Patents Examined by Haa Q Pham
  • Patent number: 11644418
    Abstract: The present invention provides a far-infrared light source capable of reducing the shift in the location irradiated with far-infrared light even when the frequency of the far-infrared light changes. A far-infrared light source according to the present invention is configured so that the variation in the emission angle of far-infrared light in a nonlinear optical crystal when the frequency of the far-infrared light changes is substantially offset by the variation in the refractive angle of the far-infrared light at the interface between the nonlinear optical crystal and a prism when the frequency of the far-infrared light changes (see FIG. 8).
    Type: Grant
    Filed: August 23, 2021
    Date of Patent: May 9, 2023
    Assignee: Hitachi High-Tech Corporation
    Inventors: Kei Shimura, Mizuki Mohara, Kenji Aiko