Abstract: A baking pan oiling device includes a housing, a conveyor mechanism, an oil supply, a nozzle fluidly coupled to the oil supply configured to intermittently spray the oil onto baking pans. A first sensor configured to sense a presence of movement of oil through the oil supply and to sense an absence of movement of oil through the oil supply during the pan oiling operation. A control unit communicatively coupled to the first sensor configured to receive sensor data corresponding to the presence of the movement of oil or the absence of the movement of oil during the pan oiling operation. Upon receiving the sensor data corresponding to the absence of the movement of oil during the pan operation, the control unit ceases the pan oiling operation.

Abstract: An apparatus for treating a substrate is provided. The apparatus for treating the substrate includes a first process chamber to perform a liquid treatment process with respect to the substrate, a second process chamber to perform a drying treatment process with respect to the substrate which is liquid treated in the first process chamber, a first hand to introduce the substrate to the first process chamber, before the liquid treatment process is performed, a second hand to withdraw the substrate from the first process chamber after the liquid treatment process is performed and to introduce the substrate into the second process chamber, and a third hand to withdraw the substrate from the second process chamber after the drying treatment process is performed.

Abstract: Provided are a micro-nano wire manufacturing device and a micro-nano structure. The micro-nano wire manufacturing device includes a liquid-phase nanomaterial storage device and a micro-nano wire applying mechanism. The liquid-phase nanomaterial storage device is provided with a liquid outlet. The micro-nano wire applying mechanism is provided in one-to-one correspondence with the liquid outlet. The micro-nano wire applying mechanism includes at least two flexible wires. The roots of the flexible wires are secured to the liquid-phase nanomaterial storage device. One ends of the two flexible wires hang down to a substrate and abut against each other. The range of the angle between the projections of the two flexible wires on the substrate is 1° to 5°.

Abstract: Equipment for selectively depositing, by shockwave-induced spraying, at least one particle on a deposition surface of a receiver substrate. The equipment including at least one laser source that emits a laser beam, a substrate carrier to which the substrate is fastened, a shockwave-generating layer having a first surface oriented toward the laser beam and a second surface oriented toward the deposition surface of the substrate, an optical system for directing and focusing the laser beam toward a focal region of the first surface. The second surface including a plurality of cavities, each cavity housing at least one particle. The laser beam generates a plasma in the focal region on the first surface and a shockwave that propagates within the generating layer from the first surface to the second surface in order to spray at least one particle in the direction of the deposition surface of the substrate.

Abstract: Provided by the present disclosure are a mask assembly and a manufacturing method thereof. In the mask assembly, a plurality of connecting posts are arranged at intervals on an outer periphery of a body of a metal plate, and a plurality of grooves matched with the connecting posts are arranged on a metal frame.

Abstract: A method and associated paint finishing system are disclosed for performing predictive maintenance on equipment used for delivering liquid paint in a paint finishing facility. The method comprises: identifying a set of components of the equipment and associated maintenance requirements; for each of the components, providing a set of operating parameters (401-404) that affect useful service life of the component; for each component, providing an algorithm (410) relating the operating parameters to a remaining time by when a maintenance operation on the component is to be performed; monitoring each of the operating parameters (401-404) during operation of the paint finishing facility; for each component, applying the algorithm (410) with the monitored operating parameters (401-404) to calculate the remaining time for the component (420); and for each component providing to a maintenance operative an alert indication relating to the remaining time for the component.

Abstract: A nozzle arrangement for applying fluids to a substrate has a connection body that is connectable to a distributor mounting region and has a spray nozzle that is connectable to the connection body. The spray nozzle has a nozzle body that longitudinally extends and has a first fluid channel for the fluid to be applied to the substrate. The spray nozzle has a nozzle housing in which the nozzle body is received. Second fluid channels for shaping air are formed between a lateral surface and inner of the nozzle body. The second fluid channels extend in the direction of a nozzle outlet opening of the nozzle body such that, by way of the shaping air dispensed from the second fluid channels at the nozzle outlet region, a spiral-shaped deflection of the fluid dispensed from the nozzle outlet opening of the nozzle body is created.

Abstract: Embodiments of the present disclosure generally relate to apparatus and methods for semiconductor processing, more particularly, to a thermal process chamber. The thermal process chamber includes a substrate support, a first plurality of heating elements disposed over or below the substrate support, and a spot heating module disposed over the substrate support. The spot heating module is utilized to provide local heating of cold regions on a substrate disposed on the substrate support during processing. Localized heating of the substrate improves temperature profile, which in turn improves deposition uniformity.

Abstract: An inkjet printing apparatus includes: a stage, which reciprocates in forward and reverse directions opposite to each other and has a target substrate disposed thereon; an inspection device including a film disposed outside the stage and a measurement unit which measures an inspection pattern provided on the film; and a head assembly, which moves along one direction crossing the forward direction and has a plurality of heads which supplies a liquid composition to the target substrate. The head assembly moves in the one direction to overlap the film and sprays the composition onto the film to form an inspection pattern.

