Patents Examined by Everhart B.
  • Patent number: 4918031
    Abstract: Anisotropic plasma etching is accomplished utilizing a helical resonator operated at relatively low gas pressure. The use of this combination yields an extremely high flux of ionic species with resulting rapid anisotropic etching. A helical resonator in conjunction with suitable precursors is also quite useful for plasma induced deposition.
    Type: Grant
    Filed: December 28, 1988
    Date of Patent: April 17, 1990
    Assignee: American Telephone and Telegraph Company,AT&T Bell Laboratories
    Inventors: Daniel L. Flamm, Dale E. Ibbotson, Wayne L. Johnson