Abstract: A method for pretexturing the polishing surface of a chemical mechanical polishing layer, comprising providing a chemical mechanical polishing layer having a polishing surface; providing a belt sanding machine; feeding the chemical mechanical polishing layer through a gap between a transport belt and a calibrating sanding belt of the belt sanding machine; and, wherein the polishing surface comes into contact with the calibrating sanding belt; wherein the thickness of the polishing layer is reduced.
Type:
Grant
Filed:
July 30, 2012
Date of Patent:
August 18, 2015
Assignee:
Rohm and Haas Electronic Materials CMP Holdings, Inc.
Inventors:
John Henry Nunley, Jr., Andrew M Geiger, Jeffrey Benedict