Abstract: A water treatment system includes a circulation pump and an electrolytic chamber in fluid communication with a main body of water. Electrolytic plates within the electrolytic chamber generate chlorine. When mineral deposits foul the electrolytic plates, water is isolated within the electrolytic chamber and a minimal amount of a pH-reducing agent is added to the electrolytic chamber to remove the mineral deposits. In a first embodiment, the pH-reducing agent is admitted on a periodic timed basis. In a second embodiment, the pH-reducing agent is added when the pH of the main body of water falls below a predetermined threshold. In both embodiments, cleaning is accomplished by adding the pH-reducing agent when the circulation pump is not operating so that the acid dwells within the electrolytic chamber for a sufficient amount of time. Activation of the circulation pump causes the pH-reducing agent to enter the main body of water.

Abstract: The present invention relates to a method and apparatus for partial etching or pattern etching using an electrolysis reaction, wherein, conventionally, there was the problem that an etching line could not be finely formed on a cell edge because of apparatus problems concerning alignment accuracy. The present invention provides a method and apparatus with which fine line etching is possible and which can form a line on a cell edge. Provided is a an electrolytic etching method of a substrate which is formed having a subject etching layer on a surface, having the steps of providing a fixed gap from a substrate end surface which is external to an end surface of the substrate for placing a working part of a working electrode and passing current between the substrate and the working electrode.

Abstract: In a microfluidic device, respective motion of a plurality of objects along corresponding trajectories is achieved by determining a force field, such as an underlying fluid flow which, when applied to the plurality of object, moves each object along its corresponding trajectory. The force field is a linear superposition of a subset of all force fields supported by the physical characteristics of the microfluidic device. Once the fields have been ascertained, a plurality of actuation signals corresponding to the fields is applied to actuators installed on the microfluidic device to cause the force on each object. By implementing a feedback structure, corrections for positional errors may be made by computing a corrective force for each object and adjusting the actuation signals appropriately thereto.

Abstract: The present invention discloses an apparatus having a platen; a polishing pad disposed over the platen; a slurry dispenser disposed over the polishing pad; a cathode connected electrically to the polishing pad; a wafer carrier disposed over the polishing pad; an anode connected electrically to the wafer carrier; and a power supply connected to the anode and the cathode. The present invention further discloses a method to remove a surface layer from a wafer using a polishing pad, a slurry, and an electrical current.