Abstract: A reel-to-reel machine to fabricate a printed flexible circuit on the fly, the machine has a plurality of reels, a laser scanner to ablate a metal foil, a source of UV light or heat to curing an adhesive in a coverlay, another source of UV light or heat to debond a sacrificial liner on the fly. There is a depositor to deposit a sintering paste on the fly onto a predetermined spot for a pad on the metal foil. Removal of slugs are also possible on the fly.

Abstract: A method of delivering a glutinous substance to a workpiece from an end-effector comprises using the end-effector to position an applicator relative to the workpiece. The method also comprises urging the glutinous substance from the end-effector through a first channel of a body of the applicator from an inlet of the first channel toward an outlet of the first channel. The method additionally comprises selectively operating an actuator of the applicator to regulate a rate, at which the glutinous substance flows through the first channel of the body of the applicator, responsive to, at least in part, output received from a sensor of the applicator.

Abstract: Disclosed are an apparatus and a method for liquid-treating a substrate. An apparatus for treating a substrate includes a liquid treatment chamber that supplies a liquid onto the substrate to liquid-treat the substrate, a drying chamber that removes the remained liquid on the substrate, and a transfer unit that transfers the substrate between the liquid treatment chamber and the drying chamber, wherein the transfer unit includes a hand that supports the substrate, and a weight measuring unit that measures a weight of the remained liquid on the substrate. A weight of a remained liquid on a substrate may be measured by measuring a weight of the substrate while the substrate is transferred.

Abstract: A thermo spray gun (10) includes at least one of; at least one removable nozzle tip (20) for spraying a coating material, at least one replaceable nozzle tip (20) for spraying a coating material, and at least one interchangeable nozzle tip (20) for spraying a coating material. A thermo spray gun system (1000) includes a thermal spray gun (10) and at least one mechanism (30/40) at least one of; storing at least one nozzle tip installable on the thermal spray gun and being structured and arranged to install at least one nozzle tip on the thermal spray gun. A method of coating a substrate (S) using a thermo spray gun (10) includes mounting at least one nozzle tip (20) on the thermo spray gun (10) and spraying a coating material with the at least one nozzle tip (20).

Abstract: Disclosed embodiments generally relate to a processing chamber that includes a perforated lid, a gas blocker disposed on the perforated lid, and a substrate support disposed below the perforated lid. The gas blocker includes a gas manifold, a central gas channel formed in the gas manifold, a first gas distribution plate that includes inner and outer trenches surrounding the central gas channel, and a first and second gas channels formed in the gas manifold. The first gas channel is in fluid communication with a first gas source and the inner trench, and the second gas channel is in fluid communication with the first gas source and the outer trench and a second gas distribution plate The first gas channel is in further fluid communication with a third gas distribution plate that is disposed below the second gas distribution plate, and a plurality of pass-through channels that are disposed between the second gas distribution plate and the third gas distribution plate.

Abstract: A device for use in organic vapor jet printing (OVJP) and similar arrangements includes a print head movable in more than one degree of freedom with sufficient thermal insulation that there is little to no movement in the Z direction. One or more sensors may be used to monitor and adjust the distance between the substrate and the print head.

Abstract: A gas supply system according to the present disclosure includes a first flow channel connected to a first gas source of a first gas, formed inside a ceiling or a sidewall of the treatment container, and communicating with the treatment space through a plurality of first gas discharge holes. The gas supply system also includes a second flow channel connected to a second gas source of a second gas, formed inside the ceiling or the sidewall of the treatment container, and communicating with the treatment space through a plurality of second gas discharge holes. The gas supply system further includes a plurality of first diaphragm valves, wherein each of the first diaphragm valves is provided between the first flow channel and the first gas discharge hole to correspond to the first gas discharge hole.

Abstract: A crystal oscillation probe structure and an evaporation device are provided. The crystal oscillation probe structure includes a guide cover, a crystal oscillation probe and a mesh screen structure, the guide cover includes a chamber with a guide opening, the crystal oscillation probe is fixed in the chamber, the crystal oscillation probe includes at least one crystal oscillation sheet, the mesh screen structure includes a plurality of openings, and the mesh screen structure is located on a traveling path of a material traveling toward the at least one crystal oscillation sheet and disposed on a side of the at least one crystal oscillation sheet facing the guide opening.

Abstract: A deposition mask has a central axis extending in a first direction, arranged at a central position in a second direction orthogonal to the first direction. Spaced apart point P1 and Q1 are provided on one side of the central axis, and spaced apart points Q1 and Q2 are provided on another side of the central axis. When a dimension from point P1 to point Q1 is X1, a dimension from point P2 to a point Q2 is X2, and a design value is ?x, the deposition mask satisfies the following.

Abstract: The invention relates to a system and a method for the hot-dip galvanization of motor-vehicle components, preferably for mass-production hot-dip galvanization of a plurality of identical or similar motor-vehicle components, in particular in batches, preferably for batch galvanization, especially preferably for high-precision hot-dip galvanization.

