Abstract: A semiconductor light exposure apparatus includes an excitation light source, a light beam generating device, a controller and a contracting optical system. The light beam generating device generates a fundamental wavelength laser light beam when excited by a light beam from the excitation light source, and wavelength-converts the fundamental wavelength laser light beam into a second harmonics laser light beam by a first resonator having a first non-linear optical crystal element while also converting the second harmonics laser light beam into a second harmonics laser light beam by a second resonator having a second non-linear optical crystal element. The controller controls an output of the excitation light source in order to control an output of the fourth-order harmonics laser light beam from the light beam generating device. The contracting optical system projects a pattern in a contracted size on a wafer by the fourth-order harmonics laser light beam outputted from the optical beam generating device.

Abstract: An illumination system for use in photolithography using a laser or radiation beam source. A deformable mirror is used to shape the beam of laser radiation to obtain global uniformity. A profile sensing means is used to detect any global non-uniformities. The output of this sensing means is fed to a controller for calculating a mirror contour and controlling actuators that shape the deformable mirror to obtain a globally uniform intensity. A diffractive or diffusive optical element, such as a microlens array, eliminates local non-uniformities. Movement of this element eliminates speckle caused by interference due to the coherent beam source. A uniform intensity profile and appropriate angular spread is achieved with very little transmission loss and is automatically compensated for degraded or changing source performance. The illumination system is particularly applicable to a scanning photolithography process as used in the manufacture of semiconductor substrates.

Abstract: A projection exposure apparatus having an illuminating system for irradiating a mask, which has a pattern, with illuminating light for exposure, and a projection optical system for projecting an image of the mask pattern onto a photosensitive substrate with predetermined image-forming characteristics under the illuminating light. The apparatus is provided with an optical filter changing member for selecting one of a plurality of optical filters that change at least one of optical characteristics of light from the mask by respective amounts which are different from each other. The optical characteristics include an amplitude distribution, a phase distribution and a condition of polarization. The optical filter changing member further disposes the selected optical filter on a pupil plane in the projection optical system or on a plane in the neighborhood of the pupil plane.

Abstract: A pattern exposure method including the steps of irradiating a mask or reticle having a desired original pattern written thereon with light with a desired directivity from an illuminating light source for exposure, and projecting a transmitted or reflected light from said mask to an object to be exposed through a projection optical system, wherein a pattern-dependent polarizing mask for giving polarization characteristics in compliance with the direction of the pattern on the mask to the illuminating light transmitted through the pattern; and a pattern exposure apparatus including a illuminating light for exposure, a mask or a reticle, an illumination optical system for irradiating the mask with light emitted from the light source, and a projection optical system for projecting the transmitted or reflected light from the mask onto the object to be exposed, further including polarizing unit for polarizing the illuminating light on the pupil of the projection optical system so as to be nearly rotationally symme

Abstract: A scan type exposure apparatus has a mask stage for mounting a mask formed with an exposure pattern in a pattern area; a substrate stage for mounting a rectangular photosensitive substrate; a driving unit for moving the mask stage and the substrate stage in synchronism parallel to one side of the rectangular photosensitive substrate; illumination optical systems for illuminating partial areas of the mask with light beams; and projection optical systems for projecting images of the illuminated areas of the mask onto the photosensitive substrate. The projection optical system projects the light beams passing through the exposure pattern area of the illuminated mask on a central area, excluding peripheral areas, of an exposure area of the photosensitive substrate and projects the light beams passing through an area other than the exposure pattern area of the illuminated mask on the peripheral areas.

Abstract: A digital exposure device which performs the exposure to a dot pattern of light comprises:scanner 6 for reading density of each dot in the dot pattern on the photosensitive material exposed to predetermined pattern of test image;a correction circuit 74 for comparing the read density of each dot and the density of a pattern of test image and for delivering a correction data; anda converter circuit 72 for converting the conversion condition according to the correction data.

