Abstract: A fine structure T-shaped electrode is fabricated using a phase shift method. A photoresist layer is formed on a semiconductor substrate and the photoresist layer is exposed to an exposure light having a first wavelength through a photomask which has a desired pattern of a base shifting layer whereby the phase of the exposure light is shifted by 180 degrees. The photoresist layer is then exposed to another exposure light having a second wavelength that is different from the first wavelength through the photomask. The photoresist is developed to form a T-shaped resist cavity and a metal layer is deposited over the resist layer formed on the semiconductor substrate. All the metal layer is removed except for the areas covering the T-shaped photoresist pattern. The T-shaped electrode is also formed by disposing a photoresist layer on a semiconductor substrate.

Abstract: A process for storing information in an organic recording layer which, when treated locally with an organic solvent in accordance with the input of information, is able to change its absorption spectrum and/or its photoconductivity such that information can be produced or stored at the treated areas of said layer, wherein the organic solvent is solid at room temperature and is present in the recording layer, or by decomposition of a solid organic precursor which is present in the recording layer, and said solvent is vaporized or melts by the action of laser beams in accordance with the input of information, or said precursor is decomposed by the action of laser beams in accordance with the input of information.The stored information can be read out with a photodetector in the visible or near NIR range or with a built-in electrode system.

Abstract: The present invention relates to a photopolymerizable resin composition developable with an aqueous weak alkaine solution and suitable for a printed circuit board.The photopolymerizable resin composition of the present invention is mainly composed of:(a) a linear acrylic copolymer,(b) an ethylenically unsaturated compound, and(c) a photopolymerization initiator,wherein said linear acrylic copolymer comprises as indispensable comonomers:i) at least one compound represented by the general formula: ##STR1## wherein X is a hydrogen atom or a methyl group, Y is an oxygen atom or an imino group and Z is an alkylene group having 1 to 5 carbon atoms, andii) an ethylenically unsaturated compound having a carboxyl group.the photopolymerizable resin composition of the present invention can afford a resist film having excellent flexibility and adhesion through the use of the above-described particular linear acrylic copolymer.

Abstract: A silver halide color photographic material comprising a support having thereon at least one silver halide emulsion layer, wherein the photosensitive material contains at least one compound represented by General Formula (I), and at least one type of compound represented by General Formula (II) or an organometallic complex which has copper, cobalt, nickel, palladium or platinum as the central metal and which has at least one bidentate organic ligand, wherein general Formula (I) has the following formula: ##STR1## and general Formula (II) has the following formula:R.sub.10 --W--R.sub.11 (II)wherein the variables are defined in the specification.

Abstract: In a photolithographic process for fabricating microelectronic circuits, a contrast enhancing layer soluble in either water or developer that is selectively applied to a photoresist layer residing on a substrate.

Abstract: The invention features a new series of triazine compounds which are characterized by their ability to generate free radicals upon irradiation in a desired optical region, such that they are useful in the fabrication of lithographic plates having improved exposure speed, development, print-out, and contrast characteristics.