Abstract: A mask frame support unit includes a case, a protruding body extending below the case, and a station having a flat head disposed above the case. The protruding body includes a tapered region and a cylindrical region. The tapered region includes a first end having a first diameter coupled to the case and comprising a second end having a second diameter opposite the first end. The second diameter is less than the first diameter, and the tapered region is coupled to the cylindrical region at the second end. The case houses a number of components including an upper receiving plate in contact with the station, a lower receiving plate disposed underneath the upper receiving plate, a flat head unit movement support mechanism disposed between the lower receiving plate and the body, and a centering component.

Abstract: The present disclosure relates to a vacuum processing apparatus. The vacuum processing apparatus includes a processing container capable of maintaining an inside thereof in a vacuum atmosphere, a stage provided in the processing container and on which a substrate is placed, a support member passing through an opening formed at a bottom of the processing container to support the stage from below, a holder part located outside the processing container, a flange part arranged around the opening on the outside of the processing container, and a sealing part configured to be expandable and contractible and provided inside the spherical bearing along the circumferential direction of the opening so as to airtightly seal at least a space between the flange part and the holder part.

Abstract: An apparatus, system and method for dispensing underfill to components on a printed circuit board. The apparatus, system and method may include an underfill chamber having an input through which the printed circuit board is received; at least one dispensing robot capable of dispensing the underfill to the components; a lower heater suitable to substantially evenly heat at least half of or the entirety of an underside of the printed circuit board once the printed circuit board is within the underfill chamber; and an overhead heater capable of heating up to half of a topside of the printed circuit board once the printed circuit board is within the underfill chamber.

Abstract: A semiconductor manufacturing apparatus includes a heating part, a first electrode, a first insulating part, a gas supply part, a second electrode, and a second insulating part. The heating part is arranged to be in one surface side of a substrate. The first electrode is arranged around the heating part. The gas supply part is arranged to be in another surface side of the substrate. The second electrode is arranged around the gas supply part. The first electrode and the second electrode are arranged to overlap with an outer edge portion of the substrate, which is a region existing from an outer peripheral end of the substrate to a position inside by a predetermined length, in a direction in which the first electrode and the second electrode face each other. The first electrode is arranged to be in contact with part of the outer edge portion on the one surface side.

Abstract: A method comprises processing a substrate in a gas enclosure to form a film on one or more portions of the substrate. The method further comprises, while processing the substrate, circulating gas along a circulation path through the gas enclosure. Circulating the gas may comprise flowing gas through an exhaust housing enclosing a printhead assembly housed in the gas enclosure and filtering the gas flowing downstream of the printhead assembly from the exhaust housing.

Abstract: An electrode manufacturing system includes: a doping unit; a cleaning unit: and a conveyor unit. The doping unit performs a process of doping an active material in a strip-shaped electrode with an alkali metal, the strip-shaped electrode including an active material layer formed portion in which an active material layer including the active material is formed, and an active material layer unformed portion in which the active material layer is not formed. The cleaning unit cleans the active material layer unformed portion that is adjacent to the active material layer formed portion. The conveyor unit conveys the electrode from the doping unit to the cleaning unit.

Abstract: There is provided a substrate processing apparatus comprising a liquid amount detecting part configured to detect a liquid amount of a liquid film formed on a substrate; and a coating state detecting part configured to detect a coating state of the substrate with the liquid film formed thereon.

Abstract: A multi-slot die coater which can improve a problem of structural vulnerability to deformation and torsion. The multi-slot die coater including a lower slot and an upper slot includes a lower die block; an intermediate die block disposed on the lower die block to form the lower slot therebetween; and an upper die block disposed on the intermediate die block to form the upper slot therebetween, wherein at least one of the lower die block, the intermediate die block, and the upper die block includes a metal coating layer on a ceramic body.

Abstract: Metrology slot plates, processing chamber lids and processing chambers having metrology slot plates are described. Each of the metrology slot plates independently comprises one or more of a plate blank, a reflectometer, a capacitance sensor, a gas flow meter, a manometer, a pyrometer, a distance sensor (laser) or an emissometer.

Abstract: A temperature-controlled shield for an evaporation source is described. The temperature-controlled shield is configured to provide a pre-heating zone or a post-cooling zone.

Abstract: A method and system for treating calcium-based stone having a surface to be treated for corrosion and stain resistance is provided. The system comprises a sanding unit to sand the surface of the calcium-based stone with a grit size of 40 to 100 to promote coating adhesion. The system further comprises a coating unit to coat the surface of the calcium-based stone with a predetermined amount of a coating material for corrosion and stain resistance defining an uncured coating on the surface. The system further comprises a curing unit to cure the uncured coating on the surface with a photo-initiator defining a cured coating on the surface. The system further comprises a polishing unit to polish the cured coating on the surface with a grit size of 1000 to 3000. The system further comprises a buffing unit to buff the cured coating on the surface with a fabric defining a treated surface of the calcium-based stone.