Abstract: An apparatus for coating a donor surface that is movable relative to the apparatus with a layer of thermoplastic particles, the particles adhering more strongly to the surface than to one another. The apparatus comprises an application device to apply to the donor surface a fluid stream within which the particles are suspended, a housing surrounds the application device forming an interior plenum for confining the fluid stream, the housing prevents egress of particles from a sealing gap defined between the rim of the housing and the surface to be coated, and a suction source connected to the housing to extract from the plenum excess fluid and particles. In operation, the suction source extracts substantially all particles that are not in direct contact with the donor surface, leaving substantially a single particle layer adhering to the donor surface upon exiting the apparatus.

Abstract: A processing arrangement comprising: a process chamber comprising an upper chamber wall, a lower chamber wall and two lateral chamber walls; an insulating structure, arranged between the processing region and each of the upper chamber wall, the lower chamber wall and the two lateral chamber walls, respectively, for thermally insulating the processing region, wherein the insulating structure is configured as gas-permeable at least in sections in such a way that a process gas from the processing region can flow out of the processing region in the direction in each of the upper chamber wall, the lower chamber wall and the two lateral chamber walls, respectively, through the insulating structure; and a gas channel, arranged between the insulating structure and each of the upper chamber wall, the lower chamber wall and the two lateral chamber walls, respectively, for pumping away the process gas which flows through the insulating structure.

Abstract: A system for treating wood (30), comprising: —a treatment vessel (14) configured to receive at least one wood stack (4) for treatment, and —a stack holding system (2) for holding a wood stack (4), the stack holding system (2) comprising: —a frame (6), configured to support the wood stack (4); —a first element (8), connected to the frame (6) near an upper side of said frame (6), configured to exert a first, downward force on the wood stack (4); and —a second element (10), connected to the frame (6) near a lower side of said frame (6), configured to exert a second force on the wood stack (4) in a direction opposite said first force. The invention also comprises a method for treating wood, using a system for treating wood according to the invention.

Abstract: A coating apparatus includes a transport roll for transporting a base material, a slit die facing a lower surface of the base material, a coating liquid supply controller for switching on and/or off in supply of a coating liquid to the slit die, and a base material height changing device for ejecting compressed gas onto the lower surface of the base material during a specific period from a termination of the supply of the coating liquid to the slit die to a restart of the supply of the coating liquid to the slit die.

Abstract: An assembly of a chamber lid and a ceiling is used in a film deposition apparatus for semiconductor processes. The assembly comprises a chamber lid, a ceiling and a retaining mechanism. The chamber lid comprises a recession capable of containing the retaining mechanism. The ceiling comprises a plate and a support ring protruding from the middle of the plate. The retaining mechanism comprises a pair of arms, a pair of connecting members respectively connected to the arms, a pair of linkages respectively forcing the connecting members to move along different directions and a driver driving the linkages to move relative to each other. When the connecting members move toward and get close to each other along different directions, the arms accordingly retain the support ring.

Abstract: A shower head that supplies a process gas in a vapor phase growth apparatus includes a mixing chamber; and a plurality of cooling portions provided below the mixing chamber with gaps between cooling portions. The cooling portion includes a cooling hole provided in a horizontal direction, and the gaps extend linearly in the horizontal direction. The shower head further includes, below the gaps, a plurality of buffer regions extending linearly in the horizontal direction. The shower head further includes, below the buffer regions, a shower plate including a plurality of through holes disposed at a predetermined interval. The shower head can uniformly supply the process gas.

Abstract: A pretreatment assembly includes a product support assembly and a pretreatment device. The product support assembly includes a primary support assembly, a primary drive assembly, a number of secondary support assemblies, and a secondary drive assembly. The primary drive assembly is operatively coupled to the primary support assembly. The primary drive assembly imparts a generally constant motion to the primary support assembly. Each secondary support assembly is structured to support a number of work pieces. Each secondary support assembly is movably coupled to the primary support assembly. The secondary drive assembly is operatively coupled to each secondary support assembly. The secondary drive assembly selectively imparts a motion to each secondary support assembly. The pretreatment device is disposed adjacent the product support assembly.

Abstract: Embodiments herein relate to gas distribution apparatuses. In one aspect, the disclosure herein relates to a showerhead including a body having an upper surface and a lower surface. A thermal choke is disposed adjacent a perimeter of the body. The thermal choke includes a plurality of interleaved channels. One or more apertures are disposed between the upper surface and the lower surface of the body.

Abstract: A showerhead for a substrate processing chamber includes: inner walls; an inner plenum between the inner walls; and a faceplate having a first surface and a second surface that is opposite the first surface. Holes through the faceplate extend from the first surface to the second surface. A first inlet is fluidly connected to the inner plenum. A first outer plenum is between the inner walls and outer walls. A second outer plenum is between the inner walls and the outer walls. Coolant: fluidly connect the first outer plenum with the second outer plenum; are located within the faceplate between the first and second surfaces; and are fluidly isolated from the holes. The showerhead also includes a second inlet that is fluidly connected to the first outer plenum.

Abstract: Systems and methods for dispensing liquid materials as may be used in applications for coating flexible films and the like. Such a film may be coated by dispensing a rheological material onto its surface while drawing the film through a gap between a pair of rollers. The gap defines the thickness of a layer of the material applied to the film and is maintained at a desired width by microwires positioned through the gap. Another film across the gap from that to which the rheological material is applied aids in the coating of the layer and a contact area of the second film may be adjusted relative to the gap, e.g., when changing materials or when the coating film becomes abraded or deformed.