Abstract: Method and apparatus for sharpening a cutting edge of a cutting tool, such as a kitchen knife. In some embodiments, an abrasive assembly has a frame, a handle, and a cartridge that supports a plurality of abrasive members each having an associated abrasive surface. A rod affixes the abrasive assembly to a base assembly to facilitate movement of the abrasive assembly along the cutting edge of the tool responsive to engagement, by a user, of the user handle. Each abrasive member is configured to be moved, by the user, with respect to the handle to present each abrasive surface in turn. In some cases, the cartridge is rotatable about a cartridge axis that may be parallel or non-parallel to a central axis of the rod.

Abstract: A hand vacuum cleaner has a cyclonic unit comprising a first cyclonic stage and a second cyclonic stage. The front end of the first cyclonic stage has a front door that is moveable between a closed position and an open position. A latch secures the front door in the closed position. The front door has a first portion which is rotatably mounted to a front end of a cyclone unit sidewall and a second portion angularly spaced around the front door from the first portion, the second portion having the latch.

Abstract: Multiple floor treatment operations, such as burnishing, polishing and scrubbing, may be performed using a single floor treatment machine having a motor, the speed of which is governed by a controller that responds to sensor signals indicative of the type of floor treatments pad or pads operatively coupled to the motor.

Abstract: A method includes placing a polisher head on platen, the polisher head including a set of first magnets, and controlling a set of second magnets to rotate the polisher head on the platen, wherein controlling the set of second magnets includes reversing the polarity of at least one second magnet of the set of second magnets to produce a magnetic force on at least one first magnet of the set of first magnets, wherein the set of second magnets are external to the polisher head.

Abstract: Provided is a cleaner including a dust separation unit separating dust in the air, a suction flow path supplying outside air to the dust separation unit, a fan module moving the air in the suction flow path, and a dust sensor measuring concentration of dust in the suction flow path. The suction flow path includes a first suction flow path extending in a first direction and a second suction flow path connecting the first suction flow path to the dust separation unit and extending in a second direction that forms an obtuse angle with the first direction, and the dust sensor is disposed in the second suction flow path.

Abstract: A multi-purpose tool and a method for use thereof, where the multi-purpose tool includes a first component having a first shaft and at least one first tool affixed thereto and a second component comprising a second shaft having at least one second tool affixed thereto, the second shaft being substantially hollow and capable of slidably receiving the first shaft. The multi-purpose tool further includes a quick-securing mechanism disposed along the length of the second shaft including a dial that is rotatable relative to the second shaft and having a threaded portion affixed to the dial. The quick-securing mechanism is configured to move a pin into an extended position when the dial is rotated in a first direction, and to move the pin into a retracted position when the dial is rotated in a second direction. The pin interacts with one of at least two holes in the first shaft to secure the first shaft in either a compact or extended configuration relative to the second shaft.

Abstract: A material collection system is provided. The system can include a vacuum generator having a fan to develop an airflow and draw material into a conduit. The system can also include a transmission, a power source to selectively power at least one of the vacuum generator and the transmission, a variable power divider to divide a power output from the power source to the transmission and the vacuum generator, and a control system to control the variable power divider in a first mode and a second mode.

Abstract: A pole sander is provided including an elongate body having a first end and a second end, an electric motor, and a sanding head attached via a pivot mechanism to the first end of the elongate body. The sanding head includes a hood including a plate and a peripheral wall formed on the underside of the plate around an edge of the plate; an output spindle that projects from the hood and is rotatably driven by the electric motor around a rotational axis; and a brush ring mounted on the underside of the plate adjacent the edge of the plate inside of the peripheral wall. The brush ring is attached to the plate via a spring comprising at least one of a leaf spring or a wave spring.

Abstract: A hand vacuum cleaner has a main body housing a suction motor, an air treatment member having a front end and a rear end with a central longitudinal axis extending between the front and rear ends and a bleed valve having a bleed air flow path that extends from a bleed air inlet to a bleed air outlet. The hand vacuum cleaner has right and left laterally opposed sides that are spaced apart in a direction transverse to the central longitudinal axis, and the bleed air inlet and the bleed air outlet are transversely spaced apart.

Abstract: A cleaning system includes: a cleaning vehicle 1 that travels along a predetermined travel path R to clean the travel path; and a maintenance facility 2 provided at a maintenance stop position A set on the travel path R, wherein the cleaning vehicle 1 includes a suction portion 14 that sucks up dust on the travel path R, a storage portion that stores the sucked up dust, and a discharge portion 16 that discharges the dust stored in the storage portion to the outside, and the maintenance facility 2 includes a dust collection portion 214 that collects the dust discharged to the outside from the storage portion via the discharge portion 16 of the cleaning vehicle 1 stopped at the maintenance stop position A.

Abstract: A cleaner includes a suction unit, a main body including a cyclone unit for separating dust from air suctioned through the suction unit, and a dust container that stores dust separated in the cyclone unit below the cyclone unit. A filter unit is disposed inside the cyclone unit for filtering the air, and a movable unit disposed inside the cyclone unit includes a cleaning part for cleaning the outer circumference of the filter unit. An operation unit disposed outside the main body moves the movable unit and the cleaning part to remove dust from the outer surface of the filter unit.

