Patents Examined by Jack Brammer
  • Patent number: 5102780
    Abstract: The present invention provides a silver halide photographic photosensitive material excellent in dimensional stability which comprises a polyethylene terephthalate film support and, provided thereon, at least one gelatin layer containing an active halogen type hardener, wherein water content in the gelatin layer is 20% by weight or less based on total amount of gelatin. Further provided is a method for producing such silver halide photographic photosensitive material which comprises coating a gelatin coating solution containing an active halogen type hardener on a polyethylene terephthalate film support and then drying the coat, wherein the coat is dried so that water content based on total amount of gelatin is 20% by weight or less and then, is subjected to a heat treatment.
    Type: Grant
    Filed: April 26, 1990
    Date of Patent: April 7, 1992
    Assignee: Mitsubishi Paper Mills Limited
    Inventors: Eiichi Terashima, Seiichi Sumi, Kazuhisa Kobayashi, Yoshio Shibata
  • Patent number: 5079127
    Abstract: An optical recording medium comprising a substrate and a thin organic film containing at least one kind of dye selected from polymethine family dyes, perylium family dyes, and cyanine family dyes, and a recording process comprising scanning the optical recording medium with a high intensity light beam such as a laser beam to form optically detectable pits on the recording medium.
    Type: Grant
    Filed: April 24, 1989
    Date of Patent: January 7, 1992
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kazuharu Katagiri, Yoshihiro Oguchi, Yoshio Takasu
  • Patent number: 5079128
    Abstract: An optical recording medium comprising a substrate and a thin organic film containing at least one kind of dye selected from polymethine family dyes, perylium family dyes, and cyanine family dyes, and a recording process comprising scanning the optical recording medium with a high intensity light beam such as a laser beam to form optically detectable pits on the recording medium.
    Type: Grant
    Filed: April 24, 1990
    Date of Patent: January 7, 1992
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kazuharu Katagiri, Yoshihiro Oguchi, Yoshio Takasu
  • Patent number: 5071730
    Abstract: A new polymer family is shown for use in high sensitivity, high resolution photoresists. A liquid apply resist includes a polymer binder of t-butyl methacrylate/methylmethacrylate/methacrylic acid and an initiator which generates acid upon exposure to radiation.
    Type: Grant
    Filed: February 13, 1991
    Date of Patent: December 10, 1991
    Assignee: International Business Machines Corporation
    Inventors: Robert D. Allen, William D. Hinsberg, III, Logan L. Simpson, Gregory M. Wallraff
  • Patent number: 5069999
    Abstract: A presensitized plate for use in making a lithographic printing plate requiring no dampening water comprises a substrate provided thereon with in order: (1) a photopolymerizable light-sensitive layer which comprises a monomer or an oligomer having at least one photopolymerizable olefinically unsaturated double bond, an organic solvent-soluble polyurethane resin or polyamide resin which is solid at room temperature and has film-forming ability and a photopolymerization initiator; (2) a crosslinked silicone rubber layer; and (3) a transparent cover coat layer, wherein the photopolymerization initiator comprises dialkylaminoarylcarbonyl compounds and at least one member selected from the group consisting of xanthones, thioxanthones, acrydones, benzophenones which do not carry a dialkylamino group, benzanthrones and anthraquinones and the transparent cover coat layer is formed from a biaxially oriented polypropylene film having a thickness ranging from 6 to 22 .mu.
    Type: Grant
    Filed: October 26, 1990
    Date of Patent: December 3, 1991
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tatsuji Higashi, Mitsumasa Tsuchiya, Nobuyuki Kita
  • Patent number: 4789620
    Abstract: Disclosed is a liquid photosensitive resin composition comprising(a) an at least partially carboxyl-modified multifunctional epoxy acrylate and/or multifunctional epoxy methacrylate having an average acid value of 4 to 150 and a number average molecular weight of not greater than 5,000,(b) an acrylic and/or methacrylic cross-linking monomer and/or oligomer other than the epoxy acrylate and/or epoxy methacrylate,(c) an acrylic and/or methacrylic monoethylenically vinyl monomer,(d) an inorganic filler, and(e) a photo-initiator and/or photosensitizer.This liquid photosensitive resin composition has excellent alkali developability, yields a cured coating film having good adhesion and good electrical insulating properties under high-humidity conditions, and is suitable for use as a solder resist in the fabrication of printed circuit boards.
    Type: Grant
    Filed: July 1, 1986
    Date of Patent: December 6, 1988
    Assignee: Mitsubishi Rayon Co. Ltd.
    Inventors: Isao Sasaki, Kenji Kushi, Ken-ichi Inukai
  • Patent number: 4431723
    Abstract: Photosensitive elastomeric compositions comprising about 40 to 90 weight percent of a heat workable, carboxyl- and sulfur-containing polymer of a diene; about 2 to 50 weight percent of a nongaseous, ethylenically unsaturated compound; and about 0.001 to 10 weight percent of a radical generating system; the compositions being useful for making flexographic printing plates.
    Type: Grant
    Filed: September 21, 1981
    Date of Patent: February 14, 1984
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Stephen Proskow