Abstract: A water supply device includes a housing that has an inlet and an outlet, and an inflow chamber that is provided inside the housing and communicates with the inlet. A discharge chamber is provided inside the housing and communicates with the inflow chamber and the outlet. A buffer chamber is provided inside the housing and communicates with the discharge chamber, and a blocking rib extends from an inner side of the housing and is provided to partition the discharge chamber from the buffer chamber.

Abstract: Disclosed are an apparatus and a method for liquid-treating a substrate. The substrate treating apparatus includes a liquid supply unit configured to supply a treatment liquid in which a first liquid and a second liquid are mixed, onto the substrate unit, wherein the liquid supply unit includes a nozzle configured to discharge the treatment liquid, a first liquid supply line supplying the first liquid to the nozzle, and a second liquid supply supplying the second liquid to the nozzle, and the nozzle includes a body having a mixing space in which the first liquid and the second liquid are mixed and a buffer space extending from the mixing space, in the interior thereof, and a collision member located in the buffer space and configured to decrease a flow velocity of the treatment liquid supplied to the buffer space.

Abstract: An apparatus, method and system for cleaning a solar panel includes a solar panel, one or more fluid reservoirs, a fluid dispenser at a first side of a solar panel, a mechanism for providing pressurized fluid to the fluid dispenser from the fluid reservoir(s), and a mechanism for dispensing the fluid from the dispenser. The solar panel is periodically cleaned and the motivation for cleaning may be a detected output condition of the panel, a detected weather condition, an expired time condition, detected precipitant accumulation, a manual command, or the like. The fluid(s) may include a gas and/or one or more liquids. A heater may be provided to heat the fluid(s).

Abstract: A laundry treating appliance having a cabinet, a wash tub located within the cabinet and defining an interior, a wash basket mounted within the wash tub and defining a laundry treating chamber. A clothes mover or agitator can be located within and rotatable relative to and/or with the wash basket having a cap removably mounted to the clothes mover. The cap includes a treating chemistry dispenser system.

Abstract: The souring of wet laundry in a laundry treating appliance may be retarded by sending an alert signal indicative of an ending of a cycle of operation from the laundry treating appliance to a remote electronic device. The appliance may receive an authorization signal from the electronic device indicative of an instruction to execute an anti-sour cycle. An anti-sour cycle comprising the energizing of a fan to flow air through a laundry treating chamber may be automatically initiated for the laundry treating appliance.

Abstract: A laundry treating appliance is configured to treat laundry according to a cycle of operation. The laundry treating appliance comprises a chassis that defines an interior and has a front and rear with an access opening located in the front. A tub statically mounted to the chassis and defines a liquid chamber located within the interior and has at least one suspension opening. An exoskeleton is located within the liquid chamber and has a front support, a rear support, and stringers extending longitudinally to form a skeletal frame defining a frame interior. A rotatable drum is located within the frame interior. A suspension system is located within the interior and has at least one suspension component extending into the liquid chamber through the suspension opening and is operably coupled to the exoskeleton. A liquid dam retards liquid flow from the liquid chamber to the interior through the suspension opening.

Abstract: Disclosed is a substrate processing apparatus. The substrate processing apparatus includes a container body, and a holding member that conveys the substrate from an outside of the container body into the container body and holds the substrate inside the container body during the processing. A substrate support pin supporting a wafer and a cooling plate cooling the holding member are provided outside the container body.

Abstract: A washing machine includes a first housing, a second housing arranged above the first housing and having a laundry inlet arranged on the top, a first tub covered by the first housing and having a first opening on the front, a second tub covered by the second housing and having a second opening on the top, and a detergent container arranged in the second housing for storing a detergent to be supplied to the first tub.

Abstract: A lint removal system for a laundry appliance includes a lint washing assembly adapted to deliver wet lint to a disposal area. An impeller is disposed within a continuous processing chamber of a pump casing, the impeller operable to deliver a fluid from the disposal area to a drain outlet. A blade assembly is disposed within the continuous processing chamber, the blade assembly rotationally operable to process the wet lint from the disposal area to define lint particles that are delivered with the fluid to the drain outlet.

Abstract: A method for washing laundry in a washing machine utilizes a washing tub external to a rotatable washing drum. The method includes providing a quantity of detergent, providing a first quantity of water to form with the detergent a quantity of washing solution, introducing the washing solution into the tub, recirculating the washing solution inside the tub by recirculation until the washing solution is absorbed by the loaded laundry inside the drum and the level of the washing solution is below the drum, activating a heater for heating the wetted loaded laundry inside the drum deactivating the heater and maintaining the heated wetted loaded laundry inside the drum for a predetermined dry maintenance time, supplying a second quantity of water in the tub, rotating the drum, and rinsing the loaded laundry by drum rotations and by liquid drainage from the tub.