Abstract: The photographic copying apparatus comprises a first exposure arrangement for exposure of photographic negative and positive copy masters and a second exposure arrangement for exposure of screen copy masters onto photographic copy material. The second exposure arrangement includes a cathode ray tube with control system. The cathode ray tube is arranged at approximately a right angle with respect to the exposure light path of the first exposure arrangement. The second exposure arrangement further comprises a color filter assembly, an objective and a mirror for directing the screen copy master emitted by the cathode ray tube to the photographic copy material. The color filter assembly, the objective and the mirror are combined as a structural unit to constitute an imaging optical system, which can be positioned into the exposure light path instead of an reproduction objective of the first exposure arrangement.

Abstract: A photographic exposure apparatus has a light path for directing an optical pattern of a display image from an image display to a photosensitive material and a light path for directing an optical pattern of a negative image from a negative film of the photosensitive material. The two light paths are selectively switched from one to the other to project each of the display and negative images onto the photosensitive material at a common exposure station. A mirror is disposed turnably to be movable across and between the two light paths. A mirror drive turns the mirror through a predetermined angle to switch between the light path for projecting the display image and the light path for projecting the negative image.

Abstract: A support system for a paper magazine has a support surface adjacent to a paper feed box. An upper paper guide and a lower paper guide are arranged over the support surface before a paper inlet of the paper feeder box. A pair of magazine guides are mounted on the support surface 3 for guiding both sides of the paper magazine during loading thereof. A lock cam can engage with and disengage from a cam engaging projection of the paper magazine, and is urged by the force of a spring to press the cam engaging projection towards the paper feeder box. A lever holding mechanism holds the lock cam in its unlocked position after a return movement of a swing arm is completed.

Abstract: A lens supporting assembly for use in a photoprinting machine can position a varifocal lens with high accuracy over a long period time. A lens plate carrying a varifocal lens has bent portions along both side edges and is formed with a plurality of positioning holes. A lens support table has positioning pins adapted to be engaged in the positioning holes. It is further provided with first magnets for attracting the bottom of the lens plate and a second magnet for attracting one of the bent portions. By lowering the lens plate onto the lens support table, the positioning pins engage in the positioning holes, so that the varifocal lens can be set in position with high accuracy. In this state, the first magnets attract the bottom of the lens plate, while the second magnet attracts the bent portion, so that the varifocal lens can be stably held in position.

Abstract: A photographic printing apparatus includes a lens unit and a lens mount which are joined to each other in a separable manner. The lens mount includes therein a drive motor and a drive force transmitting mechanism to adjust the focal distance and aperture of the lens unit. A plurality of lens units having different focal distances are provided, from which a lens unit suitable for a printing magnification is automatically selected for printing. Each lens unit is provided with external connection members which are connected to an aperture adjusting mechanism and the focal distance adjusting mechanism of the lens unit. The lens mount to which the lens unit is attached is provided with members which are engaged with the external connection members of the lens unit to displace them. The displacement of these members is effected by motors provided on the lens mount. With this structure, the cost of lens units can be reduced, and the efficiency of the printing operation can be increased.

Abstract: A spatial filter used in a reduction-type projection printing apparatus includes a central region through which a light beam passes at transmittance of at most a prescribed value, a substantially transparent peripheral region which surrounds the central region, and a phase shifter for producing phase difference of 180.degree. between light beams passing through the central region and the peripheral region.

Abstract: An exposure slit is provided for a shuttle style film gate in a film transport. The exposure slit is provided on a plate that is mounted to the film gate shuttle. After the shuttle advances a frame of the film, it carries the slit with it during its return to a home position. Exposure of the film frame is made through the slit during the return travel.

Abstract: An exposure system for creating a single frame transparency having an enlarger rack with a transparency fixture including a light obscuring exposure mask and a multi axial table for relative movement therebetween during an exposure process which results in a single transparency having four independent images, each of the images having spaced apart groups of pixels interlaced with the groups of pixels from each of the other images, each of the images being selectable for projection by a movable grid mask. A method for preparing multiple images from a single transparency is also disclosed. The transparency is formed by sequentially exposing portions of a sheet of film overlayed by a gridlike mask, and correspondingly repositioning the film after each exposure such that a new interlaced area of film is exposed.

