Patents Examined by Brenda G. Brynback
  • Patent number: 5866021
    Abstract: A micro-tip is manufactured by forming a recess portion on a first substrate consisting of monocrystalline silicon for forming a tip. A peeling layer is formed on the recess portion, and contact layer is formed on at least a portion other than the peeling layer on the substrate. A tip material layer is formed on the peeling layer and the contact layer. The tip material layer on the peeling layer is transferred onto a second substrate.
    Type: Grant
    Filed: September 12, 1996
    Date of Patent: February 2, 1999
    Assignee: Canon Kabushiki Kaisha
    Inventors: Takayuki Yagi, Tsutomu Ikeda, Yasuhiro Shimada