Abstract: A detection device detects a position of a leading end of a tip for executing an operation on a cell via the leading end. The detection device includes a light source that outputs light in a lateral direction such that the light has a width when viewed along an up-and-down direction, a movement mechanism that moves the tip, and a detector that detects the light output from the light source, wherein the light output from the light source until being detected by the detector includes first and second lights that advance in respectively different lateral directions, the movement mechanism moves the tip such that a part of the first light and a part of the second light are blocked by the leading end, and the detector detects the first and second lights whose parts are blocked by the leading end.

Abstract: A measurement system includes a drive device configured to drive the plurality of optical semiconductor elements, a probe unit including a plurality of optical connection devices configured to receive respective emitted lights from the plurality of optical semiconductor elements and a processing device including a plurality of photoelectric converters. Each of the optical connection devices is connected to each of the photoelectric converter, and at least some of the emitted lights received by the optical connection devices are input to the photoelectric converter. The photoelectric converter converts the input emitted lights into electric signals.

Abstract: A method is described. The method includes obtaining a relationship between a thickness of a contamination layer formed on a mask and an amount of compensation energy to remove the contamination layer, obtaining a first thickness of a first contamination layer formed on the mask from a thickness measuring device, and applying first compensation energy calculated from the relationship to a light directed to the mask.

Abstract: A control apparatus for generating a control signal for controlling a control target includes a plurality of neural networks, and a selector configured to select, from the plurality of neural networks, a neural network to be used to generate the control signal, wherein each of the plurality of neural networks is selected by the selector to be used in execution of one corresponding control pattern among a plurality of control patterns for controlling the control target.

Abstract: A device for detecting the presence of abnormalities in a reel includes an image capturing module for capturing images of the reel including at least one camera, a displacer for displacing the reel in a field of view of the at least one camera, an analyzer for analyzing the images captured by the at least one camera and detecting the presence of abnormalities. The image capturing module including an upper capturer and lower capturer, the upper capturer fixed on a movable support arranged for being movable with respect to lower capturer, the upper capturer and/or the lower capturer including at least one three dimension camera arranged for providing a three dimension image of the reel.

Abstract: An illumination device has a light source unit, a lens unit, and a filter unit An imaging device receives object light, generated by the illumination light, from the measurement object at a predetermined observation solid angle, and pixels of the imaging device can each identify the different light wavelength ranges. A processing device includes an arithmetic unit configured to obtain a normal vector at each point of the measurement object corresponding to each pixel from inclusion relation between the plurality of solid angle regions, constituting the object light, and the predetermined observation solid angle, and a shape reconstruction unit configured to reconstruct the shape of the measurement object.

Abstract: A chamber device includes a housing into which a laser gas is filled, a pair of discharge electrodes generating light from the laser gas when a voltage is applied thereto, a window arranged at a wall surface of the housing and transmitting the light therethrough, a first fan causing the laser gas to flow between the discharge electrodes, a filter, a second fan rotating together with the first fan by a drive force of a drive source of the first fan, a fan-side flow path causing the laser gas filtered by the filter to flow by the second fan and a part of the laser gas to flow in a direction away from the window, and a window-side flow path communicating with the fan-side flow path and causing the laser gas flowing from the fan-side flow path by the second fan to flow toward the window.

Abstract: An inspection system for inspecting multiple surfaces of a substrate includes at least one illuminator that produces light at a first wavelength that is incident on the substrate at a first angle (e.g., normal) and light at a second wavelength directed that is obliquely incident on the substrate. An adjustment system adjusts the oblique angle. The substrate may be opaque to one of the wavelengths and at least partially transparent to the other wavelength. Detection optics collect backscattered light from the substrate and at least one detector generates a first image representative of the first surface of the substrate and a second image representative of a second surface or near the second surface of the substrate. The images may be compared to generate a third image representative of defects on or near the second surface of the substrate corrected for residual signals of defects on the first surface.

Abstract: An optical tracking device is used to track a target object. An outer surface of the target object is divided into a first region and a second region adjacent to each other, and a marker is disposed on the first region. The optical tracking device includes an optical sensor and an operation processor. The optical sensor has auto exposure function and is adapted to acquire a detection image containing at least one of the first region and the second region. The operation processor is electrically connected to the optical sensor and adapted to analyze variation of an exposure parameter of the auto exposure function for determining whether the first region is appeared in the detection image, so as to acquire an operation datum of the target object.

Abstract: The exposing apparatus according to the present invention for exposing a substrate so as to transfer a pattern formed on an original to the substrate by using exposure light from a light source, includes a substrate stage on which the substrate is mounted, a driving unit configured to drive the substrate stage with a plurality of actuators each configured to apply a thrust to the substrate stage in respective orientations different from each other, and a controller configured to control the driving unit to cause the substrate stage to move in the scanning direction when exposing each of a plurality of shot regions on the substrate, and to cause each of the plurality of actuators to apply the thrust to the substrate stage in at least a part of time duration of each movement in the scanning direction.

Abstract: A mirror structure includes an insulator layer and a first conductive layer disposed on the insulator layer. The first conductive layer includes a first non-conductive film disposed on the insulator layer. The first non-conductive film includes one or more first conductive segments. The mirror structure also includes a reflective layer disposed on the first conductive layer and an electro optical layer disposed on the reflective layer. The mirror structure further includes a second conductive layer disposed on the electro optical layer. The second conductive layer includes a second non-conductive film disposed on the electro optical layer. The second non-conductive film includes one or more second conductive segments.

