Abstract: A small field scanning photolithography system uses opposing motion of a reticle and a blank to compensate for image reversal by a projection system such as a conventional Wynne-Dyson optical system which forms a reverted image on a blank. The reticle has a reverted pattern. During scanning, the reticle moves along a reverted axis in a direction opposite the direction in which the blank moves. The opposing motions can either expose a stripe on the blank or index the reticle and blank for exposure of a next stripe. In one embodiment of the invention, the reticle and blank are on independently movable precision air bearing stages. Typically, the blank and reticle move together perpendicular the reverted axis and in opposite direction along the reverted axis. The stages can move the reticle and blank different amounts to correct for shrinkage and temperature changes which cause the size of the reticle and blank to differ.

Abstract: An index print includes a recording sheet having positive images corresponding to respective images on an image recording medium and being right-side-up or up-side-down on the recording sheet. The index print further includes eye-readable means on the recording sheet which relate to the positive images. The invention is characterized in that the eye-readable means is positioned relative to the positive images to permit at least a portion of the eye-readable means to be read without being up-side-down on the recording sheet when viewing the positive images right-side-up on the recording sheet, whether the positive images are recorded right-side-up or up-side-down on the recording sheet.

Abstract: A scanning projection exposure apparatus includes an imaging system for imaging a pattern of an original, placed on an object plane, upon a substrate, and a scanning device for relatively scanning the original and the substrate relative to the imaging system, wherein the imaging system provides different imaging positions with respect to a direction of an optical axis, to plural zones on the object plane, which zones are juxtaposedly defined along a direction of scan.

Abstract: The apparatus includes a reticle stage for carrying a reticle and a wafer stage having an X-stage for carrying a wafer. The reticle is moved in -X-direction by means of the reticle stage while the wafer is moved in +X-direction by means of the X-stage for scanning, so that the image of the pattern on the reticle is serially transferred and printed onto the wafer. A laser interferometer supplies i) to a velocity calculation unit, measured values representing the X-coordinate of the reticle stage as periodically measured with a predetermined period and ii) to a frequency divider, a sampling timing signal indicating each time the measured value has become definite. The frequency divider outputs a calculation trigger signal.

Abstract: A dual-mode photographic printer which can be used to make both two-dimensional and three-dimensional photographs of different sizes having a plurality of print material cassettes which separately supply 2D and 3D print material of different sizes or types of 2D print material or of 3D print material. An easel is transported to one of the cassettes to pick up a section of print material according to the printing mode and the magnification. The same easel moves the print material to different locations for 3D printing. A chemical processor is included in the printer so that photo-processing is part of the on-line printing process.

Abstract: An object of the present invention is to estimate subject illuminating light using the minimum number of on-photography information. When no flashes of light exist, color differences R-G and G-B are calculated based on image information detected by an image sensor and the calculated color differences are plotted on color coordinates. It is further determined whether R-G and G-B distributions fall within a fluorescent-lamp light region or a tungsten light region (106). If it is determined that the distributions fall within the fluorescent-lamp light region, then the subject illuminating light is estimated as light such as a night view or fireworks, which is emitted from a light source other than the fluorescent lamp, when an average intensity (BV).ltoreq.-1.5 ?EV!. Further, the subject illuminating light is estimated as the fluorescent-lamp light when -1.5 ?EV!<BV.ltoreq.3 ?EV! and is estimated as daylight producing a green failure when 3 ?EV!<BV.

Abstract: A method and apparatus is disclosed for detecting a pattern image of each of a plurality of patterns on the surface of an object. Light emitted from either a light source including a wide wavelength or a light source including a plurality of monowavelengths is applied to the object. The object includes a layered structure having a plurality of layers, wherein at least a part of an uppermost layer of the object is optically transparent. Spectral illumination intensity characteristics of the light emitted from the light source is varied, depending on information about both the layered structure of the object, and a material of the object to obtain a desired spectral illumination intensity, and a pattern image of each of patterns is detected as either a one-dimensional or a two-dimensional image based on light reflected from the object.

