Patents Examined by Gentale Winter
  • Method of treating an isulating layer
    Patent number: 6592770
    Abstract: This invention relates to a method of heating an insulating layer, such as is found in semiconductor devices, in which a formation has been etched through a layer of resist comprising reactive etching the resist, inhibiting absorption of or removing water vapor and/or oxygen at the exposed surfaces of the etched formation and filling the formation with conductive metal in the absence of said water vapor and/or oxygen.
    Type: Grant
    Filed: May 11, 2000
    Date of Patent: July 15, 2003
    Assignee: Trikon Holdings Limited
    Inventor: Christopher David Dobson