Abstract: An image projection image for projecting an image on a screen includes a light source, a scanning mirror and a prism. The light source includes laser diodes for emitting beams of different wavelengths. The scanning mirror reflects the beams radiated from the light source and projects the reflected beams. The prism is disposed at the rear of the scanning mirror to decenter the beams via the scanning mirror based on the wavelengths. In the image projection apparatus, the laser diodes are fixed to be vertically spaced apart from a reference height, corresponding to the wavelengths of the beams.

Abstract: A projector includes a color wheel module and an optical engine. The color wheel module includes a rotation device, a mount, a color wheel, and an optical sensor. The color wheel is fixed on a rotary part of the rotation device. The rotation device and the optical sensor are fixed on the mount. The mount has an anti-dust structure includes a curved surface that is opposite to a rotary surface of the rotary part and extends in a rotation direction of the rotary part. The curved surface and the optical sensor are arranged sequentially in the rotation direction. Either by shortening a distance between the curved surface and the rotary surface or by a guiding slot that is disposed beside or lower than the curved surface, dust deposited on the optical sensor can be reduced effectively.

Abstract: An illumination device includes an irradiation device, a diffusing element, a first lens array, a second lens array and a deflecting element, which are arranged in this order along the light path. Diffused light that has entered a particular region on the diffusing element and has been diffused by the diffusing element, and diffused light that has entered a region, which differs from the particular region, on the diffusing element and has been diffused by the diffusing element, travel to regions which at least partly overlap each other. The diffusion angle of diffused light exiting the diffusing element is not more than the acceptable angle formed between two line segments LS extending from the principal point of a second unit lens of the second lens array to both ends of a first unit lens of the first lens array.

Abstract: A projection exposure apparatus (10) for microlithography has a measuring system (50) for measuring an optical element of the projection exposure apparatus. The measuring system (50) includes an irradiation device (54), which is configured to radiate measuring radiation (62) in different directions (64) onto the optical element (20), such that the measuring radiation (62) covers respective optical path lengths (68) within the optical element (20) for the different directions (64) of incidence, a detection device (56), which is configured to measure, for the respective directions (64) of incidence, the respective optical path lengths covered by the measuring radiation (62) in the optical element (20), and an evaluation device, which is configured to determine a spatially resolved distribution of refractive indices in the optical element (20) by computed-tomographic back projection of the respective measured path lengths with respect to the respective directions of incidence.

Abstract: A projector system including a projector unit and a control device. The projector unit includes: a projector; a change mechanism that changes a projection direction; a plurality of optical systems having different optical properties; and a switch mechanism that selects one of the optical systems. The control device includes: a change unit that controls the change mechanism; and a switch unit that causes the switch mechanism to place one of the optical systems to be used for the projector in conjunction with the changing of the projection direction of the projector which is caused by the change unit.

Abstract: The present invention discloses a stereoscopic 3d projection system that is based on elliptical polarization, and more specifically a time-multiplexed stereoscopic 3d projection system that enables the viewer to observe stereoscopic 3d images on the surface of a polarization-preserving projection-screen via utilization of passive elliptically-polarized viewing-glasses. The disclosed invention provides a stereoscopic 3d projection system that is capable of operating at higher frame-rates and/or with higher optical light efficiency as compared to other prior-art technologies that are instead based on circular polarization.

Abstract: An image projection apparatus includes an illumination device, an optical-path forming section, an image forming element, a projection optical section, and an optical component. The illumination device includes a fluorescence generator; a wavelength selector having a first area and a second area; and a polarization converter; and an optical-path switcher. The wavelength selector alternately sets the first area and the second area in an optical path of the first light in a temporal manner. The illumination device switches a first optical path and a second optical path based on a setting of the wavelength selector.

Abstract: A method of modifying a lithographic apparatus comprising an illumination system for providing a radiation beam, a support structure for supporting a patterning device to impart the radiation beam with a pattern in its cross-section, a first lens for projecting the radiation beam at the patterning device with a first magnification, a substrate table for holding a substrate, and a first projection system for projecting the patterned radiation beam at a target portion of the substrate with a second magnification. The first lens and the first projection system together provide a third magnification. The method comprises reducing by a first factor the first magnification to provide a second lens for projecting the radiation beam with a fourth magnification; and increasing by the first factor the second magnification to provide a second projection system for projecting the patterned radiation beam at the target portion of the substrate with a fifth magnification.

Abstract: An imaging optical unit for imaging an object field in an image field is disclosed. The imaging optical unit has an obscured pupil. This pupil has a center, through which a chief ray of a central field point passes. The imaging optical unit furthermore has a plurality of imaging optical components. A gravity center of a contiguous pupil obscuration region of the imaging optical unit lies decentrally in the pupil of the imaging optical unit.

Abstract: A light irradiation apparatus (31) includes a light source unit (40) and an irradiation optical system (5). In the light source unit, light source parts (4) arrayed in a plane emit laser light toward the irradiation optical system from different directions along the plane, and by the irradiation optical system, the laser light is guided along an optical axis (J1) to an irradiation plane (320). The irradiation optical system includes a division lens part (62), an optical path length difference generation part (61), and a condensing lens part (63). The division lens part includes element lenses (620) that divide light incident from the light source parts. The optical path length difference generation part includes transparent parts (610) having different optical path lengths from each other, and light that has passed through the element lenses respectively enters the transparent parts.