Abstract: In a position detecting apparatus, according to this invention, a convexly and concavely patterned wafer mark is imaged on an image pickup surface via an imaging optical system, and the image on the image pickup surface is detected. The position detecting apparatus defocuses the average surface of the wafer mark from the optimum focusing surface depending on the pitch and difference in level of the wafer mark, etc., in the direction of the optical axis of the imaging optical system, and varies an illumination .sigma. value definded as the ratio of the numerical aperture of the illumination optical system and the numerical aperture of the imaging optical system. Then the position detecting apparatus provides lights from the wafer mark to the image pickup surface with rotation-symmetric wave aberration to allow the resulting image to have the highest contrast for positional detection.

Abstract: An alignment apparatus includes holding devices for holding a photo-mask, a supporting device for supporting a substrate, a detecting device, and force-exerting devices. The photo-mask and the substrate have positioning marks, respectively. The detecting device detects positional errors between the positioning marks on the photo-mask and the positioning marks on the substrate. The force-exerting devices apply forces to a periphery of the photo-mask in accordance with the detected positional errors. When receiving forces, the photo-mask elastically deforms in its plane to move the positioning marks so that the positional errors can be corrected to predetermined values.

Abstract: Two lithographic substrate stages are used in a single lithographic system. While a substrate on one stage is being exposed, a second substrate is being loaded, unloaded, or aligned on a second stage. After exposure, the first stage is unloaded, reloaded, and the newly-loaded substrate is aligned, while the second substrate on the second stage is being exposed. The two stages are thus used alternately in different steps of the process. One of the steps is being performed on one stage while a different step is being performed on the other stage. The substrates on both stages are, therefore, being acted upon simultaneously. The two stages are carried on a single linear motor platen, and moved about the platen by use of linear motors. The two stages alternately both move in clockwise directions about the platen, or both move in counterclockwise directions. When both move in clockwise directions, the first stage is moving to the exposure position, and the second stage is moving to the unload/load/align station.

Abstract: A reticle is scanned in a predetermined direction relative to an illumination field of a predetermined shape. In synchronism therewith, a shot-area defined on a photo-sensitive substrate (or wafer) is scanned in the opposite direction relative to an exposure field which is optically conjugate to the illumination field. Through these scanning operations, a pattern formed on the reticle is transferred onto the shot-area on the photosensitive substrate. The illuminance of an illumination light is measured during a time period when the illumination field is in an acceleration region and before reaching the shot-area, and the amount of exposure onto the shot-area is controlled based on the results of the measurement.

Abstract: An apparatus and method for handling photographic film within the print-exposure section of a photographic printer. A mask matches the film frame (negative) and has a window for the passage of the exposure light. The mask also has holes through which air can be directed onto the film. A guide for the edges of the film parallels, and demarcates a gap with the mask. A source of air under either overpressure or underpressure supplies such air to the mask (4) and the film (1) through the air-direction openings (15). The air is supplied with overpressure while the film is being advanced. The air is supplied with underpressure while the print is being exposed to clamp the film.

Abstract: A novel printing plate mounting device and procedure are provided. A small-scale single-color representation of a carton blank or other substrate and a complete usually multi-color image to be printed thereon is projected from an acetate film or other suitable substrate onto a carrier sheet to provide a full-scale single-color representation of the substrate and the image to be printed thereon. A small-scale usually multi-color representation of the carton blank and the complete usually multi-color image to be printed thereon is used as a template to determine which ones of a plurality of individual printing plate elements is used to print which ones of the color of the multi-color image. The individual printing plate elements for each color then are affixed to separate carrier sheets in the position shown by the full-scale single-color representation.