Abstract: A washing machine may include a drum that is rotatably provided inside a tub, a first water supply unit that directly jets water into the drum, a second water supply unit that supplies water to the tub via an automatic detergent supply unit, an input unit that receives selection of any one of detergent supply through the automatic detergent supply unit and detergent supply through a detergent container, and a control unit that jets water into the drum using the first water supply unit so that a detergent accommodated in the detergent container flows out, when the detergent supply through the detergent container is selected.

Abstract: A dishwasher, in particular a commercial single-tank dishwasher or commercial multi-tank dishwasher, for washing washware includes a liquid transportation line (100) with at least one supply line for supplying liquid at a first temperature and comprising at least one discharge line for discharging liquid at a second temperature. The supply line and the discharge line run coaxially in relation to one another, so that either the supply line or the discharge line forms an internal line (10) which runs in the direction of extent of the liquid transportation line (100) within the respectively other supply line or discharge line which for its part forms an external line (20), and thereby form a countercurrent heat exchanger.

Abstract: A laundry treatment apparatus includes a cabinet and a drawer retractably provided in the cabinet. An accommodation unit is provided at the drawer and defines a space configured to receive washing water. The laundry treatment apparatus includes a guider. The guider includes a first body rotatably coupled to the cabinet, and a second body rotatably coupled to the first body and the drawer and configured to connect the first body to the drawer. A supply unit is connected to a water supply source. A water supply channel is provided along the guider and is configured to supply water between the supply unit and the accommodation unit.

Abstract: A substrate cleaning apparatus comprises: a cleaning member 11,21 that comes into contact with a substrate W and cleans the substrate W; a member rotating unit 15, 25 that rotates the cleaning member 11, 21; a pressing drive unit 19, 29 that presses the cleaning member 11, 21 against the substrate W; a torque detecting unit 16, 26 for detecting torque applied to the member rotating unit 15, 25; and a control unit 50 that controls pressing force on the basis of a result of detection by the torque detecting unit 16, 26.

Abstract: The present disclosure provides a semiconductor cleaning system. The cleaning system includes a chamber to retain a cleaning solution, and a gigasonic frequency generator. The gigasonic frequency generator is configured to generate an electrical signal corresponding to a range of gigahertz frequencies. A transducer is configured to transform the electrical signal to a mechanical wave of pressure and displacement that propagates through the cleaning solution with oscillations within the range of gigahertz frequencies.

Abstract: A laundry treatment apparatus includes a cabinet and a drawer retractably provided in the cabinet. An accommodation unit is disposed in the drawer and defines a space configured to receive washing water. A water supply channel is connected to a water supply source and is configured to supply washing water to the accommodation unit. The laundry treatment apparatus includes a body along which a water supply channel is provided, the body being rotatably provided at the cabinet. A body guider is provided at the cabinet and is configured to guide a rotational movement of the body.

Abstract: A treatment device treats a treatment subject inside a treatment chamber with treatment fluids of a plurality of types. An exhaust switching unit is provided to an exhaust pipe connected to the inside of the treatment chamber, and the exhaust switching unit is formed of a distribution box, switching valve boxes, and an exhaust tube. Additionally, the switching valve boxes, which correspond in number to the treatment fluids, are connected to the distribution box in a parallel state.

Abstract: A substrate treating apparatus includes a treatment unit including a container, and a support member in the interior of the container to support a substrate, the treatment unit being configured to treat the substrate a nozzle unit having a treatment liquid nozzle for supplying a treatment liquid to the substrate provided in the treatment unit and an inspection unit that inspects whether the treatment liquid is normally discharged from the treatment liquid nozzle. The nozzle further includes a nozzle driver that moves the treatment liquid nozzle from a process position at which the substrate is treated by the treatment unit and an inspection position at which the treatment liquid nozzle is inspected by the inspection unit.

Abstract: A laundry treatment apparatus includes a cabinet and a drawer retractably provided in the cabinet. An accommodation unit is disposed in the drawer and defines a space configured to receive washing water. A water supply channel is connected to a water supply source and is configured to supply washing water to the accommodation unit. The laundry treatment apparatus includes a body along which a water supply channel is provided, the body being rotatably provided at the cabinet. A body guider is provided at the cabinet and is configured to guide a rotational movement of the body.

Abstract: A cleaning device includes a flushing chamber having opposite proximal and distal ends, and a length extending between the proximal and distal ends. An inlet port of the cleaning device is in fluid communication with the flushing chamber and configured for fluid connection to a source of fluid. The flushing chamber is selectively openable along its length to an open position, in which the distal end portion of the medical instrument is insertable into the flushing chamber, and selectively closable along its length to a closed position, in which the distal end portion of the medical instrument is enclosed and fluidly sealed within the flushing chamber.