Patents Examined by Davis P. Malley
  • Exposure method and apparatus
    Patent number: 5499076
    Abstract: Disclosed is an exposure method and apparatus for exposing a substrate by use of a pattern having a phase shift device, wherein the amount of phase shift with the phase shift device can be changed by changing the humidity of an ambient gas of the pattern.
    Type: Grant
    Filed: May 25, 1995
    Date of Patent: March 12, 1996
    Assignee: Canon Kabushiki Kaisha
    Inventor: Masato Muraki