Patents Examined by Christina A Riddle
  • Patent number: 11029612
    Abstract: The invention relates to a bearing device arranged to support in a vertical direction a first part of an apparatus with respect to a second part of the apparatus, comprising a magnetic gravity compensator.
    Type: Grant
    Filed: February 15, 2018
    Date of Patent: June 8, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Maarten Hartger Kimman, Hans Butler, Olof Martinus Josephus Fischer, Christiaan Alexander Hoogendam, Theodorus Mattheus Joannus Maria Huizinga, Johannes Marinus Maria Rovers, Eric Pierre-Yves Vennat, Maurice Willem Jozef Etienne Wijckmans
  • Patent number: 11022889
    Abstract: Methods for manufacturing a semiconductor structure are provided. A substrate is provided. A first lithography is performed according to a first layer mask, to form a plurality of first photonic crystals with a first pitch on a first area of a layer above the substrate. A second lithography is performed according to a second layer mask, to form a plurality of second photonic crystals with a second pitch on a second area of the layer. A light is provided to illuminate the first and second photonic crystals. Light reflected by the first and second photonic crystals or transmitted through the first and second photonic crystals is received. The received light is analyzed to detect overlay-shift between the first photonic crystals corresponding to the first layer mask and the second photonic crystals corresponding to the second layer mask.
    Type: Grant
    Filed: August 10, 2018
    Date of Patent: June 1, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yu-Ching Lee, Yu-Piao Fang
  • Patent number: 11022903
    Abstract: A method for temperature control of a component that is transferable between a first system and a second system includes: ascertaining a temperature drift of a temperature of the component that is to be expected after transfer of the component from the first system into the second system; and modifying a temperature prevailing in the first system and/or a temperature prevailing in the second system such that the temperature drift that is actually occurring after transfer of the component from the first system into the second system is reduced with respect to the expected temperature drift.
    Type: Grant
    Filed: April 6, 2020
    Date of Patent: June 1, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Joeri Lof, Harmen Krediet, Timo Laufer
  • Patent number: 11016292
    Abstract: An eyepiece unit with optical filters includes a set of waveguide layers including a first waveguide layer and a second waveguide layer. The first waveguide layer is disposed in a first lateral plane and includes a first incoupling diffractive element disposed at a first lateral position, a first waveguide, and a first outcoupling diffractive element. The second waveguide layer is disposed in a second lateral plane adjacent to the first lateral plane and includes a second incoupling diffractive element disposed at a second lateral position, a second waveguide, and a second outcoupling diffractive element. The eyepiece unit also includes a set of optical filters including a first optical filter positioned at the first lateral position and operable to attenuate light outside a first spectral band and a second optical filter positioned at the second lateral position and operable to attenuate light outside a second spectral band.
    Type: Grant
    Filed: February 15, 2018
    Date of Patent: May 25, 2021
    Assignee: Magic Leap, Inc.
    Inventors: Miller Harry Schuck, III, Kevin Richard Curtis, Hui-Chuan Cheng, Bradley Jay Sissom, Paul M. Greco, William Hudson Welch, Eric C. Browy
  • Patent number: 11016401
    Abstract: A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.
    Type: Grant
    Filed: May 1, 2018
    Date of Patent: May 25, 2021
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Matthew Lipson, Christopher John Mason, Damoon Sohrabibabaheidary, Jimmy Matheus Wilhelmus Van De Winkel, Bert Dirk Scholten
  • Patent number: 11019314
    Abstract: A projector moves a first imaging lens and a second imaging lens in a direction that intersects the optical axis of an imaging section to adjust the imaging range of the imaging section and moves the first imaging lens and the second imaging lens in the direction that intersects the optical axis of the imaging section to switch the imaging lens located in a position corresponding to the imaging section from one to another.
    Type: Grant
    Filed: February 18, 2020
    Date of Patent: May 25, 2021
    Assignee: SEIKO EPSON CORPORATION
    Inventor: Shinji Kubota
  • Patent number: 11009802
    Abstract: A pellicle for a lithographic device and a method for its manufacture. The pellicle comprises a carbon-based film having a thickness of between 0.1 nm and 10 nm and at least one layer of cross-linked aromatic molecules, heteroaromatic molecules, or polyyne-based or polyene-based amphiphilic molecules. The carbon-based film has a periphery and a center portion and the center portion is transparent to the radiation beam. A support structure is coupled at least to the periphery of the carbon-based film.
    Type: Grant
    Filed: January 13, 2016
    Date of Patent: May 18, 2021
    Assignee: CNM TECHNOLOGIES GMBH
    Inventor: Albert Schnieders
  • Patent number: 11009782
    Abstract: A projection-type display device includes: a light source; a dust-proof case; heat-dissipating fins; a heat-dissipation fan that causes cooling air to flow into the heat-dissipating fins; a prism unit that is provided inside the dust-proof case and that separates light from the light source into a multiplicity of illumination light beams; an internal circulation fan; heat-receiving fins; and heat pipes that connect the heat-dissipating fins and the heat-receiving fins. The heat-receiving fins and the heat-dissipating fins are both formed in a substantially rectangular parallelepiped shape, each having, as cooling air inflow surfaces that are effective in heat dissipation or heat reception, a first surface and a second surface whose area is greater than the first surface. The cooling airflow inside the dust-proof case that is supplied by the internal circulation fan flows from the first and second surfaces of the heat-receiving fins.
