Patents Examined by Elizabeth A Burkhart
  • Patent number: 12031209
    Abstract: Methods of forming a metal film having a metal halide with a reducing agent are disclosed. The reducing agent, the reducing agent includes a group IV element containing heterocyclic compound, a radical initiator, an alkly alane, a diborene species and/or a Sn(II) compound.
    Type: Grant
    Filed: February 16, 2021
    Date of Patent: July 9, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Bhaskar Jyoti Bhuyan, Mark Saly, Lakmal C. Kalutarage, Thomas Knisley
  • Patent number: 12031206
    Abstract: Disclosed are methods and systems for depositing layers comprising a transition metal and a group 13 element. The layers are formed onto a surface of a substrate. The deposition process may be a cyclical deposition process. Exemplary structures in which the layers may be incorporated include field effect transistors, VNAND cells, metal-insulator-metal (MIM) structures, and DRAM capacitors.
    Type: Grant
    Filed: July 14, 2022
    Date of Patent: July 9, 2024
    Assignee: ASM IP Holding, B.V.
    Inventors: Maart van Druenen, Qi Xie, Charles Dezelah, Petro Deminskyi, Lifu Chen, Giuseppe Alessio Verni, Ren-Jie Chang
  • Patent number: 12005659
    Abstract: A method for manufacturing a coated lens by applying at least one single electromagnetic pulse to convert a coating precursor material into at least one coating. The electromagnetic pulse is delivered to the coating precursor material applied on a surface of an uncoated or precoated optical lens substrate. The at least one single electromagnetic pulse is applied from an electromagnetic source such as a flash lamp, a halogen lamp, a directed plasma arc, a laser, a microwave generator, an induction heater, an electron beam, a stroboscope, or a mercury lamp.
    Type: Grant
    Filed: December 22, 2022
    Date of Patent: June 11, 2024
    Assignee: Carl Zeiss Vision International GmbH
    Inventors: Waiz Karim, Andreu Llobera Adan, Emad Flear Aziz, Norbert Hugenberg
  • Patent number: 12001033
    Abstract: Methods are provided for forming a particular multi-layer micron-sized particle that is substantially transparent, yet that exhibits selectable coloration based on its physical properties. The disclosed physical properties of the particle are controllably selectable refractive indices to provide an opaque-appearing energy transmissive material when pluralities of the particles are suspended in a substantially transparent matrix material. Multiply-layered (up to 30+ constituent layers) particles result in an overall particle diameter of less than 5 microns. The material suspensions render the particles deliverable as aspirated or aerosol compositions onto substrates to form layers that selectively scatter specific wavelengths of electromagnetic energy while allowing remaining wavelengths of the incident energy to pass.
    Type: Grant
    Filed: November 28, 2022
    Date of Patent: June 4, 2024
    Assignee: FACE INTERNATIONAL CORPORATION
    Inventors: Clark D Boyd, Bradbury R Face, Jeffrey D Shepard
  • Patent number: 11965244
    Abstract: The present invention disclosed herein relates to a substrate processing method, and more particularly, to: a substrate processing method in which a flow rate of a process gas in a depressurizing operation is regulated in a pressure changing process for improving properties of a thin film; a substrate processing apparatus using the substrate processing method; and a semiconductor manufacturing method.
    Type: Grant
    Filed: August 25, 2021
    Date of Patent: April 23, 2024
    Assignee: WONIK IPS CO., LTD
    Inventors: Kyung Park, Hyeon Beom Gwon, Dae Seong Lee
  • Patent number: 11952658
    Abstract: A method of depositing a metal-containing material is disclosed. The method can include use of cyclic deposition techniques, such as cyclic chemical vapor deposition and atomic layer deposition. The metal-containing material can include intermetallic compounds. A structure including the metal-containing material and a system for forming the material are also disclosed.
    Type: Grant
    Filed: October 24, 2022
    Date of Patent: April 9, 2024
    Assignee: ASM IP Holding B.V.
