Patents Examined by Christina Riddle
  • Patent number: 11392043
    Abstract: A method of determining an estimated intensity of radiation scattered by a target illuminated by a radiation source, has the following steps: obtaining and training (402) a library REFLIB of wavelength-dependent reflectivity as a function of the wavelength, target structural parameters and angle of incidence R(?,?,x,y); determining (408) a wide-band library (W-BLIB) of integrals of wavelength-dependent reflectivity R of the target in a Jones framework over a range of radiation source wavelengths ?; training (TRN) (410) the wide-band library; and determining (412), using the trained wide-band library, an estimated intensity (INT) of radiation scattered by the target illuminated by the radiation source.
    Type: Grant
    Filed: August 13, 2019
    Date of Patent: July 19, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Seyed Iman Mossavat, Remco Dirks, Hendrik Jan Hidde Smilde
  • Patent number: 11392048
    Abstract: A liquid crystal exposure apparatus that irradiates a substrate held by a substrate holder which moves along an XY plane with an illumination light via an optical system while the substrate holder moves in the X-axis direction, has; a scale measured based on movement of the substrate holder in the X-axis direction, heads that measure the scale while relatively moving in the X-axis direction with respect to the scale, a plurality of scales arranged at mutually different positions in the X-axis direction measured based on movement of the substrate holder in the Y-axis direction, and a plurality of heads provided for each scale that measures the scales while relatively moving in the Y-axis direction with respect to the scales based on movement of the substrate in the Y-axis direction.
    Type: Grant
    Filed: February 21, 2020
    Date of Patent: July 19, 2022
    Assignee: NIKON CORPORATION
    Inventor: Akinori Shirato
  • Patent number: 11392044
    Abstract: A method, system and program for determining a position of a feature referenced to a substrate. The method includes measuring a position of the feature, receiving an intended placement of the feature and determining an estimate of a placement error based on knowledge of a relative position of a first reference feature referenced to a first layer on a substrate with respect to a second reference feature referenced to a second layer on a substrate. The updated position may be used to position the layer of the substrate having the feature, or another layer of the substrate, or another layer of another substrate.
    Type: Grant
    Filed: January 16, 2020
    Date of Patent: July 19, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Ralph Timotheus Huijgen, Marc Jurian Kea, Marcel Theodorus Maria Van Kessel, Masashi Ishibashi, Chi-Hsiang Fan, Hakki Erg√ľn Cekli, Youping Zhang, Maurits Van Der Schaar, Liping Ren
  • Patent number: 11392040
    Abstract: A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become a plasma and emit extreme ultraviolet radiation. The photolithography system senses contamination of a collector mirror by the tin droplets and adjusts the flow of a buffer fluid to reduce the contamination.
    Type: Grant
    Filed: March 5, 2021
    Date of Patent: July 19, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Tai-Yu Chen, Sagar Deepak Khivsara, Kuo-An Liu, Chieh Hsieh, Shang-Chieh Chien, Gwan-Sin Chang, Kai Tak Lam, Li-Jui Chen, Heng-Hsin Liu, Chung-Wei Wu, Zhiqiang Wu
  • Patent number: 11385554
    Abstract: Disclosed is a method of determining a characteristic of interest, in particular focus, relating to a structure on a substrate formed by a lithographic process, and an associated patterning device and lithographic system. The method comprises forming a modified substrate feature on the substrate using a corresponding modified reticle feature on a patterning device, the modified substrate feature being formed for a primary function other than metrology, more specifically for providing a support for a vertically integrated structure. The modified reticle feature is such that said modified substrate feature is formed with a geometry dependent on the characteristic of interest during formation. The modified substrate feature can be measured to determine said characteristic of interest.
    Type: Grant
    Filed: June 28, 2019
    Date of Patent: July 12, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Miguel Garcia Granda, Steven Erik Steen, Eric Jos Anton Brouwer, Bart Peter Bert Segers, Pierre-Yves Jerome Yvan Guittet, Frank Staals, Paulus Jacobus Maria Van Adrichem
  • Patent number: 11378892
    Abstract: Overlay-shift measurement systems are provided. An overlay-shift measurement system includes an optical device, a first light detection device and a processor. The optical device is configured to provide an input light to a metrology target of a semiconductor structure. The first light detection device is configured to receive a transmitted light from the metrology target when the input light penetrates the metrology target. The processor is configured to determine whether overlay-shift between a plurality of first photonic crystals and a plurality of second photonic crystals in the metrology target is present according to characteristics of the transmitted light.
    Type: Grant
    Filed: May 25, 2021
    Date of Patent: July 5, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yu-Ching Lee, Yu-Piao Fang
  • Patent number: 11372341
    Abstract: A method for temperature control of a component that is transferable between a first system and a second system includes: ascertaining a temperature drift of a temperature of the component that is to be expected after transfer of the component from the first system into the second system; and modifying a temperature prevailing in the first system and/or a temperature prevailing in the second system such that the temperature drift that is actually occurring after transfer of the component from the first system into the second system is reduced with respect to the expected temperature drift.