    Type: Grant
    Filed: August 25, 2016
    Date of Patent: May 18, 2021
    Assignee: SHARP NEC DISPLAY SOLUTIONS, LTD.
    Inventor: Eisuke Yamashita
  • Patent number: 11003095
    Abstract: A positioning system for positioning an object. The positioning system includes a stage, a balance mass and an actuator system. The stage is for holding the object. The actuator system is arranged to drive the stage in a first direction while driving the balance mass in a second direction opposite to the first direction. The stage is moveable in the first direction in a movement range. When the stage is moving in the first direction and is at an end of the movement range, the positioning system is arranged to collide the stage frontally into the balance mass.
    Type: Grant
    Filed: August 31, 2017
    Date of Patent: May 11, 2021
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Krijn Frederik Bustraan, Yang-Shan Huang, Antonius Franciscus Johannes De Groot, Minkyu Kim, Jasper Anne Frido Marikus Simons, Theo Anjes Maria Ruijl, Ronald Josephus Maria Lamers
  • Patent number: 11003062
    Abstract: Provided is an information processing device including an image analysis unit that analyzes content of an input image projected by a projection device, and a projection position determination unit that determines a projection area in a projection space onto which the input image is projected by the projection device on the basis of an analysis result obtained by analyzing the input image.
    Type: Grant
    Filed: February 2, 2016
    Date of Patent: May 11, 2021
    Assignee: SONY CORPORATION
    Inventors: Shuichi Takahashi, Shuichi Haga
  • Patent number: 11003091
    Abstract: A method for exposing a wafer substrate includes forming a reticle having a device pattern. A relative orientation between the device pattern and a mask field of an exposure tool is determined based on mask field utilization. The reticle is loaded on the exposure tool. The wafer substrate is rotated based on an orientation of the device pattern. Radiation is projected through the reticle onto the rotated wafer substrate by the exposure tool, thereby imaging the device pattern onto the rotated wafer substrate.
    Type: Grant
    Filed: January 10, 2020
    Date of Patent: May 11, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Hsueh-Yi Chung, Yung-Cheng Chen, Fei-Gwo Tsai, Chi-Hung Liao, Shih-Chi Fu, Wei-Ti Hsu, Jui-Ping Chuang, Tzong-Sheng Chang, Kuei-Shun Chen, Meng-Wei Chen
  • Patent number: 10996053
    Abstract: A support structure having a vertical element supporting a set of cameras associated with a vehicle measurement or inspection system together with at least one target structure required for realignment or recalibration of onboard vehicle safety system sensors. A camera crossbeam carried by the support structure locates the set of cameras as required to view a vehicle undergoing measurement or inspection. The target structure is affixed to the vertical element of the support structure, at an elevation suitable for observation by at least one vehicle onboard sensors during a realignment or recalibration procedure. A set of rollers facilitates positioning of the target structure on a supporting floor surface during a realignment or recalibration procedure.
    Type: Grant
    Filed: March 9, 2020
    Date of Patent: May 4, 2021
    Assignee: HUNTER ENGINEERING COMPANY
    Inventors: Michael T. Stieff, Nicholas J. Colarelli, III, Brian M. Cejka
  • Patent number: 10992912
    Abstract: An illumination device has a plurality of first lens elements to collect incident light beams, and a field lens to guide each of the light beams that have passed through the plurality of first lens elements to an entire region of a specific area. The plurality of first lens elements include at least two first lens elements having different lens diameters from each other. When one of the two first lens elements has a lens diameter d and a focal length f, another of the two first lens elements has a lens diameter k×d (where k is a value larger than zero but other than 1) and a focal length k×f.
    Type: Grant
    Filed: February 11, 2016
    Date of Patent: April 27, 2021
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventor: Makio Kurashige
  • Patent number: 10983425
    Abstract: A projector includes a cooler cooling a cooling target based on transformation of refrigerant into gas. A refrigerant generator of the cooler includes a moisture absorbing and releasing member, a first blower, a heat exchanger, a heater, a second blower, a first circulation duct through which the air sent to the moisture absorbing and releasing member from the heat exchanger passes, and a second circulation duct through which the air sent to the heat exchanger from the moisture absorbing and releasing member passes. The second circulation duct includes a second opening disposed in a position where the second opening and a first opening of the first circulation duct sandwich the moisture absorbing and releasing member in a predetermined direction. An opening area of the second opening is smaller than an opening area of the first opening. When viewed along the predetermined direction, the entire second opening overlaps the first opening.