    Inventors: Katja Väyrynen, Timo Hatanpää, Mikko Ritala, Markku Leskelä
  • Patent number: 11938696
    Abstract: A method for manufacturing a coated lens by applying at least one single electromagnetic pulse to convert a coating precursor material into at least one coating. The electromagnetic pulse is delivered to the coating precursor material applied on a surface of an uncoated or precoated optical lens substrate. The at least one single electromagnetic pulse is applied from an electromagnetic source such as a flash lamp, a halogen lamp, a directed plasma arc, a laser, a microwave generator, an induction heater, an electron beam, a stroboscope, or a mercury lamp.
    Type: Grant
    Filed: December 22, 2022
    Date of Patent: March 26, 2024
    Assignee: Carl Zeiss Vision International GmbH
    Inventors: Waiz Karim, Andreu Llobera Adan, Emad Flear Aziz, Norbert Hugenberg
  • Patent number: 11933943
    Abstract: A method of manufacturing a sterile stack of peelable lenses includes coating a first lens (or stack of lenses) with a first adhesive coating, heating the first adhesive coating to initiate curing, exposing the first adhesive coating to ultraviolet light to continue curing, laminating a second lens (or stack of lenses) onto a surface of the first adhesive coating to produce a stack of lenses, coating the second lens with a second adhesive coating, heating the second adhesive coating to initiate curing, exposing the second adhesive coating to ultraviolet light to continue curing, laminating a third lens (or stack of lenses) onto a surface of the second adhesive coating to add the third lens to the stack of lenses, and exposing the stack of lenses to an electron beam to continue curing of the first and second adhesive coatings.
    Type: Grant
    Filed: August 30, 2022
    Date of Patent: March 19, 2024
    Assignee: Laminated Film LLC
    Inventors: Stephen S. Wilson, Bart E. Wilson, Roger Cone
  • Patent number: 11926557
    Abstract: A method for manufacturing a spectacle lens having a lens substrate and at least one coating is disclosed. The method includes providing a lens substrate having an uncoated or precoated front surface and an uncoated or precoated back surface, applying at least one coating to at least one of the surfaces of the lens substrate, the surface of the at least one coating being modifiable when contacted with at least one medium able to modify the surface of the at least one coating, contacting the surface of the at least one coating, partially or completely, with the at least one medium, considering the individual peripheral refraction, obtaining the spectacle lens having the lens substrate and the at least one coating, the surface of the at least one coating being modified according to the individual peripheral refraction.
    Type: Grant
    Filed: April 21, 2023
    Date of Patent: March 12, 2024
    Assignee: Carl Zeiss Vision International GmbH
    Inventors: Michel-René Christmann, Andreu Llobera Adan, Gerhard Kelch
  • Patent number: 11898242
    Abstract: Methods for forming a polycrystalline molybdenum film over a surface of a substrate are disclosed. The methods may include: providing a substrate into a reaction chamber; depositing a nucleation film directly on an exposed surface of the substrate, wherein the nucleation film comprises one of a metal oxide nucleation film or a metal nitride nucleation film; and depositing a polycrystalline molybdenum film directly on the nucleation film; wherein the polycrystalline molybdenum film comprises a plurality of molybdenum crystallites having an average crystallite size of less than 80 ?. Structures including a polycrystalline molybdenum film disposed over a surface of a substrate with an intermediate nucleation film are also disclosed.
    Type: Grant
    Filed: August 14, 2020
    Date of Patent: February 13, 2024
    Inventors: Bhushan Zope, Eric Christopher Stevens, Shankar Swaminathan, Roghayyeh Lotfi, Mustafa Muhammad, Eric Shero
  • Patent number: 11891690
    Abstract: A method of forming a molybdenum film by oxidation and reduction is disclosed. A molybdenum oxide film is formed by CVD or ALD using a halide free organometallic molybdenum precursor. The molybdenum oxide film contains low amounts of carbon impurities. The molybdenum oxide film is reduced to form a highly pure molybdenum film. The molybdenum film has low resistance and properties similar to bulk molybdenum.
