Patents Examined by Christoper G. Young
  • Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same
    Patent number: 6969571
    Abstract: To provide an exposure method and an exposure apparatus, using a complementary divided mask, designed to enable alignment of a complementary divided mask at a high precision over the entire region of a semiconductor wafer. Further, to provide a semiconductor device fabricated by the exposure method and a method of producing a semiconductor device using the exposure method.
    Type: Grant
    Filed: November 29, 2002
    Date of Patent: November 29, 2005
    Assignee: Sony Corporation
    Inventors: Shinichiro Noudo, Kumiko Oguni, Hiroyuki Nakano, Hiroki Hane