Abstract: An electron-beam-recording process comprises the steps of (1) providing an electron-beam-recording element, (2) introducing the element into a vacuum chamber, (3) imagewise exposing the element within the vacuum chamber to an electron beam and (4) processing the imagewise-exposed element to form a visible image. The electron-beam-recording element comprises a film support having, in order, on one side thereof a conductive layer comprising vanadium pentoxide, an adhesion-promoting hydrophilic colloid layer and an imaging layer. The imaging layer is comprised of an electron-beam-sensitive silver halide emulsion and the vanadium pentoxide is present in the conductive layer in an amount sufficient to impart thereto a resistivity of less than 5.times.10.sup.8 .OMEGA./sq.