Patents Examined by Brammer Jack
  • Patent number: 5294511
    Abstract: A photosensitive composition containing a compound having a group represented by formula(I) or (II), said group, when irradiated with actinic radiation, forming a carboxylic acid or a sulfonic acid: ##STR1## wherein R.sub.1 represents hydrogen, an alkyl group, or an aryl group; andR.sub.2 to R.sub.6 may be the same or different and each represents hydrogen, a halogen, an alkoxyl group, an aryloxyl group, cyano group, or an alkyl group, provided that at least one of R.sub.2 to R.sub.6 represents an alkoxyl or aryloxyl group and two of R.sub.2 to R.sub.6 may link to form a ring.
    Type: Grant
    Filed: December 29, 1992
    Date of Patent: March 15, 1994
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Toshiaki Aoai, Mitsunori Ono