    Type: Grant
    Filed: May 27, 2021
    Date of Patent: June 28, 2022
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Joeri Lof, Harmen Krediet, Timo Laufer
  • Patent number: 11366383
    Abstract: The present invention refers to a method and an apparatus for determining positions of a plurality of pixels to be introduced into a substrate of a photolithographic mask by use of a laser system, wherein the pixels serve to at least partly correct one or more errors of the photolithographic mask. The method comprises the steps: (a) obtaining error data associated with the one or more errors; (b) obtaining first parameters of an illumination system, the first parameters determining an illumination of the photolithographic mask of the illumination system when processing a wafer by illuminating with the illumination system using the photolithographic mask; and (c) determining the positions of the plurality of pixels based on the error data and the first parameters.
    Type: Grant
    Filed: October 1, 2019
    Date of Patent: June 21, 2022
    Assignee: Carl Zeiss SMS Ltd.
    Inventors: Vladimir Dmitriev, Kujan Gorhad, Joachim Welte, Tanya Serzhanyuk
  • Patent number: 11360392
    Abstract: An illuminator includes a first facet mirror receiving and reflecting an exposure radiation, an adjustable shielding element disposed on the first facet mirror, the adjustable shielding element adjusting intensity uniformity of the exposure radiation reflected by the first facet mirror, and a second facet mirror receiving and reflecting the exposure radiation reflected by the first facet mirror.
    Type: Grant
    Filed: June 3, 2020
    Date of Patent: June 14, 2022
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Che-Chang Hsu, Chieh-Jen Cheng, Li-Jui Chen, Shang-Chieh Chien, Chao-Chen Chang, Ssu-Yu Chen
  • Patent number: 11360398
    Abstract: A metrology system includes a controller communicatively coupled to one or more metrology tools. In another embodiment, the controller includes one or more processors configured to execute program instructions causing the one or more processors to receive one or more overlay metrology measurements of one or more metrology targets of the metrology sample from the one or more metrology tools; determine tilt from the one or more measurement overlay measurements; and determine one or more correctables for at least one of one or more lithography tools or the one or more metrology tools to adjust for the tilt, where the one or more correctables are configured to reduce an amount of tilt in the sample or overlay inaccuracy of the one or more overlay metrology measurements. The program instructions further cause the one or more processors to predict tilt with a simulator based on at least the determined tilt.
    Type: Grant
    Filed: November 2, 2020
    Date of Patent: June 14, 2022
    Assignee: KLA Corporation
    Inventors: Roie Volkovich, Paul MacDonald, Ady Levy, Jincheng Pei, Jinyan Song, Amnon Manassen
  • Patent number: 11353801
    Abstract: A maintenance management method for a lithography system according to a viewpoint of the present disclosure includes organizing and saving operating information for each of lithography cells that are each an apparatus group formed of a set of apparatuses and form the lithography system, organizing and saving maintenance information on consumables for each of the lithography cells, calculating a standard maintenance timing for each of the consumables for each of the lithography cells based on the operating information and the maintenance information on the consumable for each of the lithography cells, creating a maintenance schedule plan for each of the lithography cells or for each of manufacturing lines based on the standard maintenance timing, information on a downtime, and information on a loss cost due to the downtime for each of the lithography cells or for each of the manufacturing lines, and outputting the result of the creation of the maintenance schedule plan.
    Type: Grant
    Filed: December 28, 2020
    Date of Patent: June 7, 2022
    Assignee: Gigaphoton Inc.
    Inventors: Kunihiko Abe, Yuji Minegishi, Osamu Wakabayashi
  • Patent number: 11353792
    Abstract: A substrate processing apparatus includes: a processing chamber configured to process a substrate; a light source chamber including a light source configured to irradiate vacuum ultraviolet light onto a surface of the substrate; a gas supply configured to supply an inert gas into the light source chamber; and a controller that controls the gas supply to maintain the light source chamber in an inert gas atmosphere.
    Type: Grant
    Filed: May 20, 2019
    Date of Patent: June 7, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Norihisa Koga
  • Patent number: 11353795
    Abstract: An optical apparatus, which illuminates a first area with light from a light source while the first area is longer in a second direction intersecting a first direction than in the first direction, includes a collector optical member which is arranged in an optical path between the light source and the first area, and condenses the light from the light source to form a second area in a predetermined plane, the second area being longer in a fourth direction intersecting a third direction than in the third direction; and a first fly's eye optical member which is provided within the predetermined plane including the second area, and has a plurality of first optical elements guiding the light of the collector optical member to the first area.
    Type: Grant
    Filed: September 28, 2020
    Date of Patent: June 7, 2022
    Assignee: NIKON CORPORATION
    Inventors: Hideki Komatsuda, Yoshio Kawabe
  • Patent number: 11340532
    Abstract: Degradation of the reflectivity of one or more reflective optical elements in a system (SO) for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber (26) containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.