Abstract: A processing apparatus includes a chuck table for holding a workpiece that has a mark representing a crystal orientation, a processing unit, a cassette stage for placing thereon a cassette for storing a plurality of workpieces therein, a temporary rest table, a spinner table, a robot for delivering a workpiece, a determining section for determining whether a workpiece has been properly processed or has not been properly processed, and a control unit for performing a control process for orienting the mark of the workpiece in a predetermined direction if the determining section determines that the workpiece has been properly processed and storing the workpiece in the cassette, and performing a control process for orienting the mark of the workpiece in a direction different from the predetermined direction if the determining section determines that the workpiece has not been properly processed and storing the workpiece in the cassette.

Abstract: A manufacturing method of a wafer includes a first and a second resin-application grinding step, and a third surface-grinding step. The first step includes: a first formation step of forming a first coating layer; a first surface-grinding step of placing the wafer so that the first coating layer contacts a reference surface of a table and surface-grinding a first surface of the wafer; and a first removal step of removing the first coating layer. The second step includes: a second formation step of forming a second coating layer; a second surface-grinding step of placing the wafer so that the second coating layer contacts the reference surface and surface-grinding the second surface; and a second removal step of removing the second coating layer. In the third step, the wafer is placed so that the last surface-ground surface contacts the reference surface and a surface opposite the contacted surface is surface-ground.

Abstract: A horizontal pre-clean module includes a chamber including a basin and a lid which collectively define a processing area, a rotatable vacuum table disposed in the processing area, a pad conditioning station, a pad carrier positioning arm having a first end and a second end distal from the first end, a pad carrier assembly coupled to the first end of the pad carrier positioning arm, and an actuator coupled to the second end of the pad carrier positioning arm and configured to swing the pad carrier assembly between a first position over the rotatable vacuum table and a second position over the pad conditioning station. The pad carrier assembly includes a gimbal base and a pad carrier coupled to the gimbal base, the gimbal base and the pad carrier are configured to support a buffing pad by a mechanical clamping mechanism and a suction clamping mechanism.

Abstract: An attachment for a vacuum cleaning appliance has a first part which is connectable to a main body of the appliance, and a second part which is connectable to the first part. The first part includes a crevice nozzle and a brush section which is moveable along the crevice nozzle between a retracted position and a deployed position. The second part includes a suction inlet, and is arranged to be push-fitted over the first part so that the crevice nozzle and the brush section of the first part are both stored within the second part when the second part is connected to the first part.

Abstract: Aspects described herein generally relate to a cleaning system, such as a cleaning implement with a primary cleaning member and a removable secondary cleaning member, in particular a mop assembly with a primary cleaning member and a removable secondary cleaning member. The primary cleaning member may be a sponge based cleaning member and the secondary cleaning member may be a scrubbing brush or similar handheld scrubbing member. The scrubbing brush may have an attachment member that includes a pair of rails and a tab assembly that helps to releasably connect the scrubbing brush to a connecting member of the mop assembly.

Abstract: A thrombectomy device cleaning apparatus for cleaning a thrombectomy device while maintaining the integrity of removed blood clots includes a box with a box left side and a box right side each having a receiving channel adjacent an open box top side. A mesh screen is coupled to a plurality of hinges. The mesh screen has a screen channel extending from a screen left edge to a screen right edge with a profile conforming to a receiving channel of each of the box left side and the box right side. The channel receives a thrombectomy device. A lid moves between a closed position covering the mesh screen in the use position and an open position exposing the mesh screen. A pair of brush rollers is coupled to the lid and positioned to rest within the screen channel of the mesh screen. The pair of brush receives the thrombectomy device therebetween.

Abstract: A portable wet sand blasting device or a portable wet sand blaster with a specially designed and shaped hand truck tank with an inclined side, wheels, axle, base feet, and a handle to allow the heavy device to be more easily moved from job to job. The specially designed and shaped hand truck tank includes a special pump and special internal plumbing and mixing outputs that provide optimum water and abrasive slurry mixing wherein sufficient slurry mixing is required for the effective use of a wet sand blasting device.

Abstract: A polishing apparatus which can measure a film thickness with high accuracy without affecting a polishing rate of a wafer is disclosed. The polishing apparatus includes: a polishing head configured to press a wafer against a polishing pad; an illuminating fiber having a distal end disposed in a flow passage formed in the polishing table; a spectrometer configured to resolve reflected light from the wafer in accordance with wavelength and measure an intensity of the reflected light at each of the wavelengths; a light-receiving fiber having a distal end disposed in the flow passage; a liquid supply line communicating with the flow passage; a gas supply line communicating with the flow passage; a liquid supply valve attached to the liquid supply line; a gas supply valve attached to the gas supply line; and an operation controller configured to control operations of the liquid supply valve and the gas supply valve.

Abstract: A support arm arrangement for a local gas extractor arrangement and a local gas extractor arrangement including such a support arm arrangement. The support arm arrangement includes a first support arm and at least one second support arm being pivotally coupled to each other by friction joint arrangements. The support arm arrangement receives a tube device coupled to an extractor hood, an exterior pump device and the support arms. The extractor hood is arranged at an outermost second support arm by a linkage arm arrangement including a first link arm pivotally coupled to the outermost second support arm by a first friction joint pivotable about a first pivoting axis, and a second link arm fixedly attached to the extractor hood and pivotally coupled to the first link arm by a second friction joint pivotable about a second pivoting axis extending in a direction perpendicular to the first pivoting axis.