    Type: Grant
    Filed: August 11, 2020
    Date of Patent: February 6, 2024
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Feng Q. Liu, Alexander Jansen, Mark Saly
  • Patent number: 11879067
    Abstract: A film forming method is a method of forming a film on a substrate top face including a first region in which a metal or a semiconductor is exposed and a second region in which an insulator is exposed. The method includes a SAM forming process of forming a self-assembled monolayer film of a perfluoropolyether group-containing compound on the first region and a film growth process of forming a predetermined film on the second region after execution of SAM forming process.
    Type: Grant
    Filed: October 31, 2019
    Date of Patent: January 23, 2024
    Assignees: TOKYO ELECTRON LIMITED, DAIKIN INDUSTRIES, LTD.
    Inventors: Takashi Fuse, Takashi Namikawa
  • Patent number: 11866334
    Abstract: Systems and method for producing graphene on a substrate are described. Certain types of exemplar systems include lateral arrangements of a substrate gas scavenging environment and an annealing environment. Certain other types of exemplar systems include lateral arrangements of a graphene producing environment and a cooling environment, which cools the graphene produced on the substrate. Yet other types of exemplar systems include lateral arrangements of a localized annealing environment, localized graphene producing environment and a localized cooling environment inside the same enclosure. Certain type of exemplar methods for producing graphene on a substrate include scavenging a first portion of the substrate and preferably, contemporaneously annealing a second portion of the substrate.
    Type: Grant
    Filed: December 7, 2022
    Date of Patent: January 9, 2024
    Assignee: General Graphene Corporation
    Inventors: Vig Sherrill, Mira Baraket, Richard Philpott
  • Patent number: 11866818
    Abstract: A coating of spectacle lenses is applied by physical vapor deposition (PVD). A method for physical vapor deposition includes: providing a crucible containing a first evaporation material and a second evaporation material, wherein the first evaporation material has a first vapor pressure and the second evaporation material has a second vapor pressure different from the first vapor pressure. A ratio of an exposed surface of the first evaporation material and an exposed surface of the second evaporation material in the crucible is adapted to counterbalance the difference in vapor pressure between the first and the second evaporation material. Concurrent evaporation of the first evaporation material and the second evaporation material from the same crucible take place. The disclosure further relates to a crucible for physical vapor deposition and a physical vapor deposition system in particular for coating an optical surface such as a spectacle lens.
    Type: Grant
    Filed: May 2, 2023
    Date of Patent: January 9, 2024
    Assignee: Carl Zeiss Vision International GmbH
    Inventor: Artur Laukart
  • Patent number: 11866333
    Abstract: Systems and method for producing graphene on a substrate are described. Certain types of exemplar systems include lateral arrangements of a substrate gas scavenging environment and an annealing environment. Certain other types of exemplar systems include lateral arrangements of a graphene producing environment and a cooling environment, which cools the graphene produced on the substrate. Yet other types of exemplar systems include lateral arrangements of a localized annealing environment, localized graphene producing environment and a localized cooling environment inside the same enclosure. Certain type of exemplar methods for producing graphene on a substrate include scavenging a first portion of the substrate and preferably, contemporaneously annealing a second portion of the substrate.
    Type: Grant
    Filed: December 7, 2022
    Date of Patent: January 9, 2024
    Assignee: General Graphene Corporation
    Inventors: Vig Sherrill, Mira Baraket, Richard Philpott
  • Patent number: 11859283
    Abstract: Methods for forming an Indium-containing film by a vapor deposition method using a heteroalkylcyclopentadienyl Indium (I) precursor having a general formula: In[R1R2R3R4CpL1] or In[CpL1L2y] wherein Cp represents a cyclopentadienyl ligand; R1 to R4 are each independently H, C1-C4 linear, branched or cyclic alkyls; L1 and L2 are each independently a substituent bonded to the Cp ligand and consisting of an alkyl chain containing at least one heteroatom, such as Si, Ge, Sn, N, P, B, Al, Ga, In, O, S, Se, Te, F, Cl, Br, I; and y=1-4. Examplary heteroalkylcyclopentadienyl Indium (I) precursors include In(Cp(CH2)3NMe2) or In(CpPiPr2).
