Abstract: According to a method for improving digital images, an input image is digitized and represented by pixels, each pixel including three original color components represented by gray level values. The average gray level value for a first color is calculated to obtain a first color adjustment factor. A second color adjustment factor and a third color adjustment factor are calculated based on the first color adjustment factor, and the gray level values for the second color and the third color of all pixels are adjusted accordingly to obtain an image with emphasized first color components.

Abstract: A method and system thereof for encoding and embedding information within digital data representing, for example, audio data, image data, and video data. The information is represented by a plurality of bits which are separated into a group of input bits and a group of pointer bits. One or more output bits are generated from an input bit using a convolutional code. A sequence of bits is selected using a pointer bit and the output bit(s). The information is encoded and embedded into the digital data by modifying coefficients of the digital data according to the sequence of bits selected. Each bit of the sequence of bits selected is used to modify a respective coefficient. In one embodiment, a coefficient is made into an even number when the bit has a first value and the coefficient is made into an odd number when the bit has a second value. In one embodiment, the digital data are in a compressed format.

Abstract: A method of correction of a mask pattern in which the mask pattern of a photomask to be used in a photolithographic step is deformed so that a transfer image near a desired design pattern is obtained, including an evaluation point arrangement step for arranging a plurality of evaluation points along an outer periphery of the desired design pattern; a simulation step for simulating the transfer image to be obtained where exposure is carried out under predetermined transfer conditions by using a photomask of a design pattern given the evaluation points; a comparison step for comparing a difference between the simulated transfer image and the design pattern for every evaluation point; and a deformation step for deforming the design pattern according to the difference compared for every evaluation point so that the difference becomes smaller and a correction apparatus for the same.

Abstract: A method of correction of a mask pattern in which the mask pattern of a photomask to be used in a photolithographic step is deformed so that a transfer image near a desired design pattern is obtained, including an evaluation point arrangement step for arranging a plurality of evaluation points along an outer periphery of the desired design pattern; a simulation step for simulating the transfer image to be obtained where exposure is carried out under predetermined transfer conditions by using a photomask of a design pattern given the evaluation points; a comparison step for comparing a difference between the simulated transfer image and the design pattern for every evaluation point; and a deformation step for deforming the design pattern according to the difference compared for every evaluation point so that the difference becomes smaller and a correction apparatus for the same.