Abstract: A pack comprising: a dispenser for anaerobically curable composition; and anaerobically curable composition held within the dispenser. The dispenser has (a) a reservoir in which anaerobically curable composition is held, the reservoir having an outlet through which the anaerobically curable composition can be dispensed; (b) a dispensing pump for pumping the anaerobically curable composition from the reservoir out through the outlet. The reservoir and pump together form an airless pump assembly. An applicator with an applicator surface, for example a roller, is in communication with the outlet, the applicator for applying to a substrate the anaerobically curable composition that is dispensed by the pump from the reservoir out through the outlet. The pack provides a convenient way of forming of applying anaerobically curable composition in a thin even layer.

Abstract: A stand may include a plurality of cells, each cell having an outer wall, an inner wall, a bottom edge, and a top edge separated from the bottom edge by a height. A perimeter of the outer wall may include a first plurality of segment, and a perimeter of the inner wall may include a second plurality of segments. Each segment in the second plurality of segments may be substantially parallel to a corresponding segment in the first plurality of segments. The cells may be arranged such that the bottom edge of each cell is aligned to a bottom plane, and the cells may be further arranged in at least a first row and a second row, wherein cells in the first row are lower in height than cells in the second row. Adjacent cells may be coupled to each other with a spacing connector that maintains separation therebetween.

Abstract: Holding apparatus 100 for electrostatic holding component 1 (e.g., semiconductor wafer), includes base body 10 with at least one plate 10A, protruding burls 11 on upper side of plate and end faces 12 of which span a burls support plane for supporting component, and electrode device 20 in layered form in spacings between burls and insulator layer 21 which is connected to plate, dielectric layer 23 of inorganic dielectric and electrode layer 22 between insulator and dielectric layers. Between burls support plane and dielectric layer upper side, predetermined gap spacing A is set. Electrode device has openings 24 and is on plate upper side between burls, which protrude therethrough. Insulator layer includes inorganic dielectric and is connected with adhesive 13 to base body upper side between burls. Electrode device is embedded in adhesive. Spacing between burls and electrode device is filled with adhesive. A production method is also described.

Abstract: A showerhead including a body having an opening, a first plate positioned within the opening and having a plurality of slots, a second plate positioned within the opening and having a plurality of slots, and wherein each of the first plate plurality of slots are concentrically aligned with the second plate plurality of slots.

Abstract: A mounting table includes a wafer mounting surface mounting a wafer, a ring mounting surface disposed at a radially outer side of the wafer mounting surface and mounting a first ring having a first engaging portion and a second ring having a second engaging portion to be engaged with the first engaging portion, a lifter pin, and a driving mechanism. The second ring has a through-hole extends to reach a bottom surface of the first engaging portion, and the ring mounting surface has a hole at a position corresponding to the through-hole. A lifter pin has a first holding part that fits into the through-hole and a second holding part that extends from the first holding part and has a part protruding from the first holding part. The lifter pin is accommodated in the hole, and a driving mechanism vertically moves the lifter pin.

Abstract: In a plasma processing apparatus, a mounting table includes a heater for adjusting a temperature of a mounting surface mounting thereon a consumable part consumed by plasma processing. A heater control unit controls a supply power to the heater such that the heater reaches a setting temperature. A measurement unit measures, while controlling the supply power to the heater such that the temperature of the heater becomes constant, the supply powers in a non-ignition state where plasma is not ignited and in a transient state where the supply power is decreased after the plasma is ignited. A parameter calculation unit calculates a thickness of the consumable part by performing fitting with a calculation model, which has the thickness of the consumable part as a parameter and calculates the supply power in the transient state, by using the measured supply powers in the non-ignition state and in the transient state.

Abstract: A pen has an external shape similar to that of a ballpoint pen or fountain pen. The pen includes a cavity in the tube type pen body for receiving gel varnish, and a brush for applying this to a finger nail. At the front end of the pen body, a sleeve is positioned which can be screwed on, and contained therein are LED/LEV lights, with a battery, for curing the applied gel varnish with UV light.

Abstract: A component for use in a plasma processing apparatus, which is to be exposed to a plasma, includes a base material, an alumite layer and a thermally sprayed film. The base material has a plurality of through holes and a rough surface at which one end of each of the through holes is opended. The alumite layer is formed on a surface of the base material having the rough surface by an anodic oxidation process. The thermally sprayed film is formed on the rough surface with the alumite layer therebetween.

Abstract: A tile drain and method of installing a tile drain is provided. The tile drain includes a drain body and a drain cover. The drain body defines a top opening, top weep apertures, and bottom weep apertures. The top opening receives the drain cover and serves as the primary drain for the tile drain. The top weep apertures are positioned below a top layer, such as a tile layer, of the base so as to receive fluid positioned between the top layer and a top waterproofing layer of the base. The sub weep apertures are positioned below the top waterproofing layer of the base so as to receive fluid positioned between the top waterproofing layer and a bottom waterproofing layer of the base. The drain body is encapsulated within the base, but the drain cover is adjustable relative to, and removable from, the drain body.