Abstract: An exposure apparatus includes a projection system having an optical element via which an exposure beam is projected; an immersion area forming member having an opening through which the exposure beam is projected, the immersion area forming member having a liquid supply inlet facing downward, a liquid recovery outlet facing downward, and a liquid supply port disposed between the liquid supply inlet and the liquid recovery outlet; a frame by which the projection system and the immersion area forming member are supported; a first vibration isolator by which transmission of vibration from the frame to the projection system is limited; and a second vibration isolator by which transmission of vibration from the immersion area forming member to the frame is limited. A liquid immersion area is formed, using the immersion area forming member, on a portion of an upper surface of a substrate, which is exposed to the exposure beam.

Abstract: Illumination optical unit for EUV projection lithography guides illumination light to an object field. The illumination optical unit has a first facet mirror, which comprises a multiplicity of individual mirrors which can be switched between at least two tilt positions. A second facet mirror of the illumination optical unit is arranged downstream of the first facet mirror in the beam path of the illumination light. The second facet mirror has a plurality of facets, which respectively contribute to imaging a group of the individual mirrors of the first facet mirror into the object field via a group mirror illumination channel. The images of the groups are superposed on one another in the object field. At least some of the individual mirrors belong to at least two different groups of the individual mirror groups, which are respectively associated with a dedicated second facet via a dedicated group mirror illumination channel.

Abstract: A laser light source module includes a plurality of unit laser light source modules, each of which emits laser light of one specific color, and when the laser light source module includes unit laser light source modules of at least two colors, and each unit laser light source module has a median of a temperature range in which a practical luminance is obtained, the unit laser light source modules are thermally connected to an evaporator and arrayed in descending sequence of their values of the median from an upstream side in a direction in which a refrigerant flows.

Abstract: A projector includes: first and second display panels and a projection unit that superposes images formed by the first and second display panels and that projects the superposed images on a projection surface. The first and second display panels are arranged such that the image formed by one display panel is projected to a position shifted by a predetermined distance in at least one of the row direction and column direction of the picture element array with respect to the position where the image formed by the other display panel is projected.

Abstract: An image generating unit includes a fixed member on which one of a driving magnet and a coil is provided; a heat radiating part on which the other of the driving magnet and the coil is provided; and an image generating part, to which the heat radiating part is attached, configured to receive illumination light to generate an image.

Abstract: An alignment system having long term stability in illumination center wavelength is discussed. The alignment system includes a tunable radiation source and a feedback control system. The tunable radiation source includes a light source configured to provide a broadband radiation beam and a tunable multi-passband filter configured to filter the broadband radiation beam into narrow band radiation beam having a center wavelength value. The feedback control system is configured to measure the center wavelength value of the narrow band radiation beam and compare the measured center wavelength value with a desired center wavelength value. The feedback control system is further configured to generate a control signal based on the comparison in response to a difference being present between the measured center wavelength value and the desired center wavelength value and tune the tunable filter based on the control signal to eliminate or substantially reduce the difference.

Abstract: A liquid immersion exposure apparatus includes a projection system having a last element and a liquid supply system by which an immersion liquid is supplied to form a liquid immersion area under the projection system. The liquid supply system has a first supply port and a second supply port. A position of the first supply port is different from a position of the second supply port, and the liquid supply system is capable of supplying the immersion liquid having a first temperature via the first supply port and supplying the immersion liquid having a second temperature different from the first temperature via the second supply port. The liquid immersion area is formed to cover only a portion of an upper surface of the substrate, and the substrate is exposed with an exposure beam through the immersion liquid in the liquid immersion area.

Abstract: The present disclosure relates to a method for calibrating a projector. The method includes projecting a test pattern onto a scene or an object within the scene and capturing the test pattern using a camera. Once the test pattern image has been captured by the camera, the method further includes estimating by a processing element a perspective projection matrix, warping the estimated projection matrix based on a non-linear distortion function, and modifying the projector to project light based on the distortion function. The present disclosure also relates to a presentation or projection system including two types of projectors for projecting an output presentation having a second image overlaid on a first image.

Abstract: An optical component comprises a mirror array having a multiplicity of mirror elements, which are each connected to at least one actuator for displacement, a multiplicity of signal lines for the signal-transmitting connection of the actuators to an external, global control/regulating device for predefining an absolute position of the individual mirror elements, and a multiplicity of local regulating devices for regulating the positioning of the mirror elements, wherein the regulating devices are in each case completely integrated into the component.

Abstract: A method for exposing a wafer substrate includes forming a reticle having a device pattern. A relative orientation between the device pattern and a mask field of an exposure tool is determined based on mask field utilization. The reticle is loaded on the exposure tool. The wafer substrate is rotated based on an orientation of the device pattern. Radiation is projected through the reticle onto the rotated wafer substrate by the exposure tool, thereby imaging the device pattern onto the rotated wafer substrate.