Abstract: Methods, apparatuses, and systems related to an apparatus with an alignment moat are described. An example apparatus includes a conductive material divided into first and second portions which include top surfaces connected to each other, respectively, a first spacer surrounding the first portion of the conductive material, and a second spacer surrounding the second portion of the conductive material, where the top surface of the first spacer and the top surface of the second spacer are indented from the top surface of the first portion and the top surface of the second portion, respectively, to define an alignment moat.

Abstract: A preparation method for a semiconductor structure and a semiconductor structure are provided. Herein, the preparation method comprises: providing a structure to be processed, wherein the structure to be processed comprises a substrate, and an etching target layer, a bottom mask layer and a first mask layer stacked on the substrate; patterning the first mask layer to form a first pattern, the first pattern exposing parts of the bottom mask layer; forming spacers with vertical sidewall morphology on sidewalls of the first mask layer; removing the first mask layer; filling a gap between the spacers with a filling layer, in which a material of the spacers to a material of the filling layer has a high etching selectivity ratio; and removing the spacers.

Abstract: According to one embodiment, a method for manufacturing a semiconductor device includes placing a semiconductor chip on a first surface of a support substrate, forming a first resin layer covering the semiconductor chip on the first surface, and forming a second resin layer on a second surface of the support substrate. The second surface is opposite the first surface. In some examples, the second resin layer can be formed to counteract or mitigate warpage of the support substrate that might otherwise result from use of the first resin layer.

Abstract: A semiconductor package includes a package substrate; semiconductor devices disposed on the package substrate; a package ring disposed on a perimeter of package substrate surrounding the semiconductor devices; a cover disposed over the package ring and the semiconductor devices; a cover adhesive bonding the cover to the package ring; and a stress-reduction structure including first channels formed in an upper surface of the package ring and second channels formed in a lower surface of a portion of the cover that overlaps with the first channels.

Abstract: In an embodiment of the present disclosure, a wiring base includes an insulative base, a signal conductor, a first lead terminal, a first ground conductor, and a second lead terminal. The insulative base includes a first face and a second face. The signal conductor is provided on the first face. The first lead terminal is provided on the signal conductor. The first lead terminal extends in a first direction and includes a portion projecting from the insulative base in plan view toward the first face. The first ground conductor is provided on the second face. The second lead terminal is provided on the first ground conductor. At least a part of the second lead terminal overlaps the first lead terminal in the plan view toward the first face.

Abstract: Semiconductor devices and methods are provided. In an embodiment, a method includes providing a workpiece including a first hard mask layer on a top surface of a substrate, performing an ion implantation process to form a doped region in the substrate, after the performing of the ion implantation process, annealing the workpiece at temperature T1. The method also includes selectively removing the first hard mask layer, after the selectively removing of the first hard mask layer, performing a pre-bake process at temperature T2, and, after the performing of the pre-bake process, epitaxially growing a vertical stack of alternating channel layers and sacrificial layers on the substrate, where the temperature T2 is lower than the temperature T1.

Abstract: A molded semiconductor package includes: a mold compound; a metal substrate partly embedded in the mold compound; at least one first metal lead partly embedded in the mold compound; an inlay embedded in the mold compound, the inlay comprising a semiconductor die embedded in an electrically insulating body, a first metal structure attached to a first side of the semiconductor die, and a second metal structure attached to a second side of the semiconductor die; and a metal clip at least partly embedded in the mold compound and connecting the second metal structure to the at least one first metal lead. The semiconductor die has a maximum junction temperature higher than a glass transition temperature of the mold compound, the electrically insulating body has a glass transition temperature at or above the maximum junction temperature of the semiconductor die, and the metal substrate is attached to the first metal structure.

Abstract: A method for forming spacers of a gate of a transistor is provided, including: providing an active layer surmounted by a gate; forming a dielectric layer covering the gate and the active layer, the dielectric layer having lateral portions, and basal portions covering the active layer; anisotropically modifying the basal portions by implantation of hydrogen-based ions in a direction parallel to the lateral sides of the gate, forming modified basal portions; annealing desorbing the hydrogen from the active layer and transforming the modified basal portions into second modified basal portions; and removing the modified basal portions by selective etching of the modified dielectric material with respect to the non-modified dielectric material and with respect to the semiconductive material, so as to form the spacers on the lateral sides of the gate.

Abstract: The present application provides a method of manufacturing a memory device. The method includes steps of providing a semiconductor substrate having an active area disposed over or in the semiconductor substrate, and a first isolation member extending into the semiconductor substrate and disposed adjacent to the active area; disposing an energy-decomposable mask over the semiconductor substrate and the first isolation member; irradiating a portion of the energy-decomposable mask with an electromagnetic radiation; removing the portion of the energy-decomposable mask irradiated with the electromagnetic radiation to form a patterned energy-decomposable mask; removing a portion of the semiconductor substrate exposed through the patterned energy-decomposable mask to form a trench; removing the patterned energy-decomposable mask; and forming a second isolation member within the trench.

Abstract: A HEMT transistor has a semiconductor layer structure that comprises a Group III nitride-based channel layer and a higher bandgap Group III nitride-based barrier layer on the channel layer. A gate finger and first and second source/drain contacts are provided on the semiconductor layer structure. A first source/drain region is provided in the semiconductor layer structure that includes a first implanted region that is underneath the first source/drain contact and a first auxiliary implanted region. A depth of the first implanted region is at least twice a depth of the first auxiliary implanted a region. The first source/drain region extends inwardly a first distance from a lower edge of an inner sidewall of the first source/drain contact, and extends outwardly a second smaller distance from a lower edge of an outer sidewall of the first source/drain contact.

Abstract: On-chip peltier cooling devices and manufacturing methods thereof are provided. The device comprises: a first type well, a polysilicon gate and dummy gates, first type doped regions, a second type doped region, a first and second via. The dummy gate is formed as a two-segment structure with an interval, and there is no gate oxide layer between portions of the dummy gate which are far away from the interval and the semiconductor substrate. The first type doped region at least overlaps with an orthographic projection region of the first segment of the dummy gate on the semiconductor substrate. The second type doped region at least overlaps with orthographic projection regions of the polysilicon gate and the second segment of the dummy gate on the semiconductor substrate. In this application, the heat flows from inside of the device to its surface, to realize heat dissipation and cooling.