    Type: Grant
    Filed: July 28, 2020
    Date of Patent: January 2, 2024
    Assignee: L'Air Liquide Societe Anonyme Pour L'Etude Et L'Exploitation Des Procedes Georges Claude
    Inventors: Antoine Bruneau, Takashi Ono, Christian Dussarrat
  • Patent number: 11846021
    Abstract: The sequential infiltration synthesis (SIS) and Atomic Layer Deposition (ALD) of metal and/or metal oxides on personal medical equipment (PPE). The deposited metal and/or metal oxides imbues antimicrobial properties to the PPE.
    Type: Grant
    Filed: September 30, 2020
    Date of Patent: December 19, 2023
    Assignee: UCHICAGO ARGONNE, LLC
    Inventors: Anil U. Mane, Jeffrey W. Elam, Seth B. Darling, Nestor J. Zaluzec, Alex B. Martinson
  • Patent number: 11827519
    Abstract: Systems and method for producing graphene on a substrate are described. Certain types of exemplar systems include lateral arrangements of a substrate gas scavenging environment and an annealing environment. Certain other types of exemplar systems include lateral arrangements of a graphene producing environment and a cooling environment, which cools the graphene produced on the substrate. Yet other types of exemplar systems include lateral arrangements of a localized annealing environment, localized graphene producing environment and a localized cooling environment inside the same enclosure. Certain type of exemplar methods for producing graphene on a substrate include scavenging a first portion of the substrate and preferably, contemporaneously annealing a second portion of the substrate.
    Type: Grant
    Filed: December 7, 2022
    Date of Patent: November 28, 2023
    Assignee: General Graphene Corporation
    Inventors: Vig Sherrill, Mira Baraket, Richard Philpott
  • Patent number: 11821071
    Abstract: Molybdenum-containing films are deposited on semiconductor substrates using reactions of molybdenum-containing precursors in ALD and CVD processes. In some embodiments, the precursors can be used for deposition of molybdenum metal films with low levels of incorporation of carbon and nitrogen. In some embodiments, the films are deposited using fluorine-free precursors in a presence of exposed silicon-containing layers without using etch stop layers. The precursor, in some embodiments, is a compound that includes molybdenum, at least one halogen that forms a bond with molybdenum, and at chamber least one organic ligand that includes an element selected from the group consisting of N, O, and S, that forms a bond with molybdenum, In another aspect, the precursor is a molybdenum, compound with at least one sulfur-containing ligand, and preferably no molybdenum-carbon bonds.
    Type: Grant
    Filed: March 6, 2020
    Date of Patent: November 21, 2023
    Assignee: Lam Research Corporation
    Inventor: Kyle Jordan Blakeney
  • Patent number: 11821080
    Abstract: A process for gas phase deposition of a metal or metal nitride film on a surface substrate comprises: reacting a metal-oxo or metal oxyhalide precursor with an oxophilic reagent in a reactor containing the substrate to deoxygenate the metal-oxo or metal oxyhalide precursor, and forming the metal or metal nitride film on the substrate through a vapor deposition process. The substrate is exposed to the metal oxyhalide precursor and the oxophilic reagent simultaneously or sequentially. The substrate is exposed to a reducing agent sequentially after deoxygenation.
    Type: Grant
    Filed: March 5, 2021
    Date of Patent: November 21, 2023
    Assignee: L'Air Liquide Societe Anonyme Pour L'Etude Et L'Exploitation Des Procedes Georges Claude
    Inventors: Yumin Liu, Rocio Alejandra Arteaga Muller, Nicolas Blasco, Jean-Marc Girard, Feng Li, Venkateswara R. Pallem, Zhengning Gao