Abstract: A system and method for removing both carbon-based contaminants and oxygen-based contaminants from a semiconductor substrate within a single process chamber is disclosed. The invention may comprise utilization of remote plasma units and multiple gas sources to perform the process within the single process chamber.

Abstract: The present invention relates to an aqueous ozone floor disinfection system. A floor cleaning machine traverses a floor surface entering a pre-hygienic zone prior to cleaning, cleaning within a midst-hygienic zone for a cleaning period, and moving away from the midst-hygienic zone creating a post-hygienic zone. An aqueous ozone generator receives water and generates an ozonated concentrate liquid. A post-hygienic mixer ratiometrically blends the ozonated concentrate liquid and water to form a post-hygienic ozone disinfection solution having a predetermined post-hygienic ozone treatment concentration. A post-hygienic nozzle spray of the post-hygienic ozone disinfection solution onto the post-hygienic zone portion of the floor surface for at least the post-hygienic treatment time absent agitation or removal by the floor cleaning machine improving disinfection of the floor surface. The service life of the aqueous ozone generator can be tracked and the disinfected floor surface can be GPS geofenced.

Abstract: A multipurpose cleaning tool device is disclosed and described having a tool housing that includes an elongate handle sized to be held by a user when in use, a cleaning head coupled to one end of the elongate handle, a first cleaning material coupled to and extending away from a bottom surface of the cleaning head such that the first cleaning material defines a first surface cleaning interface, and a channel extending through the tool housing from a top surface of the tool housing to a bottom surface of the tool housing in a transverse direction to the first surface cleaning interface. The channel includes opposing layers of a second cleaning material positioned within the channel defining a second surface cleaning surface transversely oriented with respect to the first cleaning surface interface.

Abstract: A cleaning base used for laundry treatment is provided. The cleaning base includes a bottom frame and a water inlet pipeline. A cleaning portion, and a cleaning cavity for containing a ground cleaning device are formed in the base. The cleaning portion is used for cleaning at least part of the ground cleaning device. The water inlet pipeline is in communication with the cleaning portion and a tap water source. Since the water inlet pipeline is in communication with the tap water source, it is not necessary to provide a water storage structure having a large structural size for the cleaning base. The overall structural size of the cleaning base is reduced. The tap water source can continuously supply water to a cleaning tank. Thus, a user does not need to manually add water to the water storage structure.

Abstract: A system includes a pipe for transporting one or more fluids, the pipe including a scale deposit formed on an inner circumferential surface thereof and defining a reduced diameter flow area within the pipe, and a hybrid descaling tool sized to be received within the pipe. The hybrid descaling tool includes a laser head comprising a hollow cylindrical body with an internal, ring-shaped laser path, the laser head operable to emit a ring-shaped laser beam through the ring-shaped laser path, and an acid nozzle protruding forward from the hollow cylindrical body of the laser head and into the reduced diameter flow area, the acid nozzle including one or more acid outlets within the reduced diameter flow area.

Abstract: A side of a semiconductor wafer is cleaned in the following order: (1) executing a first cleaning step, cleaning with ozonized water, and a subsequent rinsing step, rinsing with purified water; (2) executing a second cleaning step, which includes, executing a first treatment step, including treating with ozonized water, which is followed by executing a second treatment step, treating with a hydrogen fluoride (HF)-containing liquid, where the second cleaning step may be repeated multiply; (3) executing a third cleaning step, cleaning with ozonized water, and executing a subsequent rinsing step, rinsing with purified water; and (4) executing a drying step. A preliminary cleaning step, which includes cleaning the side of the semiconductor with water, is executed directly before the first cleaning step so that the side of the semiconductor wafer is still wet while the first cleaning step commences.

Abstract: A method for controlling a mobile, self-propelled appliance, in particular a floor cleaning appliance such as a robot vacuum cleaner and/or a sweeper and mopping robot so as to mop up an accumulation of liquid, includes driving on a floor surface intended for cleaning in a direction of travel in a forward movement of the appliance and cleaning the floor surface by using a dry cleaning module and/or a wet cleaning module of the appliance. The accumulation of liquid is detected in the direction of travel in front of the appliance in a moist area. The forward movement in front of the moist area is terminated and the appliance is rotated about substantially 180°. Driving on the moist area in a reversing movement in the direction of travel of the appliance and mopping up the accumulation of liquid using the wet cleaning module is carried out.

