Abstract: A photosensitive resin composition suitable for a water-developing type photosensitive resin plate as a patrix of a matrix for a rubber plate which comprises a basic nitrogen containing polyamide; a monomer having polymeric unsaturated bond; a compound of the formula (I): ##STR1## wherein R.sub.1 and R.sub.2 are the same or different and are hydrogen, alkyl, aryl or a derivative thereof; m and n are integers of 0 to 2 and the sum of m and n is 1 to 3; and M is an alkaline metal, an alkaline earth metal or a transition metal, and a N-nitrosoamine compound of the formula (II) of the formula: ##STR2## wherein R.sub.3 and R.sub.4 are the same or different and are halogen, hydroxyl, carboxyl, alkyl, cycloalkyl, optionally substituted aryl or acyl group; X and Y are carbonyl or --O--; and p and q are 1 or 0, or a salt thereof.