Patents Examined by David A. Vmore
  • Patent number: 7332730
    Abstract: A device and a method for imaging and positioning a multiparticle beam on a substrate is disclosed. The device comprises a particle beam source with a condenser optic that produces a particle beam that illuminates the surface of an aperture plate. A multiplicity of individual beams are produced from the particle beam by means of the aperture plate, which are then projected by a projection system onto a substrate where they describe a beam base point. The substrate or target, respectively, is placed on a table that is movable along an x-coordinate and a y-coordinate, and that is provided with a laser path measurement system.
    Type: Grant
    Filed: November 9, 2005
    Date of Patent: February 19, 2008
    Assignee: Leica Microsystems Lithography GmbH
    Inventors: Joachim Heinitz, Andreas Schubert