Abstract: A vacuum chuck includes a pedestal including a first surface on which a substrate may be mounted. The first surface of the substrate may include a vacuum hole to provide a vacuum pressure below the substrate, a vacuum groove connected to the vacuum hole, and a gas hole surrounding the vacuum groove to transmit a bottom gas to the substrate. A vacuum pipe may be provided to connect to the vacuum hole, and a gas pipe may be provided to connect to the gas hole. The diameter of the vacuum hole may be about 2 to about 3 micrometers, and a width of the vacuum groove may be about 1.6 to about 2.5 micrometers.

Abstract: A sink includes a front wall, a first side wall, and a second side wall. The front wall includes an inner surface that defines part of a basin of the sink, and an outer surface located opposite the inner surface that is configured to be exposed in front of an opening of a cabinet in which the sink is installed. The front wall includes first and second lateral portions that extend outwardly past the first and second side walls. The first and second lateral portions of the front wall are configured to at least partially overlap a front face of the cabinet adjacent the opening, so as to substantially conceal the opening when the sink is installed thereto.

Abstract: There is provided a technique that includes: a first processing module including a first process container in which at least one substrate is processed and a substrate loading port installed at a front side of the first processing module; a first utility system including a first supply system configured to supply a first processing gas into the first process container, a surface of the first utility system is connected or arranged close to a rear surface of the first processing module; and a first vacuum-exhauster arranged behind the first processing module and configured to exhaust an inside of the first process container, wherein the first vacuum-exhauster includes an outer side surface configured such that the outer side surface does not protrude more outward than an outer side surface of the first utility system.

Abstract: The service capsule (20) comprises:—an outer skirt (32),—a transverse wall (34) defining at least one outlet orifice (48). The service capsule (20) includes, for each orifice (48), a dispensing conduit (36) defining a dispensing passage (51). The service capsule (20) includes a closing cap (40), mounted moving between a clear position and a position applied on the transverse wall (34). A filter (38) is arranged upstream from and/or in the product dispensing conduit (36), and is configured so that the cosmetic product (12) in the container (18) necessarily passes through the filter (38) when the product (12) is extracted from the container (18) through the service capsule (20). The filter (38) is integral with the product dispensing conduit (36).

Abstract: A method and apparatus for plasma processing of substrates is provided. A processing chamber has a substrate support and a lid assembly facing the substrate support. The lid assembly has a plasma source that comprises a coil disposed within a conductive plate, which may comprise nested conductive rings. The coil is substantially coplanar with the conductive plate, and insulated therefrom by an insulator that fits within a channel formed in the conductive plate, or nests within the conductive rings. A field concentrator is provided around the coil, and insulated therefrom by isolators. The plasma source is supported from a conductive support plate. A gas distributor supplies gas to the chamber through a central opening of the support plate and plasma source from a conduit disposed through the conductive plate.

Abstract: An elongated tubular housing adapted to receive an adjustable external compression device introduced on one end of the tubular housing distal from the opening releasing the contents, and retained in position by a member engaging a grooved strip that is integrated with and/or retained on the housing surface material with a strip surface of like material, providing a reliable, economic and functional outer compression member retention apparatus and method. Further embodiments according to the present invention include a dispenser having regions provided for ease and comfort of gripping, grooved strip end-stop to retain compression device, and grooved strip dimensional and placement details to provide functional, manufacturable and economic material dispenser.

Abstract: A susceptor for a CVD reactor includes a flat circular disc-shaped body with channels that are arranged on a broad side of the disc-shaped body within one or more circular surface sections extending on a plane in order to transfer heat to a substrate holder. The channels run about respective centers of the one or more circular surface sections in a spiral manner and are formed as depressions that are open towards the plane. An end of each of the channels has a channel opening, the channel openings being fluidically connected to a feed opening arranged at the end of a gas supply line. Additionally, the one or more surface sections are equipped with one or more influencing elements that influence the local heat transfer and are formed as open depressions on the plane or as insert pieces that plug into the depressions.

Abstract: A cosmetic container is disclosed. The cosmetic container includes a container body which receives a cosmetic material and has a screw thread formed on the inner circumferential surface thereof; a moving frame having an edge on which a spiral protrusion coupled to the screw thread of the container body is formed; and a discharge part formed in the moving frame to discharge the cosmetic material.

Abstract: A tank assembly for a pressure-assist toilet includes a flush assembly having an outer chamber and an inner chamber disposed in the outer chamber. The flush assembly further includes a flush valve disposed in the inner chamber, and a pilot valve disposed in the inner chamber and extending through the flush valve. The tank assembly further includes an actuator engaging the pilot valve and configured to hold the pilot valve at each of a first height, a second height offset a first distance from the first height, and a third height offset a second distance from the first height greater than a first distance.

Abstract: A wafer supporting mechanism including: a wafer supporting table; and a movable part supported by the wafer supporting table, wherein the wafer supporting table includes a wafer supporting portion for transfer that stands up from a first surface opposing a back surface of a wafer to be placed and is provided further toward an inner side than an outer peripheral edge of the wafer to be placed, and the movable part includes a wafer supporting portion for film formation that is positioned further toward an outer peripheral side of the wafer to be placed than the wafer supporting portion for transfer and is relatively movable with respect to the wafer supporting table in a standing direction of the wafer supporting portion for transfer.

Abstract: Apparatus and methods of measuring and controlling the gap between a susceptor assembly and a gas distribution assembly are described. Apparatus and methods for positional control and temperature control for wafer transfer purposes are also described.