the processing chamber. The overhang includes a fiat zone that extends radially outward over the outer edge of the substrate.

Abstract: A device for manufacturing a semiconductor device is provided. The device for manufacturing a semiconductor device includes a tube extending in a first direction, and defining a reaction space therein and configured to accommodate a boat that is configured to receive a plurality of substrates therein, and first and second nozzles each extending in the first direction inside the tube, and being apart from each other on a plane that is perpendicular to the first direction and parallel to upper surfaces of the substrates, wherein the first and second nozzles include a plurality of first injection ports and a plurality of first second injection ports that are configured inject different gases toward a center of the reaction space, respectively, and a plurality of second injection ports are placed in a region between a corresponding pair of adjacent ones of the plurality of first injection ports along the first direction.

Abstract: A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from at least one metal inside a Vacuum deposition facility including a vacuum chamber, a coated substrate coated with at least one metal on both sides of the substrate and a coated metallic substrate.

Abstract: A device and method for coating and curing a protective layer on large format graphics comprises a roll-to-roll machine having a coat stage and a cure stage. A roll of printed web material turns about a load reel, passing through the coat stage and cure stage, and is wound around a finish reel. The load and finish reels may be driven by servo-motors. The coat stage comprises a coat pan which is partially filled with coating liquid and a Mayer bar for removing excess coating liquid. The cure stage comprises a light source and a plate. One or more devices, such as idler rollers, dancer rollers, stationary rollers, or load cells, are placed between the load and finish reels to control the path, tension, and speed of the web material.

Abstract: An apparatus for preventing blockage of a floating stage includes a moving member moving between a floating stage for lifting a substrate and a nozzle disposed above the floating stage, and a cover installed on the moving member and moving between the floating stage and the nozzle by the moving member to cover the floating stage.

Abstract: A processing chamber is disclosed and includes a chamber body. The chamber body has a first side, a second side opposite the first side, a window assembly, and a base. The first and second side, the window assembly and the base define a thermal processing region. A flow assembly is disposed adjacent the first side and configured to introduce a processing gas into the thermal processing region. An exhaust slit assembly is disposed adjacent the second side. The exhaust slit assembly has an opening exposed to the thermal processing region. The opening having a center and an outer edge of the opening. The center of the opening and edge of the opening vertically defined between the window assembly and the base. Wherein an outer height at the edge of the opening is at least 30% larger in a vertical direction than a center height at the center of the opening.

Abstract: A pretreatment device includes a platen, guide that guide a conveyance of the platen from a set position at which a recorded medium is set on an upper surface, a spray that sprays a pretreatment agent onto the recording medium set on an upper surface of the platen, an input portion into which is input at least one of an application range of the pretreatment agent onto the recording medium or an application amount of the pretreatment agent, a processor; and a memory storing computer-readable instructions. The computer-readable instructions also includes setting, on the basis of at least one of the application range or the application amount input into the input portion, at least one of a conveyance speed of the platen or a spray duty ratio that is a ratio of a spray time during a spray period of the pretreatment agent.

Abstract: A microdroplet-based three-dimensional (3D) laser printing system, which includes a laser beam subsystem, a transparent donor substrate, voxel arrays, and the receiver substrate. By irradiating the voxel array with a pulsed laser beam deriving from the laser beam subsystem through the transparent donor substrate, the voxel array is melted and driven away from the transparent donor substrate to generate the ejecting microdroplet array and then deposited onto the receiver substrate. The 3D microstructure is printed in parallel by sequentially irradiating the voxel array and controlling the depositing locations of microdroplet arrays onto the receiver substrate. The system can avoid the satellite microdroplets generating, improve the printing efficiency and resolution, and obtain a wide process window.