Abstract: In a photographic printer including a print-exposing device having a light source and a light controlling filter, an image recorded onto a film is printed on a photosensitive material by irradiating, onto the photosensitive material, light emitted from the light source and transmitted through the light controlling filter and the film. The light transmitted through the light controlling filter and the film is incident upon a photometric device, and the photometric device photometrically measures the image recorded on the film. The quantity of light incident upon the photometric device is controlled by a control device so as to reduce the quantity of light to a quantity of light which is lower than a quantity of light when printing exposure is carried out, in a case in which printing exposure by said print-exposing device is suspended for a time longer than a predetermined time.

Abstract: A projection exposure apparatus can correct focal point movement caused by an environmental change, such as a change in temperature or atmospheric pressure, during an operation, while minimizing occurrence of a new aberration such as a spherical aberration caused by focus correction. The projection exposure apparatus of this invention exposes a mask pattern on a photosensitive substrate via a projection optical system. The projection optical system includes a refraction or reflection type optical member, and a diffraction type correction optical member. The correction optical member has focal position movement with an environmental change during an operation in a direction opposite to the direction of focal position movement of the optical member with the environmental change during the operation.

Abstract: In a projection exposure method of irradiating illumination light from an illumination light source onto a photomask made of a transparent substrate with a periodic mask pattern, and projecting the resultant transmitted light from the photomask on a wafer through a projection system, thereby forming an optical image of the mask pattern on the wafer, projection/exposure with respect to the wafer is performed by a main exposure operation and a sub-exposure operation to be performed after the main exposure operation. The main exposure operation is performed by irradiating the photomask with the illumination light whose coherency becomes 0.3 or less when a period L of the mask pattern on the image plane of the optical system is not more than a value obtained by doubling an exposure wavelength .lambda. of the illumination light source, and dividing the resultant value by a numerical aperture of the projection system.

Abstract: A wedge shaped platen scanner sequentially records opposing pages of a bound document positioned thereon using a single imaging station. A mirror is positioned between the wedges of the platen. A controller positions the mirror in one of two operational positions. In the first operational position, the mirror is positioned so that light emitted by a lamp reflects off of the mirror and onto the single imaging station. In the second operational position, the mirror is moved out of the imaging station's optical path. In each operational position, the lamp sequentially illuminates an opposing page of the bound document with each of the three primary colors: red green, and blue. In both the first and the second operational positions, images of opposing pages of the bound document are focused with optics onto the imaging station. In one arrangement, the imaging station is a two-dimensional array of detectors which sense an image of a page of the bound document projected thereon.

Abstract: An illumination system for use in photolithography having an array optical element near the formation of a desired illumination field. Light or electromagnetic radiation from an illumination source is expanded and received by a multi-image optical element forming a plurality of secondary illumination sources in a plane. A condenser receives the light from the plurality of illumination sources. A array or diffractive optical element is placed on or near the focal point of the condenser. The illumination plane formed at the focal point of the condenser is within the near field diffraction pattern of the array or diffractive optical element. There is no condenser following the array or diffractive optical element.

Abstract: A photographic printing apparatus includes a first and second magazines for storing a roll-shaped photographic light-sensitive material therein respectively, a first and second draw-out members each for drawing out the material from the first or second magazine at a first or second draw-out position, a first and second cutters for cutting the materials drawn out from the first and second draw-out members respectively, an accepting device for accepting and holding the materials drawn out from the first draw-out member at an exposure position, and a driving device for driving the accepting device from the first draw-out position to the second draw-out position. The driving device drives the accepting device which has held the material drawn out by the second draw-out member at the second draw-out position, from the second draw-out position to the first draw-out position so as to hold the material at the exposure position.