Patents Examined by Duang A. Le
  • Patent number: 10367086
    Abstract: Presented is a lateral fin static induction transistor including a semi conductive substrate, source and drain regions extending from an optional buffer layer of same or varied thickness supported by the semi conductive substrate, a semi conductive channel electrically coupling the source region to the drain region of the transistor, a portion of the semi conductive channel being a fin and having a face covered by a gated structure, thereby defining a gated channel within the semi conductive channel, the semi conductive channel further including a drift region electrically coupling the gated channel to the drain region of the transistor.
    Type: Grant
    Filed: February 13, 2018
    Date of Patent: July 30, 2019
    Assignee: HRL Laboratories, LLC
    Inventor: Biqin Huang