    Type: Grant
    Filed: February 28, 2019
    Date of Patent: May 24, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Yue Ma, Antonius Theodorus Wilhelmus Kempen, Klaus Martin Hummler, Johannes Hubertus Josephina Moors, Jeroen Hubert Rommers, Hubertus Johannes Van De Wiel, Andrew David Laforge, Fernando Brizuela, Rob Carlo Wieggers, Umesh Prasad Gomes, Elena Nedanovska, Celal Korkmaz, Alexander Downn Kim, Rui Miguel Duarte Rodrigues Nunes, Hendrikus Alphonsus Ludovicus Van Dijck, William Peter Van Drent, Peter Gerardus Jonkers, Qiushi Zhu, Parham Yaghoobi, Jan Steven Christiaan Westerlaken, Martinus Hendrikus Antonius Leenders, Alexander Igorevich Ershov, Igor Vladimirovich Fomenkov, Fei Liu, Johannes Henricus Wilhelmus Jacobs, Alexey Sergeevich Kuznetsov
  • Patent number: 11327406
    Abstract: A method for estimating a parameter across a region on a substrate, the region being divided into a plurality of sub-regions, the method including: obtaining values of the parameter for at least two sub-regions out of the plurality of sub-regions; and estimating the parameter for a position on the region by evaluation of a function having said values of the parameter as input values, wherein the function: a) has piecewise defined base functions, wherein a single base function is defined across a sub-region; and b) is continuous between one or more adjacent sub-regions of the at least two sub-regions within the region.
    Type: Grant
    Filed: April 2, 2019
    Date of Patent: May 10, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Svetla Petrova Matova, Jochem Sebastiaan Wildenberg, Roy Werkman, Luc Roumen
  • Patent number: 11327404
    Abstract: An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.
    Type: Grant
    Filed: August 19, 2019
    Date of Patent: May 10, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Sjoerd Nicolaas Lambertus Donders, Bob Streefkerk, Martinus Hendrikus Antonius Leenders
  • Patent number: 11314174
    Abstract: Disclosed is a method of measuring focus performance of a lithographic apparatus, and corresponding patterning device and lithographic apparatus. The method comprises using the lithographic apparatus to print one or more first printed structures and second printed structures. The first printed structures are printed by illumination having a first non-telecentricity and the second printed structures being printed by illumination having a second non-telecentricity, different to said first non-telecentricity. A focus dependent parameter related to a focus-dependent positional shift between the first printed structures and the second printed structures on said substrate is measured and a measurement of focus performance based at least in part on the focus dependent parameter is derived therefrom.
    Type: Grant
    Filed: August 3, 2018
    Date of Patent: April 26, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Laurentius Cornelius De Winter, Roland Pieter Stolk, Frank Staals, Anton Bernhard Van Oosten, Paul Christiaan Hinnen, Marinus Jochemsen, Thomas Theeuwes, Eelco Van Setten
  • Patent number: 11314177
    Abstract: An optical arrangement for use in an optical imaging device includes an optical element unit and a detection device and/or an actuating device. The optical element unit includes at least one optical element. The detection device determines in a plurality of M degrees of freedom in each case a detection value which is representative of a relative position or orientation of an element reference of the optical element in relation to a primary reference of the detection device in the respective degree of freedom. The detection device includes a plurality of N detection units, each of which outputs a detection signal which is representative of a distance and/or a displacement of the detection unit in relation to a secondary reference assigned to the optical element and the respective detection unit.
    Type: Grant
    Filed: February 22, 2021
    Date of Patent: April 26, 2022
    Inventors: Jens Kugler, Bernhard Geuppert, Alexander Kharitonov
  • Patent number: 11307491
    Abstract: A mask, a mask assembly, an exposure machine, a method for testing shadowing effect on a window, and a photolithography method are provided. The mask includes a light transmission area; a functional window provided at a side of the light transmission area; and at least one of a first detection mark and a second detection mark; wherein the first detection mark is flushed with a border of the functional window adjacent to an interior of the mask; and the second detection mark is disposed between the profile of the light transmission area and the functional window.
    Type: Grant
    Filed: December 8, 2017
    Date of Patent: April 19, 2022
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
    Inventors: Jiabin Cui, Li Wang, Zhibin Li, Pengfei Liang, Chang Liu, Peng Chen
  • Patent number: 11304287
    Abstract: Extreme ultraviolet light source systems may include a chamber including a condensing mirror and having an intermediate focus, by which extreme ultraviolet light reflected from the condensing mirror is emitted along a first optical path, a blocking plate that may be on the chamber so as to intersect the first optical path and may include an opening through which the extreme ultraviolet light is emitted, a transparent cover on the blocking plate so as to cover the opening, a nozzle that may be between the chamber and the blocking plate so that an end portion faces the intermediate focus and may spray a first gas in a direction intersecting the first optical path, and an exhaust pipe between the chamber and the blocking plate so as to face the end portion of the nozzle.
    Type: Grant
    Filed: May 20, 2021
    Date of Patent: April 12, 2022
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sunghyup Kim, Myeongjun Gil, Yebin Nam, Sanghoon Lee, Injae Lee