Abstract: A method of cleaning a contaminated surface, such as cleaning the elongate interior lumen of an endoscope contaminated with flesh, bone, blood, mucous, faeces or biofilm, said method comprising the steps of: providing a suspension of solid particles in a liquid to said contaminated surface, and flowing said suspension along said surface thereby to remove contaminant from the surface. The suspension is preferably an ice slurry, where the solid material is ice crystals. The slurry preferably has a solid fraction between 50-85% by volume. A freezing point depressant may be present.

Abstract: A cleaning head for a cleaning system for use in cleaning a fluid conduit for transporting hydrocarbons and/or a fluid conduit in a hydrocarbon wellbore, comprises a body defining an outer surface having a cross-section which is configured to match, or be comparable to, a cross-section of an inner surface of the fluid conduit. The body defines a jetting fluid flow path extending from a jetting fluid input port to a jetting fluid output port, and wherein the body defines a bypass fluid flow path extending from a bypass fluid input port to a bypass fluid output port, the bypass fluid flow path being separate from the jetting fluid flow path. The cleaning head comprises a jetting head defining one or more jetting apertures, wherein the jetting head is coupled to the jetting fluid output port so that the one or more jetting apertures are in fluid flow communication with the jetting fluid flow path.

Abstract: Systems and methods for redirecting cleaning chemistry flows within a multi-station semiconductor processing chamber are disclosed. In such systems, a cleaning chemistry flow, e.g., a plasma from a remote plasma generator, may be directed onto a hub of an indexer that is centrally mounted within the chamber. The hub may have features that cause the cleaning chemistry flows to be redirected in a radially outward direction. By rotating the hub and/or changing the relative elevational positions between the hub and a cleaning chemistry inlet that provides the cleaning chemistry, the cleaning chemistry may be redirected into different regions of the chamber, thereby allowing for a more thorough and complete cleaning process.

Abstract: Disclosed herein are apparatuses, systems, and methods for cleaning an exercise mat. The system includes multiple roller pairs configured to transport that mat through cleaning, rising, drying and disinfection stations. Operations defined by logic include spraying cleaning and rinsing solutions onto both side of the mat, simultaneously. Subsequent operations include removing the rinsing solution from mat via air knives and disinfecting the mat via UV light. Sensors detect the presence of the mat at a number of locations within the apparatus and the logic activates and deactivates multiple subsystems based sensor signals. Adjustable spacing between rollers accounts for different mat thicknesses. Volume sensors detect the volume of a solutions within supply containers.

Abstract: A dishwasher (100) and a method for treating washware, where the dishwasher (100) comprises a washing cavity (110) configured to receive washware (200), a rack (120) removably inserted in the washing cavity (110), and a washware recognition system (300) configured to detect a washware characteristics (310) for each washware (200) in the washing cavity (110). The washware recognition system (300) comprises two image capturing devices (320, 330) capturing at least one first, second and third image (321, 331, 332) of the washware in the rack (120), a neural network (340) configured to, based on the at least one first (321), second (331) and third images (332), determine a washware characteristics (310), and a control unit (360) configured to evaluate the washware characteristics (310) and determine a washware treatment cycle (350) based on the washware characteristics (310).

Abstract: The present invention relates to a system (100) for automatically processing an additively manufactured part. The system comprises an inspection module (120) for determining at least one part parameter associated with a surface finish quality of the part, a processing module (118) for processing a surface of the part responsive to the at least one part parameter and controller (102) configured to modify a processing parameter of a surface finishing process, performed by the processing module, based on the at least one part parameter determined by the inspection module.

