Patents Examined by Christopher G. Yaing
  • Method for producing and using a positive photoresist with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate
    Patent number: 5066561
    Abstract: The invention provides a method for producing a positive working photosensitive element with increased photospeed which comprises coating a formulation containing at least one novolak or polyvinyl phenol resin, at least one o-quinone diazide and a propylene glycol alkyl ether acetate on a substrate, drying, exposing to imaging energy and developing.
    Type: Grant
    Filed: March 28, 1990
    Date of Patent: November 19, 1991
    Assignee: Hoechst Celanese Corporation
    Inventor: Thomas R. Pampalone