Abstract: Compositions and methods useful for the removal of organic substances from substrates, for example, electronic device substrates such as microelectronic wafers or flat panel displays, are provided. A method is presented which applies a minimum volume of the composition as a coating to the inorganic substrate whereby sufficient heat is added and immediately rinsed with water to achieve complete removal. These compositions and methods are particularly suitable for removing and completely dissolving photoresists of the positive and negative varieties as well as thermoset polymers from electronic devices.

Abstract: A method for removing scum in a tub of an electronically controlled drum washing machine. The method includes alternately rotating a drum following a main washing cycle and pumping liquid out of the drum, pumping a liquid out of the drum for between 30 seconds to 15 minutes following a main washing cycle and pumping liquid out of the drum, regulating a level of water following a main washing cycle and pumping liquid out of the drum by: introducing a quantity of water into the drum which is sufficient to cover all water channels, and rinsing over a short period of time t2. The method further including pumping liquid out of the drum while the drum is moved at a low rotational speed following a main washing cycle and pumping liquid out of the drum.

Abstract: A substrate processing apparatus includes a substrate holding member configured to rotate along with a wafer (W) held thereon and a drain cup (51) configured to surround the wafer (W). A cleaning process is performed by rotating the wafer (W) while supplying a process liquid onto the wafer (W), and then a rinsing process is performed by rotating the wafer (W) in a similar way while supplying a rinsing liquid onto the wafer (W). The rinsing process is performed by first adjusting a rotational speed of the wafer (W) to be the same as the rotational speed used in the cleaning process while supplying the rinsing liquid, and then raising a liquid level of the rinsing liquid inside the drain cup (51) by decreasing the rotational speed of the wafer (W) or increasing a flow rate of the rinsing liquid, and raising a reach position of the rinsing liquid on the outer sidewall of the drain cup (51) by increasing the rotational speed of the wafer (W).

Abstract: Embodiments of the disclosed technology comprise a handheld cleaning device that sanitizes an item to be cleaned by, in a single action, dispensing ozone and ultrasonic wave cavitations in an aqueous medium that contains the object to be cleaned. The handheld device comprises a dipping end, which further comprises an ozone generator, dispensing ozone from the dipping end, and an ultrasonic wave generator generating ultrasonic cavitation in an aqueous medium. The device is configured to be held on a holding end, with a side opposite the holding end configured for dipping into an aqueous medium (e.g., water, cleaning fluid, liquids, etc.) which is contained in a vessel. The vessel is a concave structure capable of holding such aqueous medium, such as a sink, a bowl, a basin, and the like.

Abstract: A machine for washing surgical and/or medical instruments (1), includes a washing tank (2) designed to receive surgical and/or medical instruments (1) and a door (4) positioned facing the tank (2) so that it can be used to seal the tank or provide access thereto. The door (4) is mounted to a bilateral hinge designed to enable the door to be opened: to a first loading position on the loading side (5) of the machine, in order to provide access to the tank on the loading side (5) and prevent the tank from being accessed on the other side; and to a second unloading position on the opposite unloading side (6) of the machine, in order to provide access to the tank on the opposite unloading side (6) and prevent the tank from being accessed on the loading side (5).

Abstract: A process for cleaning a silicon electrode is provided where the silicon electrode is soaked in an agitated aqueous detergent solution and rinsed with water following removal from the aqueous detergent solution. The rinsed silicon electrode is then soaked in an agitated isopropyl alcohol (IPA) solution and rinsed. The silicon electrode is then subjected to an ultrasonic cleaning operation in water following removal from the IPA solution. Contaminants are then removed from the silicon electrode by soaking the silicon electrode in an agitated mixed acid solution comprising hydrofluoric acid, nitric acid, acetic acid, and water. The silicon electrode is subjected to an additional ultrasonic cleaning operation following removal from the mixed acid solution and is subsequently rinsed and dried. In other embodiments of the present disclosure, it is contemplated that the silicon electrode can be soaked in either the agitated aqueous detergent solution, the agitated isopropyl alcohol (IPA) solution, or both.

Abstract: A cleaning method for a turbo molecular pump, which enables the exhausting ability of the turbo molecular pump to be restored without bringing about a decrease in the productivity of a substrate processing apparatus. A vaporizing gas that vaporizes foreign matter attached to an internal surface of the turbo molecular pump is supplied toward the foreign matter.

Abstract: The present invention relates to aqueous compositions comprising amidoxime compounds and methods for cleaning plasma etch residue from semiconductor substrates including such dilute aqueous solutions. The compositions of the invention may optionally contain one or more other acid compounds, one or more basic compounds, and a fluoride-containing compound and additional components such as organic solvents, chelating agents, amines, and surfactants. The invention also relates to a method of removing residue from a substrate during integrated circuit fabrication.

Abstract: A method and system for launching a pipeline pig includes the steps of compressing a modulating bypass valve of a pipeline pig and installing a locking means to temporally maintain the bypass valve in the compressed state. Once the pig has travelled a predetermined distance through the pipeline, the locking means is released and retrieved through the launch trap door. The locking means is preferably a launching pin having a clip attachment that receives the clips of a retractable lead. The lead is housed by a retraction device that is detachably secured to the launch trap door. The modulating valve has sufficient mass and aerodynamic drag to overcome the force of a gas spring. The valve moves between a retracted and compressed position substantially instantaneously upon the pipeline pig stalling and between the compressed and retracted position substantially instantaneously upon the pipeline pig accelerating.

Abstract: A method and aqueous composition are provided for removing at least a portion of a coating from the surface of a substrate. The coating comprises an insulative material, and is contacted with an aqueous composition. The aqueous composition comprises dimethyl formamide.

Abstract: Embodiments of the disclosed technology comprise a handheld cleaning device that sanitizes an item to be cleaned by, in a single action, dispensing ozone and ultrasonic wave cavitations in an aqueous medium that contains the object to be cleaned. The handheld device comprises a dipping end, which further comprises an ozone generator, dispensing ozone from the dipping end, and an ultrasonic wave generator generating ultrasonic cavitation in an aqueous medium. The device is configured to be held on a holding end, with a side opposite the holding end configured for dipping into an aqueous medium (e.g., water, cleaning fluid, liquids, etc.) which is contained in a vessel. The vessel is a concave structure capable of holding such aqueous medium, such as a sink, a bowl, a basin, and the like.

Abstract: The invention relates to a method of cleaning a pipe (12) by action of a fluid under very high pressure. It is characterised in that the fluid under very high pressure is caused to pass in a flexible tube (14); said tube is subjected to the action of motorisation means (5) for longitudinal advance, and means for driving the tube (14) in rotation around its longitudinal axis; these motorisation means (50) are regulated by management means (48) and rotation detection means (47) and/or pinpointing longitudinal advance, and these means of driving in rotation; the tube (14) is guided near the entrance of the pipe (12). The invention also relates to a device for implementing this method.

Abstract: A method of operating a dishwasher having multiple wash chambers, with each wash chamber executing a different cycle of operation, and liquid from one chamber may be reused in the other chamber.