Abstract: The invention provides an improved, reduced streaking/filming dilute cleaning formulation which is to be used in a no-rinse cleaning application, preferably either by a dosing dispenser or in a combined cleaning tool which contains a cleaning head, a handle, a reservoir of the cleaning formulation mounted to said handle and a means for dispensing the cleaning formulation in a suitable direction relative to the cleaning head.
Type:
Grant
Filed:
November 21, 2001
Date of Patent:
February 7, 2006
Assignee:
The Clorox Co.
Inventors:
Shumanta Mitra, Scott T. Haubrich, Boli Zhou
Abstract: The present invention relates to compositions useful in removing photoresist and organic and inorganic residues and processes for removal of photoresists and etch residues. The compositions are aqueous, acidic compositions containing fluoride and organic polar solvents. The compositions are free of glycols and have a low surface tension and viscosity. Corrosion inhibitors are optionally present.
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