Abstract: Methods and apparatus for depositing thin films of complex (compound) materials, including ferroelectrics, superconductors, and materials with high dielectric constants by photo/plasma-enhanced chemical vapor deposition from stabilized compound sources. Multiple heating and/or spectral energy sources are used for applying high energy, rapid thermal pulses in a precise timed sequence. Sol-gels of compound sources are ultrasonically atomized before being introduced to the deposition chamber.
Type:
Grant
Filed:
June 17, 1991
Date of Patent:
August 11, 1992
Assignee:
Symetrix Corporation
Inventors:
Larry D. McMillan, Carlos A. Paz de Araujo
Abstract: The respective ends of a heavy fabric, for example, a woven dryer fabric or felt each provided with an array of connectong loops are joined with the help of a gap closing device. The gap closing device is detachably attached to the fabric when the latter is supplied to the user. When the fabric is being installed on the machine, the ends are pulled together by the gap closing device so that the arrays of loops are held in proximity and easily intermeshed to form an elongated tubular passage. A pintle wire is inserted into the passage to complete the joint. The gap closing device is then removed. A preferred gap closing device is a slide fastener, of which one tape is detachably attached to each end of the heavy fabric.
Abstract: Lock for a safety belt with a push-button and a slide in tongue arrangement, wherein the push-button cooperates with a guide part and they are formed of two separate elements, each provided with an inclined face.