Abstract: The present invention includes a liquid film formation step of supplying a processing liquid in which a sublimation drying processing agent obtained by mixing a first sublimable substance and a second sublimable substance which are different from each other in a eutectic composition or a near-eutectic composition is liquefied, onto a front surface of a substrate on which a pattern is formed, to thereby form a liquid film of the processing liquid on the front surface of the substrate, a solidified film formation step of solidifying the liquid film of the processing liquid, to thereby form a solidified film of the sublimation drying processing agent, and a sublimation step of sublimating the solidified film, to thereby remove the solidified film from the front surface of the substrate.

Abstract: The invention concerns a household appliance, the household appliance comprising: a washing chamber for washing of items to be cleaned; a water system configured to feed water to and from the washing chamber for cleaning and/or rinsing of the items therein; wherein the water system comprises a UV-treatment chamber for disinfection and/or sterilization of water to be fed to the washing chamber during operation of the household appliance, wherein the UV-treatment chamber is provided with at least a first UV-light source arranged to direct UV-light towards water present in the UV-treatment chamber. The UV-treatment chamber is further provided with at least a first UV-light reflector. The invention also concerns a method for operating a household appliance.

Abstract: Embodiments of the disclosure include an apparatus and method of cleaning a substrate. The disclosure describes a method of cleaning a substrate includes supplying a gas at a gas temperature and a gas mass flow rate to a nozzle. The method also includes supplying a liquid at a liquid temperature and a liquid mass flow rate to the nozzle. The method also includes mixing the gas with the liquid in the nozzle to form a fluid mixture having a mixture temperature of not more than about 10° C. below the liquid temperature. The method also includes spraying the fluid mixture onto a surface of the substrate through an orifice in the nozzle.

Abstract: A handheld vacuum cleaner has a body with a handle, a nozzle assembly connected with the body via a suction pipe, and two or more rotating brush rollers for cleaning a surface. An input unit provides data for assisting a movement of the nozzle assembly. Two or more electric motors connected to the brush rollers are driven by a control unit in a clockwise or counter-clockwise direction. The input unit is arranged in the nozzle assembly and provided with an inertial measurement unit sensor that is configured to measure an accelerations along XY-axes and an angle of rotation around the Z-axis that is perpendicular to the cleaned surface. The control unit receives data from the input unit to drive the motors according to the measured accelerations along XY-axes and the angle of rotation about the Z-axis for assisting movement of the nozzle assembly in one or more predetermined directions.

Abstract: The beverage appliance of the present invention includes a venturi having a steam inlet and a milk inlet. The steam inlet and milk inlet each include a solenoid valve configurable between an open state and a closed state. The solenoid valves are electrically coupled to a processor and are controllable through first and second switches. In operation, upon activation of the first switch, the solenoid valves are controlled to their open states to deliver milk and steam to the venturi to produce frothed milk. When a desired amount of frothed milk has been dispensed, the user deactivates the first switch and the processor controls only the milk inlet solenoid valve to its closed state. The steam inlet solenoid valve remains in its open state for a predetermined amount of time such that a burst of steam only is forced through the venturi and distribution lines to purge them of milk.

Abstract: A post CMP cleaning apparatus is provided. The post CMP cleaning apparatus includes a cleaning stage. The post CMP cleaning apparatus also includes a rotating platen disposed in the cleaning stage, and the rotating platen is configured to hold and rotate a semiconductor wafer. The post CMP cleaning apparatus further includes a vibrating device disposed over the rotating platen. The post CMP cleaning apparatus further includes a solution delivery module disposed near the vibrating device and configured to deliver a cleaning fluid to the semiconductor wafer. The vibrating device is configured to provide the cleaning fluid with a specific frequency which is at least greater than 100 MHz while the rotating platen is rotating the semiconductor wafer, so that particles on the semiconductor wafer are removed by the cleaning fluid.

Abstract: A pig drive, a pig drive system for feeding a pig into a pig kicker section of a pipe, and a method for feeding the pig into the pig kicker section of the pipe are disclosed. The pig drive includes: a piston with a radial direction and an axial direction; a rod connected to the piston and extending in the axial direction of the piston, wherein the rod has a distal end adapted to interface the pig; a retainer slidably connected to the rod and adapted to interface a retainer abutment; and a biasing device arranged to bias the retainer towards the distal end of the rod.