Patents Examined by Dorothy Bell
  • Multi-beam shaped beam lithography system
    Patent number: 6614035
    Abstract: A multi-beam shaped-beam electron beam lithography system employs conventional lenses and magnetic deflectors, with an array of lithographically fabricated electrodes disposed about a central axis to simultaneously and independently deflect electron beams in beamlet exposure ranges separated transversely from one another within a subfield, so that subfields overlap.
    Type: Grant
    Filed: January 30, 2002
    Date of Patent: September 2, 2003
    Assignee: International Business Machines Corporation
    Inventor: John G. Hartley