Abstract: The orientation of a crystalline semiconductor film obtained by crystallizing an amorphous semiconductor film is improved and a TFT formed from this crystalline semiconductor film is provided. In a semiconductor device whose TFT is formed from a semiconductor layer mainly containing silicon, the semiconductor layer has a channel formation region and an impurity region doped with an impurity of one type of conductivity.
Type:
Grant
Filed:
April 29, 2004
Date of Patent:
October 18, 2005
Assignee:
Semiconductor Energy Laboratory Co., Ltd.