Patents Examined by Edwaed Glick
  • Exposure apparatus, information processing apparatus, and method of manufacturing device
    Patent number: 8212990
    Abstract: An exposure apparatus for exposing a substrate to radiant energy comprises a controller configured to determine a shot layout based on data representing a surface shape of the substrate, and an exposure unit configured to expose the substrate to the radiant energy in accordance with the shot layout determined by the controller.
    Type: Grant
    Filed: July 17, 2008
    Date of Patent: July 3, 2012
    Assignee: Canon Kabushiki Kaisha
    Inventors: Jun Kawashima, Yuji Kojima