Abstract: An charged particle beam irradiation apparatus is provided which increases the width in a depth direction of a Bragg peak to be formed, by means of a simple construction. The charged particle beam irradiation apparatus includes a charged particle beam generation device and an irradiation field forming device. The charged particle beam generation device has a front accelerator and a synchrotron. An ion beam is guided to the irradiation field forming device from the synchrotron. The irradiation field forming device has a beam enlarging device, a Bragg peak enlarging device and a ridge filter. A pair of filter elements which constitute the Bragg peak enlarging device have a plurality of stick-shaped portions spaced apart from one another. The filter elements are disposed with their respective stick-shaped portions partly superposed to extend in mutually different directions.

Abstract: An electron-beam controller (EBC) capable of controlling the power in an electron-beam is disclosed. The EBC can be implemented with an emitter, an extractor, a current mirror, and an input current having a magnitude responsive to the desired electron beam current. An EBC suited for low-efficiency emitters is also disclosed. A method for controlling the power intensity of an electron-beam over time is also disclosed. The method includes the steps of: (1) providing an emitter at a first voltage, (2) providing a target at a second voltage, (3) introducing an extractor at a controllable third voltage, (4) estimating the actual electron beam energy by sensing the emitter current; and (5) adjusting the third voltage in response to the sensed emitter current.

Abstract: An ion implantation system of the kind including an ion source, an electrode plate, an extraction voltage supply, and a substrate holder is described. The electrode plate initially has an opening of about 6.35 mm which is enlarged to about 8.38 mm. The aperture is also tapered outwardly on a side thereof opposing the ion source. It has been found that such an electrode plate creates substantially lower suppression currents.

Abstract: A novel dual beam low energy electron microscope (LEEM) apparatus for inspecting semiconductor circuits or masks. Direct imaging records many pixels in parallel, offering higher inspection rates than prior art scanning methods. A low energy flood beam is superimposed with a second, higher energy flood beam. The use of two beams avoids charging effects upon insulating or partially insulating substrates. Under appropriate conditions, the net charging flux to each image element can be balanced on a pixel by pixel, as well as global basis. Either the low energy or the higher energy beam may be used to form an image of the surface. An electron optical apparatus and configuration for this dual beam LEEM is described.

Abstract: In the first operation, the cantilever is oscillated at a frequency which is at opposite sides of a frequency band having a half value of an oscillation frequency f and amplitude A on a dependent curve (Q-curve). The cantilever oscillating frequency is far from an oscillation frequency (near a resonance point) where the cantilever is slow to damp, which enables the cantilever to quickly damp in accordance with a variation of a transient oscillation frequency after the probe comes into contact with the specimen, and allows the probe to follow the uneven surface state of the specimen.

Abstract: A charged particle filter such as a Wien filter in which components used as the pole pieces and electrodes are precisely and reliably secured to a supporting structure through which they extend and to which they are brazed. Electrical insulating gaps in the magnetic circuit are located very remotely from the pole faces of the pole pieces so as to minimize any adverse effect of the gaps on the produced magnetic field.

Abstract: A novel MEMS assembly and testing system that utilizes a scanning electron microscope (SEM) typically having 5 axes of freedom as the imaging instrument. Microgrippers or other tools mounted at the end of a linear motion feed through device having a motion resolution of about 10 nanometers are used as the manipulator. All of the assembly features are located inside of a vacuum or operating chamber to permit operation of the SEM imaging system. A variety of other auxiliary devices that support the MEMS assembly and testing system are also included to enhance the capabilities thereof.

Abstract: The invention relates to a monochromator on the basis of Wien filters. According to a first aspect, four Wien filters are arranged in series along a common optical axis of which the two center Wien filters are each rotated by 90° relative to the two outer Wien filters. The two center Wien filters (W2, W3) are orientated simultaneously anti-parallel to each other. Such a monochromator has inherent stigmatic imaging characteristics and is, as a unit, free of dispersion. According to a further aspect, each of the Wien filters is configured symmetrically with reference to a 90° rotation about the optical axis. The magnetic and the electrostatic poles of the Wien filter are identically dimensioned so that the orientation of the Wien filter azimuthally about the optical axis (OA) can be varied by a corresponding drive of the particular contacts for the voltage supply and current supply of the electrodes and coils.

Abstract: An ion beam analysis system that creates microscopic multidimensional image maps of the effects of high energy ions from an unfocussed source upon a sample by correlating the exact entry point of an ion into a sample by projection imaging of the ion-induced photons emitted at that point with a signal from a detector that measures the interaction of that ion within the sample. The emitted photons are collected in the lens system of a conventional optical microscope, and projected on the image plane of a high resolution single photon position sensitive detector. Position signals from this photon detector are then correlated in time with electrical effects, including the malfunction of digital circuits, detected within the sample that were caused by the individual ion that created these photons initially.