Abstract: In an image recording apparatus, a photosensitive material is pulled out from a magazine and is conveyed to an exposure section in which an image is formed on the photosensitive material by exposure. When the photosensitive material reaches a switchback section, it is reversely conveyed by a predetermined length. The exposed portion is cut off by cutting blades, and is passed through the exposure section again. A guide plate is moved to cause the photosensitive material to proceed inside the guide plate and then move to a heat-development/transfer section via a water applying section. An image receiving material having a predetermined length is taken out from another magazine by a sucking/conveying section, and is then conveyed to the heat-development/transfer section by rollers. The photosensitive material and the image receiving material are conveyed along a straight path by endless belts while being held therebetween so that the photosensitive material is subjected to heat-development.

Abstract: In a stage slit type focus position detecting system, an opening pattern unit (11A) on a reticle (10) is illuminated with exposure light (IL1) from a light source system (1), and light passing through the opening pattern unit (11A) is received through a projection optical system (13) and a reference pattern plate (23). In a stage emission type focus position detecting system, the reference pattern plate (23) is illuminated with illuminating light from a light source (35), and light passing through the reference pattern plate (23) and further going and returning through the projection optical system (13) is received by a photoelectric detector (42). An oblique incidence type AF sensor has a light-transmitting system (24) and a converging optical system (28).

Abstract: A step-and-scan exposure method in which a mask has a plurality of patterns and the number of patterns to be transferred to each shot area of a photosensitive substrate varies. The scanning and stepping movements are controlled in accordance with the number of patterns transferred, and dimensions of a pattern illumination area are varied in accordance with the patterns to be transferred. Transfer of a pattern to a shot area is omitted when an image of the pattern on the shot area would extend beyond the photosensitive substrate. Elimination of exposure scanning movements for patterns that are not to be transferred permits rapid movements of the mask and the substrate to scanning start positions.

Abstract: A recording apparatus for recording images on a plurality of recording media, including an image recording unit for recording images on the plurality of recording media. The apparatus also includes a control unit for controlling the image recording unit to sequentially record images on one recording medium of the plurality of recording media, and for controlling the image recording unit to record at least one image on each of the one recording medium and at least one other recording medium of the plurality of recording media after recording a predetermined number of images on the one recording medim. The apparatus also includes a unit for recording retrieval information on the plurality of recording media.

Abstract: A printer film carrier turning apparatus for obtaining a photograph by irradiating light onto a film comprises a film carrier for supporting the film, a carrier supporting table for supporting the film carrier parallel with the film to make the film carrier turn through a 90.degree. range, and a light diffusion box for diffusing illuminance light to uniformly illuminate a film range which is to be printed. The film turning apparatus is constructed such that the film carrier turns in unison with the light diffusion box. Therefore, transferring rollers of the film carrier cannot interfere with the light diffusion box, which allows the light diffusion box to be placed very close to the film carrier and thereby increases the efficiency of the light source. Also, the film carrier can be turned in unison with the light diffusion box, thereby improving the operating mechanism.

Abstract: A photometric system structure used in a printer section in which an image of a photographic film is printed onto a photosensitive material through a lens system. The lens system can be removed from an optical axis of light emitted from a light source and replaced by another lens system. A photometric device is disposed on the optical axis of the light emitted from the light source and changes an optical axis direction of at least a part of the light emitted from the light source to measure the light whose optical axis direction has been changed and which is used as photometric light. A beam splitter moves integrally with each of the lens systems.

Abstract: Multidimensional lithographs which impart the illusions of depth and/or motion to a viewer are prepared by constructing and sequencing a plurality of electronic pages, preferably four or more; rasterizing, compressing and converting each page; interlacing the pages in a desired sequence; outputting the interlaced frames to an imaging device; and producing a lithographic separation from the imaging device. In the rasterization of each frame, nonbinary pixels are created that correspond to the resolution of the line count of the lenticular lens that will ultimately be applied to a print of the lithograph times the number of frames in the lithographic separation. The frames are compressed to an amount equal to the reciprocal of the number of frames from which the lithographic separation is prepared. In the converting step, the nonbinary pixels of the compressed frames are converted to individual color plates of binary pixels.