Abstract: A device (20) for detecting a temperature on a surface (15) of an optical element (14) for semiconductor lithography. The device includes an optical element (14) having a face (16) irradiated with electromagnetic radiation (7, 8, 43), a temperature recording device (21), and a temperature controlled element (22) configured to be temperature-controlled and arranged so that the predominant proportion of the intensity of the thermal radiation (25.2) detected by the temperature recording device and reflected by reflection at the surface of the optical element is emitted by the temperature-controlled element. Also disclosed are an installation (1) for producing a surface (15) of an optical element (14) for semiconductor lithography and a method for producing a surface (15) of an optical element (14) of a projection exposure apparatus (30), wherein the surface is temperature-controlled and the surface temperature is detected during the temperature control.

Abstract: A method for determining the position of a part in an orthonormal frame of reference based on a structure of a numerically controlled machine tool to determine the trajectory of a tool for performing an operation on the part, the method including the steps of: holding the part in position on a fixed carrier inside an enclosure of the machine tool, so as to arrange a through-hole comprised in the part such that it faces a through-orifice included in the carrier, the hole opening out in its entirety inside the orifice, illuminating, using a light source, so as to emit light radiation from the carrier towards an optical measuring instrument arranged inside the enclosure of the machine tool, through the hole and the orifice, reading the part using the optical measuring instrument so as to determine the position of the part in the orthonormal frame of reference.

Abstract: An inspection system that include a selective deposition tool configured to receive a sample and selectively deposit a material onto the sample, an inspection tool configured to perform an inspection process on the sample provided with the deposited material, and an enclosure configured to enclose the selective deposition tool and the inspection tool.

Abstract: A method and a system for inspecting an extreme ultra violet mask and a mask pod for such masks is provided. An EUV mask inspection tool inspects a mask retrieved from a mask pod placed on the load port positioned exterior of the mask inspection tool. The inspection process is performed during a selected period of time. After the inspection process is initiated, a robotic handling mechanism such as a robotic arm or an AMHS picks up the mask pod and inspects the mask pod for foreign particles. A mask pod inspection tool determines whether the mask pod needs cleaning or replacing based on a selected swap criteria. The mask pod is retrieved from the mask pod inspection tool and placed on the load port before the selected period of time lapses. This method and system promotes a reduction in the overall time required for inspecting the mask and the mask pod.

Abstract: In embodiments of a digital lithography system, physical design data prepared at a data prep server in a hierarchical data structure. A leaf node comprises a repeater nod, comprising a bitmap image and a plurality of locations at which the bitmap appears in a physical design. At an EYE server, a repeater node bitmap is adjusted based upon, for example, spatial light modulator rotational adjustment and substrate distortion. The adjusted repeater node and the plurality of locations in which the adjusted repeater appears is compared to the repeater of the data prep server and its plurality of locations. In further embodiments, a rasterizer generates a checksum of bitmap to be printed to a substrate, from the EYE server bitmap. The checksum is compared to a checksum of the EYE server bitmap.

Abstract: A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system that includes a plurality of gas bearing devices. Each gas bearing device includes: a gas bearing body, which has a free surface, a primary channel which extends through the gas bearing body and has an inlet opening in the free surface, a secondary channel system which extends through the gas bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system is higher than the flow resistance in the primary channel.

Abstract: A mirror including a substrate (110), a reflection layer system (120), and at least one continuous piezoelectric layer (130, . . . ) arranged between the substrate and the layer system. An electric field producing a locally variable deformation is applied to the piezoelectric layer via a first, layer-system-side electrode arrangement and a second, substrate-side electrode arrangement. At least one of the electrode arrangements is assigned a mediator layer (170) setting an at least regionally continuous profile of the electrical potential along the respective electrode arrangement. The electrode arrangement to which the mediator layer is assigned has a plurality of electrodes (160, . . . ), each of which is configured to receive an electrical voltage relative to the respective other electrode arrangement. In the region that couples two respectively adjacent electrodes, the mediator layer is subdivided into a plurality of regions (171, . . . ) that are electrically insulated from one another.

Abstract: According to an embodiment, an optical inspection apparatus includes an imaging portion, a first wavelength selection portion, an illumination portion, and a second wavelength selection portion. The imaging portion includes an image sensor configured to capture a subject by light from the subject. The first wavelength selection portion is provided on an optical axis of the imaging portion and is configured to selectively pass a plurality of light components of predetermined wavelengths. The illumination portion is configured to illuminate the subject. The second wavelength selection portion is provided on an optical axis of the illumination portion and is configured to pass the plurality of light components of the predetermined wavelengths complementarily to the first wavelength selection portion.

Abstract: According to one or more embodiments of the disclosure, an alignment-overlay mark is provided. The alignment-overlay mark includes a pair of first marks and a plurality of second marks. The first marks extend in a first direction and are arranged in parallel to each other in a second direction. The second direction is perpendicular to the first direction. The second marks are between the first marks, extend in the second direction and are arranged in parallel to each other in the first direction.