    Type: Grant
    Filed: February 21, 2020
    Date of Patent: April 20, 2021
    Assignee: SEIKO EPSON CORPORATION
    Inventor: Nobuo Sugiyama
  • Patent number: 10976668
    Abstract: An illumination optical unit for EUV projection lithography serves for obliquely illuminating an illumination field, in which an object field of a downstream imaging catoptric optical unit and a reflective object to be imaged can be arranged. A pupil generating device of the illumination optical unit is embodied so that an illumination pupil results, which brings about a dependency of an imaging telecentricity against a structure variable of the object to be imaged. This dependency is such that a dependency of the imaging telecentricity against the structure variable of the object to be imaged on account of interaction of the oblique illumination with structures of the object to be imaged is at least partly compensated for. An optical system for EUV projection lithography also has an imaging catoptric optical unit alongside an illumination optical unit and can additionally have a wavefront manipulation device.
    Type: Grant
    Filed: October 10, 2019
    Date of Patent: April 13, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Joerg Zimmermann
  • Patent number: 10976672
    Abstract: Systems and methods that include providing for measuring a first topographical height of a substrate at a first coordinate on the substrate and measuring a second topographical height of the substrate at a second coordinate on the substrate are provided. The measured first and second topographical heights may be provided as a wafer map. An exposure process is then performed on the substrate using the wafer map. The exposure process can include using a first focal point when exposing the first coordinate on the substrate and using a second focal plane when exposing the second coordinate on the substrate. The first focal point is determined using the first topographical height and the second focal point is determined using the second topographical height.
    Type: Grant
    Filed: April 29, 2019
    Date of Patent: April 13, 2021
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Jui-Ching Wu, Jeng-Horng Chen, Chia-Chen Chen, Shu-Hao Chang, Shang-Chieh Chien, Ming-Chin Chien, Anthony Yen
  • Patent number: 10976665
    Abstract: An extreme ultraviolet light generation apparatus includes: a chamber having an internal space in which a laser beam is condensed and plasma generation occurs at a focusing position of the laser beam; a condensing mirror configured to condense extreme ultraviolet light generated through the plasma generation; and a magnetic field generation unit configured to generate a magnetic field. The condensing mirror includes a substrate, a reflective layer, and a protective layer. The protective layer includes a first protective layer disposed in a first region, and a second protective layer disposed in a second region. A material of the first protective layer is less dense than a material of the second protective layer. The material of the second protective layer has a transmittance for the extreme ultraviolet light higher than that of the material of the first protective layer.
    Type: Grant
    Filed: August 10, 2020
    Date of Patent: April 13, 2021
    Assignee: Gigaphoton Inc.
    Inventor: Yoshiyuki Honda
  • Patent number: 10969694
    Abstract: A refractive projection lens for imaging a pattern in an object plane of the projection lens into an image plane of the projection lens via electromagnetic radiation of a mercury vapor lamp includes a multiplicity of lens elements are arranged along an optical axis between the object and image planes. The lens elements image a pattern in the object plane into the image plane with a reducing imaging scale. The lens elements include first lens elements made of a first material with a relatively low Abbe number and a second lens elements made of a second material with a higher Abbe number relative to the first material.
    Type: Grant
    Filed: September 30, 2019
    Date of Patent: April 6, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Alexander Epple, David Shafer
  • Patent number: 10969675
    Abstract: An optical assembly includes a first optical waveguide, a first in-coupler coupled with the first optical waveguide and a projector configured to project image light toward a first side of the first optical waveguide. The optical assembly also includes a first scanning reflector optically coupled with the projector and disposed on a second side of the first optical waveguide that is opposite to the first side. The projector is configured to project image light. The first scanning reflector is configured to receive the image light and to redirect the image light across a first range of directions. The first in-coupler is configured to redirect a first portion of the image light so that the first portion of the image light undergoes total internal reflection inside the first optical waveguide.
    Type: Grant
    Filed: June 10, 2019
    Date of Patent: April 6, 2021
    Assignee: FACEBOOK TECHNOLOGIES, LLC
    Inventors: Brian Wheelwright, Yun-Han Lee, Babak Amirsolaimani, Weichuan Gao
  • Patent number: 10962882
    Abstract: A circuit pattern is quickly created or changed by exposing the circuit pattern on a board without using a photo mask on which the circuit pattern is formed. There is provided a circuit pattern manufacturing apparatus including a forming unit that forms a circuit pattern by irradiating, with a light beam, a circuit pattern forming sheet including an insulating sheet base material layer and a mixture layer made of a mixture containing a conductive material and a photo-curing resin. The forming unit includes, as an optical engine, a housing, a laser diode, a prism mirror, an inclined mirror, a bottom mirror, and a driving mirror.
    Type: Grant
    Filed: June 1, 2016
    Date of Patent: March 30, 2021
    Assignee: KANTATSU CO., LTD.
    Inventors: Eiji Oshima, Tomio Kusakabe